Patent search ap:("ASML NETHERLANDS BV") AND inv:"HERPEN MAARTEN VAN" Page 1

1.

发明专利
A source module of an EUV lithographic apparatus, a lithographic apparatus, and a method for manufacturing a device. 未知

公开(公告)号：NL2003181A1

公开(公告)日：2010-01-18

申请号：NL2003181

申请日：2009-07-10

Applicant: ASML NETHERLANDS BV

Inventor： HERPEN MAARTEN VAN , SOER WOUTER , YAKUNIN ANDREY

IPC: G21K1/02 , G02B5/20 , G03F7/20 , H05G2/00

2.

发明专利
Method for removing a deposition on an uncapped multilayer mirror of a lithographic apparatus, lithographic apparatus and device manufacturing method. 未知

公开(公告)号：NL2002990A1

公开(公告)日：2009-12-31

申请号：NL2002990

申请日：2009-06-09

Applicant: ASML NETHERLANDS BV

Inventor： HERPEN MAARTEN VAN , BANINE VADIM , SOER WOUTER , JAK MARTIN

IPC: G03F7/20

3.

发明专利
Optical element, lithographic apparatus including such an optical element, device manufacturing method, and device manufactured thereby. 未知

公开(公告)号：NL2002968A1

公开(公告)日：2009-12-31

申请号：NL2002968

申请日：2009-06-05

Applicant: ASML NETHERLANDS BV

Inventor： SOER WOUTER , HERPEN MAARTEN VAN

IPC: G03F7/20 , G21K1/06

4.

发明专利
Spectral purity filters for use in a lithographic apparatus. 未知

公开(公告)号：NL2003158A1

公开(公告)日：2010-01-12

申请号：NL2003158

申请日：2009-07-09

Applicant: ASML NETHERLANDS BV

Inventor： SOER WOUTER , HERPEN MAARTEN VAN , BANINE VADIM , YAKUNIN ANDREY , JAK MARTIN

IPC: G03F7/20 , G02B5/20

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