公开(公告)号：SG118222A1

公开(公告)日：2006-01-27

申请号：SG200307725

申请日：2003-12-23

Applicant: ASML NETHERLANDS BV

Inventor： NOUD JAN GILISSEN ,  SJOERD NICOLAAS LAMBERTUS DOND ,  MARTINUS HENDRIKUS ANTONIUS LE

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/683 ,  H01L21/68 ,  G03F9/00

Abstract: A lithographic projection apparatus includes a radiation system for providing a beam of radiation and a support structure for supporting a patterning device. The patterning device serves to pattern the beam according to a desired pattern. The lithographic projection apparatus includes a substrate table for holding a substrate and a projection system for projecting the patterned beam onto a target portion of the substrate. At least one holding structure includes at least one compliant member holding a pimple plate for holding a removable item for the apparatus.