公开(公告)号：JP2011254092A

公开(公告)日：2011-12-15

申请号：JP2011163844

申请日：2011-07-27

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： MARCEL MATHIJS THEODORE MARIE DIERICHS ,  SECHELT NICHOLAS LAMBELDUS DONDERS ,  JOHANNES HENRICUS WILHELMUS JACOBS ,  JANSEN HANS ,  ERIK ROELOF LOOPSTRA ,  JEROEN JOHANNES SOPHIA MARIA MERTENS ,  MARCO COELHO STAUFEN ,  BOB STREEFKERK ,  MARTINUS CORNELIS MARIA VERHAGEN ,  LAYLA SOINTIS GULDA

IPC: H01L21/027 ,  B01D61/02 ,  B01D61/24 ,  C02F1/04 ,  C02F1/28 ,  C02F1/32 ,  C02F1/42 ,  C02F1/44 ,  G03F7/20

CPC classification number: G03F7/70866 ,  B01D19/0031 ,  B01D61/025 ,  B01D61/24 ,  C02F1/04 ,  C02F1/20 ,  C02F1/28 ,  C02F1/283 ,  C02F1/32 ,  C02F1/42 ,  C02F1/441 ,  C02F2103/40 ,  G03F7/2041 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus in which a liquid supply system maintains a liquid in a space between a final element of a projection system and a substrate by using a liquid confinement system.SOLUTION: A liquid supply system 100 may further include a de-mineralizing unit 130, a distillation unit 120 and a UV radiation source to purify an immersion liquid. A chemical may be added to the immersion liquid to inhibit lives from growing and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of lives may be reduced.

Abstract translation: 要解决的问题：提供一种光刻设备，其中液体供应系统通过使用液体限制系统在投影系统的最终元件和基板之间的空间中保持液体。 解决方案：液体供应系统100还可以包括去矿化单元130，蒸馏单元120和UV辐射源以净化浸没液体。 可以向浸入液体中加入化学物质以抑制生命的生长，并且液体供应系统的组分可以由对可见光不透明的材料制成，从而可以减少生命的增长。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2014017526A

公开(公告)日：2014-01-30

申请号：JP2013222157

申请日：2013-10-25

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BOB STREEFKERK ,  JOHANNES JACOBS MATEUS BASELMANS ,  BRULS RICHARD JOSEPH ,  DIERICHS MARCLE MATHIJS T M ,  SECHELT NICHOLAS LAMBELDUS DONDERS ,  CHRISTIANE ALEXANDER HOGENDAM ,  JANSEN HANS ,  LOOPSTRA ERIK ROELOF ,  JEROEN JOHANNES SOPHIA MARIA MERTENS ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  SENGERS TIMOTHEUS FRANCISCUS ,  RONALD WALTER JIIN SEVERYNS ,  SERGEI SHULEPOV ,  BOOM HERMAN

IPC: H01L21/027 ,  B05D3/12 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/2041 ,  G03F7/70908 ,  G03F7/70958

Abstract: PROBLEM TO BE SOLVED: To provide an immersion lithographic projection apparatus.SOLUTION: An immersion lithographic projection apparatus in which immersion liquid is sealed between a final element of a projection system and a substrate is disclosed. Use of both hydrophobic and hydrophilic layers on various elements of the apparatus is disclosed. The use of the layers helps to prevent formation of bubbles in the immersion liquid and reduce residue on the elements after being immersed in the immersion liquid.

Abstract translation: 要解决的问题：提供一种浸没式光刻投影装置。公开了一种浸没式光刻投影装置，其中浸入液体密封在投影系统的最终元件和基板之间。 公开了在设备的各种元件上使用疏水层和亲水层两者。 使用这些层有助于防止在浸没液中形成气泡，并且在浸入浸液中之后减少元件上的残留物。

公开(公告)号：JP2011249854A

公开(公告)日：2011-12-08

申请号：JP2011192774

申请日：2011-09-05

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： ALEKSEY YURIEVICH KOLENSNYCHENKO ,  JOHANNES JACOBS MATEUS BASELMANS ,  SECHELT NICHOLAS LAMBELDUS DONDERS ,  CHRISTIANE ALEXANDER HOGENDAM ,  JANSEN HANS ,  JEROEN JOHANNES SOPHIA MARIA MERTENS ,  JOHANNES CATHARINUS HUBERTUS MULKENS ,  FELIX GOTTFRIED PETER PETERS ,  BOB STREEFKERK ,  FRANCISCUS JOHANNES HERMAN MARIA TEUNISSEN ,  HELMAR VAN SANTEN

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70733 ,  G03F7/70866 ,  G03F7/70908

Abstract: PROBLEM TO BE SOLVED: To provide a substrate table of an immersion liquid lithographic apparatus configured to prevent contamination caused by immersion liquid.SOLUTION: A substrate table WT includes a drainage ditch, or a barrier 40 surrounding an outer peripheral edge of a substrate W, and a barrier 100 surrounding other objects 20, such as sensors, positioned on a flat surface which is substantially the same plane as the upper surface of the substrate W. The barriers 40, 100 can collect any liquid which is spilt from a liquid supply system during exposing the substrate W to reduce the risk of contamination of delicate components of a lithographic projection apparatus.

