公开(公告)号：SG151198A1

公开(公告)日：2009-04-30

申请号：SG2008066698

申请日：2008-09-10

Applicant: ASML NETHERLANDS BV

Inventor： BOB STREEFKERK ,  DE GRAAF ROELOF FREDERIK ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  MARCEL BECKERS ,  BERKVENS PAUL PETRUS JOANNES ,  ANSTOTZ DAVID LUCIEN

Abstract: METHODS RELATING TO IMMERSION LITHOGRAPHY AND AN IMMERSION LITHOGRAPHIC APPARATUS A method of operating a fluid confinement system of an immersion lithographic apparatus is disclosed. The performance of the liquid confinement system is measured in several different ways. On the basis of the result of the measurement of performance, a signal indicating, for example, that a remedial action may need to be taken is generated.

公开(公告)号：SG118391A1

公开(公告)日：2006-01-27

申请号：SG200503932

申请日：2005-06-20

Applicant: ASML NETHERLANDS BV

Inventor： JOERI LOF ,  JOHANNES CATHARINUS HUBERTUS M ,  JEROEN JOHANNES SOPHIA MARIA M ,  ANTONIUS JOHANNES VAN DER NET ,  RONALD VAN DER HAM ,  NICOLAS LALLEMANT ,  MARCEL BECKERS

IPC: G03F7/20

公开(公告)号：SG117593A1

公开(公告)日：2005-12-29

申请号：SG200503180

申请日：2005-05-24

Applicant: ASML NETHERLANDS BV

Inventor： MARCEL BECKERS ,  RONALD JOHANNES HULTERMANS ,  NICOLAAS TEN KATE ,  NICOLAAS RUDOLF KEMPER ,  NICOLAAS FRANCISCUS KOPPELAARS ,  JAN-RARIUS SCHOTSMAN ,  RONALD VAN DER HAM ,  JOHANNES ANTONIUS MARIA MARTIN

IPC: G03F7/20 ,  H01L21/027

Abstract: A lithographic apparatus is disclosed. The apparatus includes an illumination system to provide a beam of radiation, and a support structure for supporting a patterning device. The patterning device serves to impart the beam with a pattern in its cross-section. The apparatus also includes a gas flushing device (1) for flushing a substantially laminar flow of gas across the beam of radiation and/or along a surface of an optical component. The gas flushing device includes a single gas outlet (1) that has an inner rim (3) at a downstream end of the gas outlet. The inner rim (3) defines a total gas outlet area. The gas outlet is provided with a laminator (4) that has an effective area (A2) out of which, in use, the substantially laminar flow of gas flows. The laminator effective area includes material that has laminator openings (5) and is at least as large as the total gas outlet area.

公开(公告)号：NL2014707A

公开(公告)日：2016-03-31

申请号：NL2014707

申请日：2015-04-24

Applicant: ASML NETHERLANDS BV

Inventor： CHRISTIANUS WILHELMUS JOHANNES BERENDSEN ,  MARCEL BECKERS ,  HENRICUS JOZEF CASTELIJNS ,  HUBERTUS ANTONIUS GERAETS ,  ADRIANUS HENDRIK KOEVOETS ,  LEON MARTIN LEVASIER ,  PETER SCHAAP ,  BOB STREEFKERK ,  SIEGFRIED ALEXANDER TROMP

IPC: G03F7/20

Abstract: A method for compensating for an exposure error in an exposure process of a lithographic apparatus that comprises a substrate table, the method comprising: obtaining a dose measurement indicative of a dose of IR radiation that reaches substrate level, wherein the dose measurement can be used to calculate an amount of IR radiation absorbed by an object in the lithographic apparatus during an exposure process; and using the dose measurement to control the exposure process so as to compensate for an exposure error associated with the IR radiation absorbed by the object during the exposure process.

公开(公告)号：SG117570A1

公开(公告)日：2005-12-29

申请号：SG200502906

申请日：2005-05-09

Applicant: ASML NETHERLANDS BV

Inventor： NICOLAS ALBAN LALLEMANT ,  MARTINUS CORNELIS MARIA VERHAG ,  MARCEL BECKERS ,  RONALD STULTIENS ,  PASCAL ANTONIUS SMITS ,  WLADIMIR FRANSISCUS GERARDUS M ,  DAVID THEODORUS WILLY VAN DER ,  STEPHAN KOELINK ,  HENK KRUS

IPC: G03F7/20 ,  H01L21/027

Abstract: A lithographic apparatus comprising: a radiation system for providing a projection beam of radiation; a first support structure for supporting patterning means, the patterning means serving to pattern the projection beam according to a desired pattern; a second support structure for supporting a substrate; and a projection system (1) for projecting the patterned beam onto a target portion of the substrate (3); at least one gas generating structure (7) for generating a conditioned gas flow (5) in a volume extending between said projection system and the target portion of the substrate. Said gas generating structure is arranged to generate a gas flow that is directed towards an upper volume generally located above a lower surface (4) of the projection system. The structure further comprises a guiding element (8) for guiding said gas flow to a lower volume generally located below the lower surface of said projection system.