公开(公告)号：JP2005294839A

公开(公告)日：2005-10-20

申请号：JP2005100831

申请日：2005-03-31

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： BASELMANS JOHANNES JACOBUS MAT ,  SJOERD NICOLAAS LAMBERTUS DOND ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JANSEN HANS ,  JEROEN JOHANNES SOPHIA MARIA M ,  MULKENS JOHANNES CATHARINUS HU ,  STREEFKERK BOB

IPC: H01L21/027 ,  G03B27/52 ,  G03F7/20 ,  G03F9/00

CPC classification number: G03F9/7096 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide lithography equipment that has improved focusing, for example, in immersion lithography equipment. SOLUTION: A substrate is exposed to light in an immersion liquid supplied from a liquid supply system. Before exposure, a map of the substrate surface is generated at a measuring section. The liquid supply system fills the space between a measuring system and the substrate with a liquid so that measurement is performed in the liquid. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供例如在浸没式光刻设备中改进聚焦的光刻设备。 解决方案：将衬底暴露于从液体供应系统供应的浸没液中的光。 在曝光之前，在测量部分产生基板表面的图。 液体供应系统用液体填充测量系统和基板之间的空间，以便在液体中进行测量。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2008160155A

公开(公告)日：2008-07-10

申请号：JP2008073704

申请日：2008-03-21

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STREEFKERK BOB ,  JOHANNES JACOBUS MATHEUS BASEL ,  COX HENRIKUS HERMAN MARIE ,  ANTONIUS THEODORUS ANNA MARIA ,  SJOERD NICOLAAS LAMBERTUS DOND ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JOERI LOF ,  LOOPSTRA ERIK ROELOF ,  JEROEN JOHANNES SOPHIA MARIA M ,  VAN DER MEULEN FRITS ,  MULKENS JOHANNES CATHARINUS HU ,  GERARDUS PETRUS MATTHIJS VAN N ,  SIMON KLAUS ,  SLAGHEKKE BERNARDUS ANTONIUS ,  STRAAIJER ALEXANDER ,  VAN DER TOORN JAN-GERARD CORNE ,  HOUKES MARTIJN

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70425 ,  G03F7/70525 ,  G03F7/709

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus for reducing residual liquid left on the surface of a substrate, after exposure by a projection system. SOLUTION: The lithographic apparatus whose localized area of the substrate surface under a projection system PL is immersed in a liquid. By having the height of a liquid supply system 310 above the surface of a substrate W, the height can be varied by using actuators 314. A control system uses feedforward control or feedback control with input of the surface height of the substrate W, to maintain the liquid supply system 310 at a predetermined height above the surface of the substrate W. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于减少残留在基板表面上的残留液体的光刻设备，在通过投影系统曝光之后。 解决方案：将投影系统PL下的基板表面的局部区域浸入液体中的光刻设备。 通过在基板W的表面上方具有液体供应系统310的高度，可以通过使用致动器314来改变高度。控制系统使用前馈控制或反馈控制与基板W的表面高度的输入来维持 液体供应系统310在衬底W的表面上方的预定高度处。版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2004343114A

公开(公告)日：2004-12-02

申请号：JP2004142059

申请日：2004-05-12

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： STREEFKERK BOB ,  BAKKER LEVINUS PIETER ,  JOHANNES JACOBUS MATHEUS BASEL ,  COX HENRIKUS HERMAN MARIE ,  ANTONIUS THEODORUS ANNA MARIA ,  SJOERD NICOLAAS LAMBERTUS DOND ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JOERI LOF ,  LOOPSTRA ERIK ROELOF ,  JEROEN JOHANNES SOPHIA MARIA M ,  VAN DER MEULEN FRITS ,  MULKENS JOHANNES CATHARINUS HU ,  GERARDUS PETRUS MATTHIJS VAN N ,  SIMON KLAUS ,  SLAGHEKKE BERNARDUS ANTONIUS ,  STRAAIJER ALEXANDER ,  VAN DER TOORN JAN-GERARD CORNE ,  HOUKES MARTIJN

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70341 ,  G03F7/70425 ,  G03F7/70525 ,  G03F7/709

