公开(公告)号：NL2003421A

公开(公告)日：2010-04-22

申请号：NL2003421

申请日：2009-09-02

Applicant: ASML NETHERLANDS BV

Inventor： JONG ANTHONIUS ,  JANSEN HANS ,  DONCK JACQUES ,  GORTER HARRIE ,  BERG JOHANNES

IPC: G03F7/20

Abstract: A lithographic apparatus includes a fluid supply system configured to provide a cleaning fluid to a surface to be cleaned. The cleaning fluid includes from 25 to 98.99 wt % water; from 1 to 74.99 wt % solvent selected from one or more glycol ethers, esters, alcohols and ketones; and from 0.01 to 5 wt % surfactant.

公开(公告)号：NL2005552A

公开(公告)日：2010-12-07

申请号：NL2005552

申请日：2010-10-20

Applicant: ASML NETHERLANDS BV

Inventor： BLIJ FREDRIK ,  BUIS EDWIN ,  HENNUS PIETER ,  BERG JOHANNES ,  JACOBS JOHANNES

IPC: G03F7/20 ,  H01L21/68