公开(公告)号：JP2010157715A

公开(公告)日：2010-07-15

申请号：JP2009284615

申请日：2009-12-16

Applicant: Asml Holding Nv ,  Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ. ,  エーエスエムエル ホールディング エヌ.ブイ.

Inventor： JOOBEUR ADEL ,  NOORDMAN OSCAR FRANCISCUS JOZEPHUS ,  VAN DER VEEN PAUL ,  VENKATARAMAN ARUN MAHADEVAN

IPC: H01L21/027 ,  G02B13/14 ,  G02B17/08 ,  G03F7/20

CPC classification number: G03F7/70583 ,  G02B27/144 ,  G02B27/145 ,  H01S3/0057

Abstract: PROBLEM TO BE SOLVED: To provide a method, a device and a system which increase both temporal pulse length and Etendue of an illumination beam. SOLUTION: A pulse modifying unit of a lighting system of a lithography apparatus includes a beam splitter which receives an input pulse of radiation and emits one or more corresponding output pulses of radiation. The beam splitter directs a first pulse portion along a second optical path and a second portion along a first optical path as a portion of an output beam. The second optical path is configured to include a divergence optical element whereby the divergence of the beam can be increased without decreasing the beam size, thus increasing the Etendue. A first and a second mirror, each with a radius of curvature, are disposed facing each other with a predetermined separation to redirect the second portion such that the optical path of the second portion through the pulse modifier is longer than that of the first portion, and the separation is less than radius of curvature. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供增加照明光束的时间脉冲长度和延迟的方法，装置和系统。 解决方案：光刻设备的照明系统的脉冲修改单元包括分束器，其接收辐射的输入脉冲并发射一个或多个对应的辐射输出脉冲。 分束器沿着第二光路引导第一脉冲部分，沿着作为输出光束的一部分的第一光路引导第二部分。 第二光路被配置为包括发散光学元件，由此可以增加光束的发散而不减小光束尺寸，从而增加光束强度。 每个具有曲率半径的第一和第二反射镜以预定的间隔彼此面对地布置，以重定向第二部分，使得第二部分通过脉冲修改器的光路比第一部分的光路长， 并且分离小于曲率半径。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：NL1036407A1

公开(公告)日：2009-07-27

申请号：NL1036407

申请日：2009-01-09

Applicant: ASML NETHERLANDS BV

Inventor： JANSSENS MARCEL HENK ANDRE ,  NOORDMAN OSCAR FRANCISCUS JOZEPHUS ,  VISSER HUIBERT ,  NIEUWKOOP EVERT

IPC: G03F7/20