公开(公告)号：NL2005189A

公开(公告)日：2011-03-28

申请号：NL2005189

申请日：2010-08-02

Applicant: ASML NETHERLANDS BV

Inventor： YAKUNIN ANDREI ,  BANINE VADIM ,  HERPEN MAARTEN ,  SOER WOUTER ,  JAK MARTIN

IPC: G03F7/20 ,  G21K1/06

Abstract: A spectral purity filter, in particular for use in a lithographic apparatus using EUV radiation for the projection beam, includes a plurality of apertures in a substrate. The apertures are defined by walls having side surfaces that are inclined to the normal to a front surface of the substrate.

公开(公告)号：NL2005699A

公开(公告)日：2011-01-06

申请号：NL2005699

申请日：2010-11-16

Applicant: ASML NETHERLANDS BV

Inventor： JAK MARTIN ,  BANINE VADIM ,  SOER WOUTER ,  YAKUNIN ANDREI ,  KAMPEN MAARTEN ,  SCHASFOORT AD

IPC: G03F7/20 ,  G21K1/06

公开(公告)号：NL2005098A

公开(公告)日：2011-03-01

申请号：NL2005098

申请日：2010-07-16

Applicant: ASML NETHERLANDS BV

Inventor： SOER WOUTER ,  JAK MARTIN

IPC: G21K1/06 ,  G03F7/20

Abstract: A method for manufacturing a spectral purity filter is provided in which openings in a first surface of a base material, corresponding to a plurality of apertures of the spectral purity filter, are formed. At least the surfaces of the base material surrounding the openings in the first surface are chemically treated to form a layer of a second material, and the base material is etched from the second surface such that the openings extend from the first surface of the base material to the second surface of the base material.

公开(公告)号：NL2005111A

公开(公告)日：2011-02-22

申请号：NL2005111

申请日：2010-07-19

Applicant: ASML NETHERLANDS BV

Inventor： JAK MARTIN ,  BANINE VADIM ,  HERPEN MAARTEN ,  SOER WOUTER ,  YAKUNIN ANDREI

IPC: G03F7/20 ,  G21K1/06

公开(公告)号：NL2004706A

公开(公告)日：2011-01-25

申请号：NL2004706

申请日：2010-05-12

Applicant: ASML NETHERLANDS BV

Inventor： SOER WOUTER ,  HERPEN MAARTEN ,  GIELISSEN KURT ,  JAK MARTIN

IPC: G03F7/20 ,  H05G2/00

公开(公告)号：NL2005832A

公开(公告)日：2011-01-10

申请号：NL2005832

申请日：2010-12-08

Applicant: ASML NETHERLANDS BV

Inventor： MEDVEDEV VIACHESLAV ,  BANINE VADIM ,  KRIVTSUN VLADIMIR ,  SOER WOUTER ,  YAKUNIN ANDREI

IPC: G03F7/20

公开(公告)号：NL2004992A

公开(公告)日：2010-08-09

申请号：NL2004992

申请日：2010-06-29

Applicant: ASML NETHERLANDS BV

Inventor： SOER WOUTER ,  BANINE VADIM ,  LOOPSTRA ERIK ,  YAKUNIN ANDREI ,  JAK MARTIN

IPC: G03F7/20

公开(公告)号：NL2003396A

公开(公告)日：2010-03-29

申请号：NL2003396

申请日：2009-08-26

Applicant: ASML NETHERLANDS BV ,  KONINK PHILIPS ELECTRONICS B V

Inventor： SOER WOUTER ,  YAKUNIN ANDREI ,  JAK MARTIN ,  MATHEW DENNY ,  KETTELARIJ HENK ,  HEUVEL ERIC ,  KUIJPERS PETER

IPC: G02B5/20 ,  G03F7/20

Abstract: A transmissive spectral purity filter is configured to transmit extreme ultraviolet radiation. The spectral purity filter includes a filter part having a plurality of apertures configured to transmit extreme ultraviolet radiation and to suppress transmission of a second type of radiation. Each aperture has been manufactured by an anisotropic etching process.

公开(公告)号：NL2003181A1

公开(公告)日：2010-01-18

申请号：NL2003181

申请日：2009-07-10

Applicant: ASML NETHERLANDS BV

Inventor： HERPEN MAARTEN VAN ,  SOER WOUTER ,  YAKUNIN ANDREY

IPC: G21K1/02 ,  G02B5/20 ,  G03F7/20 ,  H05G2/00

公开(公告)号：SG184557A1

公开(公告)日：2012-11-29

申请号：SG2012075628

申请日：2011-02-22

Applicant: ASML NETHERLANDS BV

Inventor： SOER WOUTER ,  BANINE VADIM ,  LOOPSTRA ERIK ,  YAKUNIN ANDREI ,  JAK MARTIN

Abstract: A spectral purity filter includes a body of material, through which a plurality of apertures extend. The apertures are arranged to suppress radiation having a first wavelength and to allow at least a portion of radiation having a second wavelength to be transmitted through the apertures. The second wavelength of radiation is shorter than the first wavelength of radiation. The body of material is formed from a material having a bulk reflectance of substantially greater than or equal to 70% at the first wavelength of radiation. The material has a melting point above 1000 °C.