公开(公告)号：KR20200135877A

公开(公告)日：2020-12-03

申请号：KR20207031464

申请日：2019-04-11

Applicant: ASML NETHERLANDS BV

Inventor： HU XUERANG ,  LIU XUEDONG ,  CHEN ZHONGWEI ,  REN WEIMING

IPC: H01J37/317 ,  H01J37/14 ,  H01J37/147 ,  H01J37/153

Abstract: 하전입자빔 장치의개선된소스전환유닛이개시된다. 소스전환유닛은복수의마이크로-구조체들을포함하는제 1 마이크로-구조체어레이를포함한다. 복수의마이크로-구조체들은 1 이상의그룹으로그룹화된다. 하나의그룹내의마이크로-구조체들의대응하는전극들은드라이버에의해전기적으로연결되고구동되어빔릿들의대응하는그룹에영향을미친다. 하나의그룹내의마이크로-구조체들은단극구조체들또는다극구조체들일수 있다. 하나의그룹내의마이크로-구조체들은상기장치의광학축선으로부터동일하거나실질적으로동일한반경방향시프트들을갖는다. 하나의그룹내의마이크로-구조체들은그 반경방향시프트방향들에대해동일하거나실질적으로동일한방위각도들을갖는다.

公开(公告)号：IL316614A

公开(公告)日：2024-12-01

申请号：IL31661424

申请日：2024-10-28

Applicant: ASML NETHERLANDS BV ,  KRUPIN OLEG ,  REN WEIMING ,  JI XIAOYU ,  GONG ZIZHOU ,  HU XUERANG ,  LIU XUEDONG

Inventor： KRUPIN OLEG ,  REN WEIMING ,  JI XIAOYU ,  GONG ZIZHOU ,  HU XUERANG ,  LIU XUEDONG

IPC: H01J37/21 ,  H01J37/244 ,  H01J37/28

Abstract: Systems and methods of measuring of optimizing collection efficiency of secondary charged particles include a multi-beam inspection apparatus (104) configured to scan (226) a sample (230) and including a lens (242), a detector (244) configured to receive a plurality of secondary charged-particle beams (236, 238, 240) in response to scanning the sample, and a controller (296) including circuitry communicatively coupled to the multi-beam inspection apparatus and the detector, configured to: focus the lens to adjust sizes of secondary beam spots, wherein the secondary beam spots are formed by the plurality of secondary charged-particle beams on the detector; cause, for each secondary charged-particle beam of the plurality of secondary charged-particle beams, outlier charged particles of the each secondary charged-particle beam to not be detected by the detector; and refocus the lens to adjust currents of a portion of the plurality of secondary charged-particle beams detected by the detector, wherein the outlier charged particles do not contribute to the currents.

公开(公告)号：SG11202112463SA

公开(公告)日：2021-12-30

申请号：SG11202112463S

申请日：2020-05-18

Applicant: ASML NETHERLANDS BV

Inventor： REN WEIMING ,  LIU XUEDONG ,  HU XUERANG ,  CHEN ZHONG-WEI

IPC: H01J37/12

Abstract: Systems and methods of reducing the Coulomb interaction effects in a charged particle beam apparatus are disclosed. The charged particle beam apparatus may comprise a charged particle source and a source conversion unit comprising an aperture-lens forming electrode plate configured to be at a first voltage, an aperture lens plate configured to be at a second voltage that is different from the first voltage for generating a first electric field, which enables the aperture-lens forming electrode plate and the aperture lens plate to form aperture lenses of an aperture lens array to respectively focus a plurality of beamlets of the charged particle beam, and an imaging lens configured to focus the plurality of beamlets on an image plane. The charged particle beam apparatus may comprise an objective lens configured to focus the plurality of beamlets onto a surface of the sample and form a plurality of probe spots thereon.

公开(公告)号：SG11202106369RA

公开(公告)日：2021-07-29

申请号：SG11202106369R

申请日：2019-11-26

Applicant: ASML NETHERLANDS BV

Inventor： REN WEIMING ,  ZHANG QIAN ,  HU XUERANG ,  LIU XUEDONG

IPC: H01J37/147

Abstract: A multi-beam inspection apparatus including an improved source conversion unit is disclosed. The improved source conversion unit may comprise a micro-structure deflector array including a plurality of multipole structures. The micro-deflector deflector array may comprise a first multipole structure having a first radial shift from a central axis of the array and a second multipole structure having a second radial shift from the central axis of the array. The first radial shift is larger than the second radial shift, and the first multipole structure comprises a greater number of pole electrodes than the second multipole structure to reduce deflection aberrations when the plurality of multipole structures deflects a plurality of charged particle beams.