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    Support or table for lithographic apparatus, method of manufacturing such support or table, and lithographic apparatus comprising such support or table
    1.
    发明专利
    Support or table for lithographic apparatus, method of manufacturing such support or table, and lithographic apparatus comprising such support or table 有权
    用于平面设备的支持或表，制造此类支持或表的方法以及包含该支持或表的平面设备

    公开(公告)号：JP2011071509A

    公开(公告)日：2011-04-07

    申请号：JP2010206337

    申请日：2010-09-15

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： LAMBERTUS DONDERS SJOERD NICOLAAS ,  GILISSEN NOUD JAN

    IPC: H01L21/027 ,  H01L21/683

    CPC classification number: G03F7/70716 ,  G03F7/7095

    Abstract: PROBLEM TO BE SOLVED: To provide a support structure for supporting a patterning device and/or table, and an improved material for a substrate table for holding a substrate in a lithographic apparatus, and also to provide a method of manufacturing the same. SOLUTION: A substrate table or a patterning device support includes an aerogel. The aerogel may be very light weight, for example the aerogel may have a density between 0.5 and 500 mg/cm 3 , preferably between 1 and 100 mg/cm 3 , and most preferably between 1 and 10 mg/cm 3 . The aerogel may be made from a silica gel. The aerogel made from silica gel may have a density of 1.9 mg/cm 3 , and if the air out of the aerogel is evacuated, even 1 mg/cm 3 . COPYRIGHT: (C)2011,JPO&INPIT

    Abstract translation: 要解决的问题：为了提供用于支撑图案形成装置和/或工作台的支撑结构，以及用于将基板保持在光刻设备中的用于衬底台的改进材料，并且还提供其制造方法 。 解决方案：衬底台或图案形成装置支架包括气凝胶。 气凝胶可以是非常轻的重量，例如气凝胶的密度可以在0.5至500mg / cm 3，优选在1至100mg / cm 3之间，而且 最优选1至10mg / cm 3。 气凝胶可以由硅胶制成。 由硅胶制成的气凝胶的密度可以为1.9毫克/厘米3，而气凝胶中的空气排出甚至为1毫克/厘米3。 版权所有（C）2011，JPO＆INPIT

    Lithography equipment
    2.
    发明专利
    Lithography equipment 有权

    公开(公告)号：JP2004207734A

    公开(公告)日：2004-07-22

    申请号：JP2003424900

    申请日：2003-12-22

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： GILISSEN NOUD JAN ,  DONDERS SJOERD NICOLAAS LAMBER ,  LEENDERS MARTINUS HENDRIKUS AN

    IPC: G03F7/20 ,  H01L21/027 ,  H01L21/683 ,  H01L21/68

    CPC classification number: G03F7/707

    Abstract: PROBLEM TO BE SOLVED: To provide a lithography projector decreasing deformation caused by contaminants and the severity of requirements for a plane surface against the rear surface of a plate with a projection and the front surface of a chuck simultaneously by using the plate with the projection between a removable item and a flexible member. SOLUTION: The lithography projector comprises a radiation system for supplying a projection beam of radiation, a supporting structure for supporting a patterning means of making the projection beam patternized by a desired pattern, a substrate table for supporting the substrate, and a projection system for projecting a patternized beam on a target section of the substrate. Further, the projector comprises at least one supporting structure providing at least one flexible member supporting the plate with the projection which supports the removable item used for the lithography projector. COPYRIGHT: (C)2004,JPO&NCIPI

    Substrate table, lithographic apparatus, and device manufacturing method
    3.
    发明专利
    Substrate table, lithographic apparatus, and device manufacturing method 有权
    基板，平面设备和器件制造方法

    公开(公告)号：JP2009295979A

    公开(公告)日：2009-12-17

    申请号：JP2009126050

    申请日：2009-05-26

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： MONDT EVA ,  GILISSEN NOUD JAN ,  JACOBS HERNES ,  KATE NICOLAAS TEN ,  LOOPSTRA ERIK ROELOF ,  VERMAELEN MARKUS MARTINUS PETR ,  RIEPEN MICHEL

