公开(公告)号：NL2010792A

公开(公告)日：2013-12-04

申请号：NL2010792

申请日：2013-05-13

Applicant: ASML NETHERLANDS BV

Inventor： LIU XIAOFENG ,  HOWELL RAFAEL C

IPC: G03F7/20

公开(公告)号：NL2007642A

公开(公告)日：2012-05-14

申请号：NL2007642

申请日：2011-10-21

Applicant: ASML NETHERLANDS BV

Inventor： HSU DUAN-FU ,  CHEN LUOQI ,  FENG HANYING ,  HOWELL RAFAEL C ,  ZHOU XINJIAN ,  CHEN YI-FAN

IPC: G03F7/20

公开(公告)号：SG11201602179WA

公开(公告)日：2016-04-28

申请号：SG11201602179W

申请日：2014-09-11

Applicant: ASML NETHERLANDS BV

Inventor： HSU DUAN-FU ,  HOWELL RAFAEL C ,  LIU FENG-LIANG

IPC: G03F7/20

Abstract: A method to improve a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus having an illuminator and projection optics, the method including: computing a multi-variable cost function of a plurality of design variables that are characteristics of the lithographic process, at least some of the design variables being characteristics of the illumination produced by the illuminator and of the design layout, wherein the multi-variable cost function is a function of a three-dimensional resist profile on the substrate, or a three-dimensional radiation field projected from the projection optics, or both; and reconfiguring one or more characteristics of the lithographic process by adjusting the design variables until a predefined termination condition is satisfied.

公开(公告)号：NL2012197A

公开(公告)日：2014-08-26

申请号：NL2012197

申请日：2014-02-04

Applicant: ASML NETHERLANDS BV

Inventor： LIU XIAOFENG ,  HOWELL RAFAEL C

IPC: G03F7/20