公开(公告)号：NL2003846A

公开(公告)日：2010-06-22

申请号：NL2003846

申请日：2009-11-23

Applicant: ASML NETHERLANDS BV

Inventor： VERMEULEN JOHANNES ,  WIJST MARC ,  CADEE THEODORUS ,  JACOBS FRANSISCUS ,  VALENTIN CHRISTIAAN LOUIS ,  BAGGEN MARCEL ,  BUTLER HANS ,  COX HENRIKUS ,  EIJK JAN ,  JEUNINK ANDRE ,  KEMPER NICOLAAS ,  SCHMIDT ROBERT-HAN MUNNIG ,  PASCH ENGELBERTUS

IPC: G03F9/00

Abstract: A lithographic apparatus includes a position controller configured to control a position of a patterning device in its planar direction by selectively pressing at least one of the side faces of the patterning device. The position controller includes a gas pressure supply and one or more outflow openings directed towards at least one side face of the patterning device so as to exert pressurized gas on this side face in order to control the position of the patterning device in its planar direction in a contactless manner.

公开(公告)号：NL2009036A

公开(公告)日：2013-01-22

申请号：NL2009036

申请日：2012-06-20

Applicant: ASML NETHERLANDS BV

Inventor： WARMERDAM THOMAS ,  BAGGEN MARCEL ,  HEMPENIUS PETER ,  VOS YOUSSEF

IPC: G03F7/20

公开(公告)号：NL2008178A

公开(公告)日：2012-08-28

申请号：NL2008178

申请日：2012-01-25

Applicant: ASML NETHERLANDS BV

Inventor： TOORN JAN-GERARD CORNELIS ,  BAGGEN MARCEL ,  KRUIJSWIJK STEFAN ,  STARREVELD JEROEN ,  BAGGEN MARK ,  VERVOORDELDONK MICHAEL

IPC: G03F7/20 ,  H01L21/68