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    Servo control system, lithographic apparatus and control method
    1.
    发明专利
    Servo control system, lithographic apparatus and control method 有权
    伺服控制系统，平面设备和控制方法

    公开(公告)号：JP2009147303A

    公开(公告)日：2009-07-02

    申请号：JP2008261562

    申请日：2008-10-08

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： DE VOS YOUSSEF KAREL MARIA ,  BIJVOET DIRK-JAN ,  KUNST RONALD C ,  KAMIDI RAMIDIN I ,  MANSSOURI KHALID

    IPC: H01L21/027

    CPC classification number: G03F7/70725 ,  H01L21/682

    Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus which is less apt to be influenced by slippage between a support having movable positioning accuracy of an object and the object.
    SOLUTION: This servo control system controls the position of an object 2 supported by a movable support 1 and includes a first measurement system 3, 4, 5 to measure a position of the movable support, a comparative device to generate an error signal based on the comparison between a measured movable support position and a desired movable support position, a controller unit to generate a control signal based on the error signal, and an actuator 6, configured so as to drive the movable support based on the control signal. The servo control system, further, includes a second measurement system 7, 8, 9 to measure the position of the object with respect to the support, and a slip compensation device to compensate a slip between the object and the movable support.
    COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种不易受到物体的可移动定位精度的支撑体与物体之间的滑动影响的光刻设备。 解决方案：该伺服控制系统控制由可移动支撑件1支撑的物体2的位置，并且包括测量可移动支撑件的位置的第一测量系统3,4,5，产生误差信号的比较装置 基于测量的可移动支撑位置和期望的可移动支撑位置之间的比较，基于误差信号产生控制信号的控制器单元和构造成基于控制信号驱动可移动支撑件的致动器6。 伺服控制系统还包括第二测量系统7,8,9以测量物体相对于支撑件的位置，以及滑差补偿装置，用于补偿物体与可动支架之间的滑动。 版权所有（C）2009，JPO＆INPIT

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