公开(公告)号：SG11201900623PA

公开(公告)日：2019-02-27

申请号：SG11201900623P

申请日：2017-06-30

Applicant: ASML NETHERLANDS BV

Inventor： HUISMAN SIMON ,  MATHIJSSEN SIMON ,  GOORDEN SEBASTIANUS ,  AKBULUT DUYGU ,  POLO ALESSANDRO

IPC: G03F9/00

Abstract: An alignment sensor for a lithographic apparatus has an optical system configured to deliver, collect and process radiation selectively in a first waveband (e.g. 500-900 nm) and/or in a second waveband (e.g. 1500-2500 nm). The radiation of the first and second wavebands share a common optical path in at least some portion of the optical system, while the radiation of the first waveband is processed by a first processing sub-system and the radiation of the second waveband is processed by a second processing sub-system. The processing subsystems in one example include self-referencing interferometers. The radiation of the second waveband allows marks to be measured through an opaque layer. Optical coatings and other components of each processing sub-system can be tailored to the respective waveband, without completely duplicating the optical system.