公开(公告)号：JP2003282431A

公开(公告)日：2003-10-03

申请号：JP2003064185

申请日：2003-02-03

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： GIJSBERTSEN JOHANNES GERARDUS ,  DE JAGER PIETER WILLEM HERMAN ,  NIJKERK MICHIEL DAVID

IPC: G03F7/20 ,  G03F9/00 ,  H01L21/027

CPC classification number: G03F9/7053

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus where alignment is easy and reliable, and to provide a device-manufacturing method.
SOLUTION: A lithographic projection apparatus has an alignment sensor comprising an electron beam supply source 10 for supplying an electron beam 12 for impinging on an alignment mark 14 on a substrate W, and a back- scattered electron detector 16 for detecting electrons being back-scattered from the alignment marker 14. The alignment sensor is independent of the projection system and projection radiation, and is an off-axis alignment sensor.
COPYRIGHT: (C)2004,JPO

Abstract translation: 要解决的问题：提供一种光刻设备，其中对准容易且可靠，并提供器件制造方法。 解决方案：光刻投影装置具有对准传感器，该对准传感器包括用于提供用于撞击基板W上的对准标记14的电子束12的电子束供给源10和用于检测电子的反向散射电子检测器16 对准传感器与投影系统和投影辐射无关，并且是离轴对准传感器。 版权所有（C）2004，JPO

公开(公告)号：SG106121A1

公开(公告)日：2004-09-30

申请号：SG200300239

申请日：2003-01-30

Applicant: ASML NETHERLANDS BV

Inventor： GIJSBERTSEN JOHANNES GERARDUS ,  DE JAGER PIETER WILLEM HERMAN ,  NIJKERK MICHIEL DAVID

IPC: G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01J37/00

Abstract: A lithographic projection apparatus includes an alignment sensor having an electron beam source constructed and arranged to provide an electron beam for impinging on an alignment marker on a substrate, and a back-scattered electron detector constructed and arranged to detect electrons back-scattered from the alignment marker. The alignment sensor is independent of the projection system and projection radiation, and is an off-axis alignment sensor.