公开(公告)号：SG119326A1

公开(公告)日：2006-02-28

申请号：SG200504546

申请日：2005-07-20

Applicant: ASML NETHERLANDS BV

Inventor： ERIK ROELOF LOOPSTRA ,  LEON MARTIN LEVASIER ,  RENE OESTERHOLT

Abstract: A method for calibrating an encoder in a lithographic apparatus, the encoder including a sensor and a grating, the encoder configured to measure a position of a moveable support of the lithographic apparatus, the method comprising: measuring a position of the moveable support using an interferometer; and calibrating the encoder based on the position of the moveable support measured by the interferometer.

公开(公告)号：NL2014707A

公开(公告)日：2016-03-31

申请号：NL2014707

申请日：2015-04-24

Applicant: ASML NETHERLANDS BV

Inventor： CHRISTIANUS WILHELMUS JOHANNES BERENDSEN ,  MARCEL BECKERS ,  HENRICUS JOZEF CASTELIJNS ,  HUBERTUS ANTONIUS GERAETS ,  ADRIANUS HENDRIK KOEVOETS ,  LEON MARTIN LEVASIER ,  PETER SCHAAP ,  BOB STREEFKERK ,  SIEGFRIED ALEXANDER TROMP

IPC: G03F7/20

Abstract: A method for compensating for an exposure error in an exposure process of a lithographic apparatus that comprises a substrate table, the method comprising: obtaining a dose measurement indicative of a dose of IR radiation that reaches substrate level, wherein the dose measurement can be used to calculate an amount of IR radiation absorbed by an object in the lithographic apparatus during an exposure process; and using the dose measurement to control the exposure process so as to compensate for an exposure error associated with the IR radiation absorbed by the object during the exposure process.

公开(公告)号：NL2016541A

公开(公告)日：2016-10-24

申请号：NL2016541

申请日：2016-04-04

Applicant: ASML NETHERLANDS BV

Inventor： ADRIANUS HENDRIK KOEVOETS ,  ERIK JOHAN ARLEMARK ,  SANDER CATHARINA REINIER DERKS ,  SJOERD NICOLAAS LAMBERTUS DONDERS ,  WILFRED EDWARD ENDENDIJK ,  FRANCISCUS JOHANNES JOSEPH JANSSEN ,  LEON MARTIN LEVASIER ,  JIM VINCENT OVERKAMP ,  RAYMOND WILHELMUS LOUIS LAFARRE ,  NICOLAAS TEN KATE ,  JACOBUS CORNELIS GERARDUS VAN DER SANDEN

IPC: G03F7/20

Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.