Patent search ap:("ASML NETHERLANDS BV") AND inv:"KRUIJSWIJK STEFAN" Page 1

1.

发明专利
A lithographic apparatus and a method of operating the lithographic apparatus. 未知

公开(公告)号：NL2002983A1

公开(公告)日：2009-12-29

申请号：NL2002983

申请日：2009-06-08

Applicant: ASML NETHERLANDS BV

Inventor： KADIJK EDWIN , KRUIJSWIJK STEFAN

IPC: G03F7/20

2.

发明专利
LITHOGRAPHIC APPARATUS AND STAGE SYSTEM. 未知

公开(公告)号：NL2008178A

公开(公告)日：2012-08-28

申请号：NL2008178

申请日：2012-01-25

Applicant: ASML NETHERLANDS BV

Inventor： TOORN JAN-GERARD CORNELIS , BAGGEN MARCEL , KRUIJSWIJK STEFAN , STARREVELD JEROEN , BAGGEN MARK , VERVOORDELDONK MICHAEL

IPC: G03F7/20 , H01L21/68

Patent Agency Ranking