    IPC: H01L21/027

    CPC classification number: G03F7/70341 ,  G03F7/707

    Abstract: PROBLEM TO BE SOLVED: To disclose a table in which measures are taken to seal between the table and an edge of an object, in use, supported on the table.
    SOLUTION: In particular, a capillary passage is formed between the object on the table and the table itself. A meniscus pinning feature and/or the presence of an overpressure at the radially inward side of the capillary passage holds the liquid in the passage and helps prevent it from advancing further radially inwardly. The features to perform this function may be associated with or formed in a member surrounding the object. The member may be thermally decoupled from a part of the table.
    COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：公开一种表格，其中采用措施来将桌子和使用中的物体的边缘密封在桌子上。 具体而言，在台面上的物体与桌子本身之间形成毛细通道。 在毛细管通道的径向向内的弯液面钉扎特征和/或超压存在使通道中的液体保持在通道中并有助于防止其进一步向内径向前进。 执行该功能的特征可以与围绕对象的构件相关联或形成在其中。 该构件可以与桌子的一部分热分离。 版权所有（C）2010，JPO＆INPIT

    Support, lithographic apparatus and device manufacturing method
    4.
    发明专利
    Support, lithographic apparatus and device manufacturing method 审中-公开
    支持，平面设备和设备制造方法

    公开(公告)号：JP2013118366A

    公开(公告)日：2013-06-13

    申请号：JP2012239420

    申请日：2012-10-30

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： GILISSEN NOUD JAN ,  MARTINUS AGNES WILLEM CUIJPERS ,  FIEN MENNO ,  SIJBEN ANKO JOZEF CORNELUS ,  SMEETS MARTIN FRANCE PIERRE

    IPC: H01L21/027 ,  G03F7/20 ,  H01L21/683

    CPC classification number: H01L21/6875 ,  G03F7/09 ,  G03F7/707 ,  H01L21/68735 ,  H01L21/68742

    Abstract: PROBLEM TO BE SOLVED: To provide a support in which measures are taken to reduce bending of a substrate during loading.SOLUTION: A support for an object has a support surface configured to support the object. The support surface includes a main part and a moveable part. The moveable part of the support surface is moveable between a retracted position and an extended position. In the retracted position, the moveable part of the support surface is substantially in the same plane as the main part of the support surface. In the extended position, the moveable part of the support surface protrudes from the plane of the main part of the support surface.

    Abstract translation: 要解决的问题：提供一种在加载期间采取措施减少基板的弯曲的支撑件。

    解决方案：对对象的支持具有配置为支持对象的支撑表面。 支撑表面包括主要部分和可移动部分。 支撑表面的可移动部分可在缩回位置和延伸位置之间移动。 在缩回位置，支撑表面的可移动部分基本上处于与支撑表面的主要部分相同的平面中。 在延伸位置，支撑表面的可移动部分从支撑表面的主要部分的平面突出。 版权所有（C）2013，JPO＆INPIT

    Actuator
    6.
    发明专利
    Actuator 有权
    执行器

    公开(公告)号：JP2010272854A

    公开(公告)日：2010-12-02

    申请号：JP2010096552

    申请日：2010-04-20

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： CADEE THEODORUS PETRUS MARIA ,  GILISSEN NOUD JAN ,  VERMEULEN JOHANNES PETRUS MARTINUS

    IPC: H01L21/027

    CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

    Abstract: PROBLEM TO BE SOLVED: To achieve a high throughput in the patterning of a medium imprintable on a substrate. SOLUTION: An actuator is disclosed that is equipped with: a body 40 having faces; and a plurality of parallel conduits 44 located in the body 40. Each of the conduits 44 is deformable in response to a proper pressure change in the conduit 44, by increasing the flow of a fluid in the conduit 44 or increasing a static pressure applied to the fluid in the conduit 44. A deformation of the conduit 44 causes a deformation of a face 42. COPYRIGHT: (C)2011,JPO&INPIT

    Abstract translation: 要解决的问题：为了在可压印在基板上的介质的图案化中实现高生产率。 解决方案：公开了一种致动器，其配备有：具有面的主体40; 以及位于主体40中的多个平行导管44.每个导管44响应于导管44中适当的压力变化而变形，通过增加导管44中的流体的流动或增加施加到 导管44中的流体。导管44的变形导致面42的变形。版权所有（C）2011，JPO＆INPIT

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