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus intended to reduce liquid which remains on the surface of a substrate after exposure by a projection system.
SOLUTION: In the lithographic apparatus, a local region on the surface of the substrate under a projection system PL is immersed in a liquid. The height of a liquid feed system 310 above the surface of a substrate W can be varied using an actuator 314. In a control system, the liquid feed system 310 is maintained at a predetermined height above the surface of the substrate W, using feedforward control or feedback control by inputting the height of the surface of the substrate W.
COPYRIGHT: (C)2005,JPO&NCIPI

公开(公告)号：SG117565A1

公开(公告)日：2005-12-29

申请号：SG200502893

申请日：2005-05-13

Applicant: ASML NETHERLANDS BV

Inventor： BOB STREEFKERK ,  SJOERD NICOLAAS LAMBERTUS DOND ,  ERIK ROELOF LOOPSTRA ,  JOHANNES CATHARINUS HUBERTUS M

IPC: G03F7/20 ,  H01L21/027

公开(公告)号：SG118282A1

公开(公告)日：2006-01-27

申请号：SG200404066

申请日：2004-06-23

Applicant: ASML NETHERLANDS BV

Inventor： HENRIKUS HERMAN MARIE COX ,  SJOERD NICOLAAS LAMBERTUS DOND ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  ALEKSEY YURIEVICH KOLESNYCHENK ,  ERIK ROELOF LOOPSTRA ,  HELMAR VAN SANTEN

IPC: G03F7/20 ,  H01L21/027

公开(公告)号：SG118222A1

公开(公告)日：2006-01-27

申请号：SG200307725

申请日：2003-12-23

Applicant: ASML NETHERLANDS BV

Inventor： NOUD JAN GILISSEN ,  SJOERD NICOLAAS LAMBERTUS DOND ,  MARTINUS HENDRIKUS ANTONIUS LE

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/683 ,  H01L21/68 ,  G03F9/00

Abstract: A lithographic projection apparatus includes a radiation system for providing a beam of radiation and a support structure for supporting a patterning device. The patterning device serves to pattern the beam according to a desired pattern. The lithographic projection apparatus includes a substrate table for holding a substrate and a projection system for projecting the patterned beam onto a target portion of the substrate. At least one holding structure includes at least one compliant member holding a pimple plate for holding a removable item for the apparatus.

公开(公告)号：SG116611A1

公开(公告)日：2005-11-28

申请号：SG200502259

申请日：2005-04-13

Applicant: ASML NETHERLANDS BV

Inventor： ALEKSEY YURIEVICH KOLESNYCHENK ,  JOHANNES JACOBUS MATHEUS BASEL ,  SJOERD NICOLAAS LAMBERTUS DOND ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  HANS JANSEN ,  JEROEN JOHANNES SOPHIA MARIA M ,  JOHANNES CATHARINUS HUBERTUS M ,  FELIX GODFRIED PETER PEETERS ,  BOB STREEFKERK ,  FRANCISCUS JOHANNES HERMAN MAR ,  HELMAR VAN SANTEN

IPC: G03F7/20 ,  H01L21/027

公开(公告)号：SG116555A1

公开(公告)日：2005-11-28

申请号：SG200404063

申请日：2004-06-08

Applicant: ASML NETHERLANDS BV

Inventor： JOERI LOF ,  HANS BUTLER ,  SJOERD NICOLAAS LAMBERTUS DOND ,  ALEKSEY KOLESNYCHENKO ,  ERIK ROELOF LOOPSTRA ,  HENDRICUS JOHANNES MARIA MEIJE ,  JOHANNES CATHARINUS HUBERTUS M ,  ROELOF AEILKO SIEBRAND RITSEMA ,  FRANK VAN SCHAIK ,  TIMOTHEUS FRANCISCUS SENGERS ,  KLAUS SIMON ,  JOANNES THEODOOR DE SMIT ,  ALEXANDER STRAAIJER ,  BOB STREEFKERK ,  ERIK THEODORUS MARIA BIJLAART ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  HELMAR VAN SANTEN ,  MARCUS ADRIANUS KERKHOF ,  MARK KROON ,  ARIE JEFFREY DEN BOEF ,  JOOST JEROEN OTTENS ,  JEROEN JOHANNES SOPHIA MARIA M

IPC: G03F7/20 ,  H01L21/027

Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.