Abstract translation: 要解决的问题：提供一种浸没液体光刻设备的基板台，其被配置为防止浸没液体引起的污染。 解决方案：衬底台WT包括排水沟或围绕衬底W的外围边缘的阻挡层40以及围绕位于平坦表面上的其它物体20（例如传感器）的势垒100，该平面基本上是 与衬底W的上表面相同的平面。阻挡层40,100可以收集在暴露衬底W期间从液体供应系统溢出的任何液体，以降低光刻投影设备的微妙部件污染的风险。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2012119720A

公开(公告)日：2012-06-21

申请号：JP2012027270

申请日：2012-02-10

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LOF JOERI ,  BIJLAART ERIK THEODORUS MARIA ,  BUTLER HANS ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  ALEXEI KOLESNE TCHENKO ,  ERIK ROHLOFF ROPESTRA ,  MEIJER HENDRICUS JOHANNES MARIA ,  MERTENS JEROEN JOHANNES SOPHIA M ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  RITSEMA ROELOF AEILKO SIEBRAND ,  SCHAIK FRANK VAN ,  SENGERS TIMOTHEUS FRANCISCUS ,  KLAUS SIMON ,  DE SMIT JOHANNES THEODOOR ,  ALEXANDER STOLE YALE ,  BOB STREEFKERK ,  VAN SANTEN HELMAR

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F7/70866

Abstract: PROBLEM TO BE SOLVED: To provide a lithography projection apparatus in which the space between the final element of a projection system, where the liquid loss from a supply system is minimized during exposure of the edge part of a substrate, and the substrate is filled with a liquid.SOLUTION: An edge sealing member 17 has an upper primary surface which is substantially in flush with the upper primary surface of a substrate W, and surrounds the substrate W or other object on a substrate table at least partially. Consequently, catastrophic liquid loss is prevented when the image at an edge part of the substrate W is captured or the edge part is illuminated even if the section under a projection lens PL is operated.

Abstract translation: 要解决的问题：提供一种光刻投影装置，其中在基板的边缘部分的曝光期间来自供应系统的液体损失最小化的投影系统的最终元件之间的空间和基板 充满液体。 解决方案：边缘密封构件17具有与基板W的上主表面基本上齐平的上主表面，并且至少部分地围绕基板W或基板台上的其它物体。 因此，即使拍摄基板W的边缘部分的图像或边缘部分被照亮，即使投影透镜PL下的部分被操作，也可以防止灾难性的液体损失。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2012084926A

公开(公告)日：2012-04-26

申请号：JP2012014835

申请日：2012-01-27

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KOLESNYCHENKO ALEKSEY YURIEVICH ,  JOHANNES JACOBS MATEUS BASELMANS ,  SECHELT NICHOLAS LAMBELDUS DONDERS ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JANSEN HANS ,  JEROEN JOHANNES SOPHIA MARIA MERTENS ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  FELIX GOTTFRIED PETER PETERS ,  BOB STREEFKERK ,  FRANCISCUS JOHANNES HERMAN MARIA TEUNISSEN ,  HELMAR VAN SANTEN

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70733 ,  G03F7/70866 ,  G03F7/70908

Abstract: PROBLEM TO BE SOLVED: To provide a substrate table of an immersion lithographic apparatus which is configured to prevent contamination with immersion liquid.SOLUTION: A substrate table WT comprises: a drainage ditch, that is, a barrier 40 surrounding an outer circumferential edge of a substrate W; and a barrier 100 surrounding other objects 20 such as a sensor positioned substantially on the same plane as an upper surface of the substrate W. Because the barriers 40 and 100 are configured to be able to collect all of liquid spilled from a liquid supply system while the substrate W is exposed, a risk of contamination of fine components in a lithographic projection apparatus is reduced.

