公开(公告)号：JP2006313904A

公开(公告)日：2006-11-16

申请号：JP2006123549

申请日：2006-04-27

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STREEFKERK BOB ,  LAMBERTUS DONDERS SJOERD NICOL ,  GRAAF ROELOF FREDERICK DE ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JANSEN HANS ,  MARTINUS HENDRIKUS ANTONIUS LE ,  LIEBREGTS PAULUS MARTINUS MARI ,  MERTENS JEROEN JOHANNES SOPHIA ,  VAN DER TOORN JAN-GERARD CORNE ,  RIEPEN MICHEL

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/2041 ,  G03F7/3085 ,  G03F7/70058 ,  G03F7/70341 ,  G03F7/70825 ,  G03F7/70875 ,  G03F7/70916 ,  G03F2007/2067 ,  H01L21/0274 ,  H01L21/67098

Abstract: PROBLEM TO BE SOLVED: To reduce generation of bubbles in immersion liquid and to reduce evaporation of immersion liquid. SOLUTION: Liquid immersion lithography equipment is provided with a liquid confinement structure for defining a space arranged to contain liquid between a projection system and a substrate at least partially. In order to decrease crossing of the edge of a substrate for forming an image (which may cause inclusion of bubbles in immersion liquid), cross-sectional area of the space is minimized in a plane parallel with the substrate. Minimum theoretical size is the size of a target portion where an image is formed by the projection system. In one embodiment, profile of a final element in the projection system is altered to have the size and/or profile similar to that of the target portion in the cross-section parallel with the substrate. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：减少浸没液中气泡的产生并减少浸没液体的蒸发。 解决方案：液浸光刻设备设置有液体限制结构，用于限定至少部分地在投影系统和基板之间容纳液体的空间。 为了减少用于形成图像（可能引起浸入液体中的气泡的）的基板的边缘的交叉，在平行于基板的平面中，该空间的横截面面积被最小化。 最小理论尺寸是由投影系统形成图像的目标部分的尺寸。 在一个实施例中，投影系统中的最终元件的轮廓被改变成具有与平行于基底的横截面中的目标部分的尺寸和/或轮廓相似的尺寸和/或轮廓。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2006210895A

公开(公告)日：2006-08-10

申请号：JP2005372890

申请日：2005-12-26

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： MARTINUS HENDRIKUS ANTONIUS LE ,  DEN BOEF ARIE J ,  BURGHOORN JACOBUS ,  MICKAN UWE ,  VANNER ROELAND NICOLAAS MARIA ,  HAUSCHILD JAN

IPC: H01L21/027 ,  G01B11/00 ,  G01C3/06

CPC classification number: G02B27/0075 ,  G03F7/70641 ,  G03F9/7026

Abstract: PROBLEM TO BE SOLVED: To provide a method of performing a tilted focus testing and an exposure apparatus, capable of easily giving a tilt to the projection beam with a pattern using a tilting device, and capable of easily performing tilted defocus testing, and to provide a device manufactured in accordance with it. SOLUTION: In order to tilt the at least one reflective device to the second orientation, a device for tilting is used. A step for supplying the second projection beam with a tilt to the above first projection beam, and a step for producing a second projected radiation beam onto the target object, are provided along with a step for determining a lateral shift of the first and second projected radiation beams on the target object and, determining from the lateral shift a defocus of the target object with respect to the projected radiation beam. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：为了提供一种执行倾斜聚焦测试和曝光设备的方法，其能够使用倾斜装置以容易地使用倾斜装置的图案倾斜到投影光束，并且能够容易地进行倾斜散焦测试， 并提供根据其制造的装置。 解决方案：为了将至少一个反射装置倾斜到第二取向，使用倾斜装置。 提供将第二投影光束向上述第一投影光束提供倾斜的步骤，以及用于产生第二投影辐射束到目标物体上的步骤，以及用于确定第一和第二投影光束的横向偏移的步骤 在目标物体上的辐射束，并且从横向偏移确定目标物体相对于投射的辐射束的散焦。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：SG118222A1

公开(公告)日：2006-01-27

申请号：SG200307725

申请日：2003-12-23

Applicant: ASML NETHERLANDS BV

Inventor： NOUD JAN GILISSEN ,  SJOERD NICOLAAS LAMBERTUS DOND ,  MARTINUS HENDRIKUS ANTONIUS LE

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/683 ,  H01L21/68 ,  G03F9/00

Abstract: A lithographic projection apparatus includes a radiation system for providing a beam of radiation and a support structure for supporting a patterning device. The patterning device serves to pattern the beam according to a desired pattern. The lithographic projection apparatus includes a substrate table for holding a substrate and a projection system for projecting the patterned beam onto a target portion of the substrate. At least one holding structure includes at least one compliant member holding a pimple plate for holding a removable item for the apparatus.