Abstract translation: 要解决的问题：提供一种浸没式光刻设备的基板台，其被配置为防止浸没液体的污染。 解决方案：衬底台WT包括：排水沟，即围绕衬底W的外周边缘的阻挡层40; 以及围绕其它物体20的阻挡物100，例如基本上位于与基板W的上表面相同的平面上的传感器。因为阻挡层40和100构造成能够收集从液体供应系统溢出的所有液体，同时 基板W被暴露，光刻投影装置中的微细成分的污染的风险降低。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2012064979A

公开(公告)日：2012-03-29

申请号：JP2011281445

申请日：2011-12-22

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LOF JOERI ,  ANTONIUS THEODORUS ANNA MARIA DERKSEN ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  ALEXEI KOLESNE TCHENKO ,  ERIK ROHLOFF ROPESTRA ,  MODDERMAN THEODORUS MARINUS ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  RITSEMA ROELOF AEILKO SIEBRAND ,  KLAUS SIMON ,  DE SMIT JOHANNES THEODOOR ,  ALEXANDER STOLE YALE ,  BOB STREEFKERK ,  VAN SANTEN HELMAR

IPC: H01L21/027 ,  G03F7/20 ,  G03F9/00

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F9/7088

Abstract: PROBLEM TO BE SOLVED: To provide a lithography projection apparatus in which a space between a substrate and a projection system is filled with a liquid while minimizing a quantity of the liquid required to be accelerated during a stage operation.SOLUTION: In a lithography projection apparatus, a space between a final element of a projection system and a substrate table of the lithography projection apparatus is surrounded by a sealing member. A gas seal is formed between the sealing member and a surface of the substrate and a liquid is confined in the space.

Abstract translation: 要解决的问题：提供一种光刻投影装置，其中衬底和投影系统之间的空间被填充液体，同时使在阶段操作期间需要加速的液体量最小化。 解决方案：在光刻投影装置中，投影系统的最终元件与光刻投影装置的基板台之间的空间被密封构件包围。 在密封构件和基板的表面之间形成气体密封，并且液体被限制在该空间中。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：SG151198A1

公开(公告)日：2009-04-30

申请号：SG2008066698

申请日：2008-09-10

Applicant: ASML NETHERLANDS BV

Inventor： BOB STREEFKERK ,  DE GRAAF ROELOF FREDERIK ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  MARCEL BECKERS ,  BERKVENS PAUL PETRUS JOANNES ,  ANSTOTZ DAVID LUCIEN

Abstract: METHODS RELATING TO IMMERSION LITHOGRAPHY AND AN IMMERSION LITHOGRAPHIC APPARATUS A method of operating a fluid confinement system of an immersion lithographic apparatus is disclosed. The performance of the liquid confinement system is measured in several different ways. On the basis of the result of the measurement of performance, a signal indicating, for example, that a remedial action may need to be taken is generated.

公开(公告)号：SG117565A1

公开(公告)日：2005-12-29

申请号：SG200502893

申请日：2005-05-13

Applicant: ASML NETHERLANDS BV

Inventor： BOB STREEFKERK ,  SJOERD NICOLAAS LAMBERTUS DOND ,  ERIK ROELOF LOOPSTRA ,  JOHANNES CATHARINUS HUBERTUS M

IPC: G03F7/20 ,  H01L21/027

公开(公告)号：SG116542A1

公开(公告)日：2005-11-28

申请号：SG200402415

申请日：2004-05-06

Applicant: ASML NETHERLANDS BV

Inventor： BOB STREEFKERK ,  ERIK ROELOF LOOPSTRA CHRISTIAA ,  JOHANNES CATHARINUS HUBERTUS M ,  GERARDUS PETRUS MATTHIJS VAN N ,  KLAUS SIMON ,  BERNARDUS ANTONIUS SLAGHEKKE ,  ALEXANDER STRAAIJER ,  JAN-GERARD CORNELIS VAN DER TO ,  MARTIJN HOUKES

IPC: G03F7/20 ,  H01L21/027

公开(公告)号：NL2014707A

公开(公告)日：2016-03-31

申请号：NL2014707

申请日：2015-04-24

Applicant: ASML NETHERLANDS BV

Inventor： CHRISTIANUS WILHELMUS JOHANNES BERENDSEN ,  MARCEL BECKERS ,  HENRICUS JOZEF CASTELIJNS ,  HUBERTUS ANTONIUS GERAETS ,  ADRIANUS HENDRIK KOEVOETS ,  LEON MARTIN LEVASIER ,  PETER SCHAAP ,  BOB STREEFKERK ,  SIEGFRIED ALEXANDER TROMP

IPC: G03F7/20

Abstract: A method for compensating for an exposure error in an exposure process of a lithographic apparatus that comprises a substrate table, the method comprising: obtaining a dose measurement indicative of a dose of IR radiation that reaches substrate level, wherein the dose measurement can be used to calculate an amount of IR radiation absorbed by an object in the lithographic apparatus during an exposure process; and using the dose measurement to control the exposure process so as to compensate for an exposure error associated with the IR radiation absorbed by the object during the exposure process.