公开(公告)号：JP2008122963A

公开(公告)日：2008-05-29

申请号：JP2007290777

申请日：2007-11-08

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VISSER HUIBERT ,  NOORDMAN OSCAR FRANCISCUS J ,  VINK HENRI JOHANNES P ,  MEIJERINK MARCUS GERHARDUS HEN ,  SCHREEL KOENRAAD REMI ANDRE MA ,  DE BRUIJN CORNELIS CORNELIA

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70558 ,  G03F7/70041

Abstract: PROBLEM TO BE SOLVED: To provide a system for producing a radiation beam having better pulse-to-pulse uniformity for short wavelengths. SOLUTION: A system is used to perform fast and slow applications, for example, fast application can be pulse trimming. The system includes a radiation source, an electro-optical modulator, and a beam splitter. The radiation source is configured to generate a polarized beam of radiation. The electro-optical modulator, formed of crystalline quartz, is configured to modulate the beam of radiation. The beam splitter is configured to direct a first portion of the beam to a beam dump and to form an output beam from a second portion of the beam. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于制造短波长具有更好的脉冲 - 脉冲均匀性的辐射束的系统。 解决方案：一个系统用于执行快速和慢速的应用，例如，快速应用可以进行脉冲修整。 该系统包括辐射源，电光调制器和分束器。 辐射源被配置为产生偏振的辐射束。 由结晶石英形成的电光调制器被配置成调制辐射束。 分束器被配置为将光束的第一部分引导到光束倾倒并且形成来自光束的第二部分的输出光束。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2007305979A

公开(公告)日：2007-11-22

申请号：JP2007104898

申请日：2007-04-12

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VISSER HUIBERT ,  BASELMANS JOHANNES JACOBUS MAT ,  DE JAGER PIETER WILLIEM HERMAN ,  VINK HENRI JOHANNES P

IPC: H01L21/027

CPC classification number: G03F7/70058

Abstract: PROBLEM TO BE SOLVED: To provide a radiation system and a lithography system which can substantially eliminate interference or speckle patterns. SOLUTION: A coherent beam 506 is reflected by a rotating optical element 502 to form a second coherent beam 508. The coherent beam 508 is reflected by an angular distribution changing element 504 to form an incoherent beam 510. The incoherent beam 510 is reflected by the rotating optical element 502 to form a second incoherent beam 512. The incoherent beam 512 is received by an illuminator IL. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供可以基本上消除干扰或斑点图案的辐射系统和光刻系统。 解决方案：相干光束506由旋转光学元件502反射以形成第二相干光束508.相干光束508被角度分布改变元件504反射以形成非相干光束510.非相干光束510是 由旋转光学元件502反射以形成第二非相干光束512.非相干光束512由照射器IL接收。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2007179039A

公开(公告)日：2007-07-12

申请号：JP2006325363

申请日：2006-12-01

Applicant: Asml Holding Nv ,  Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ. ,  エーエスエムエル ホールデイング エヌ.ブイ.

Inventor： VISSER HUIBERT ,  KLINKHAMER JACOB FREDRIK FRISO ,  RYZHIKOV LEV ,  COSTON SCOTT ,  JOOBEUR ADEL ,  VINK HENRI JOHANNES P ,  SHMAREV YEVGENIY KONSTANTINOVICH

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70583 ,  G02B27/0905 ,  G03F7/70075

Abstract: PROBLEM TO BE SOLVED: To provide an optical apparatus that gives uniform intensity and other characteristics over the all beams when a plurality of radiation beams are projected onto a substrate. SOLUTION: The optical apparatus is provided comprising a homogenizer and a coherence remover so as to substantially homogenize and remove at least some coherence from a beam of radiation. The homogenizer is configured to convert a beam of radiation into a plurality of beams of radiation, and the coherence remover is configured such that each of the beams of radiation passes through a different channel of the coherence remover. Otherwise, the coherence remover converts a beam of radiation into a plurality of beams, and the plurality of beams of radiation are transferred to the homogenizer. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供当多个辐射束投影到基板上时，在所有光束上均匀强度和其它特性的光学装置。 解决方案：提供光学装置，其包括均化器和相干去除器，以便基本均匀化并从辐射束中去除至少一些相干性。 均化器被配置为将辐射束转换成多个辐射束，并且相干去除器被配置为使得每个辐射束通过相干去除器的不同通道。 否则，相干去除器将辐射束转换成多个光束，并且将多个辐射束转移到均化器。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2007165885A

公开(公告)日：2007-06-28

申请号：JP2006331453

申请日：2006-12-08

Applicant: Asml Holding Nv ,  Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ. ,  エーエスエムエル ホールデイング エヌ.ブイ.

Inventor： VISSER HUIBERT ,  CALLAN DAVID WILLIAM ,  MUNNIG SCHMIDT ROBERT-HAN ,  WIENER ROBERTO B ,  VAN DE VEN JOHANNES T G M ,  ROBBINS GEORGE HOWARD

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70725 ,  G03F7/70041 ,  G03F7/70358 ,  G03F7/70425

Abstract: PROBLEM TO BE SOLVED: To provide a device and a method for compensating the motion of a substrate in a lithography device in one radiation pulse. SOLUTION: Though the image of a structure PPM for patterning which is programmable is projected on a substrate table moving at a constant speed, defocus occurs when the motion of a substrate in a lithography device in a radiation pulse is large. Accordingly, a radiation beam and the substrate are substantively synchronized by arranging a mirror 10 in the vicinity of the pupil of a projection system PL or on its coupling surface and rotating the mirror 10 using an actuator 12. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于在一个辐射脉冲中补偿光刻设备中的基板的运动的装置和方法。 解决方案：尽管可编程的图案化结构PPM的图像被投影在以恒定速度移动的衬底台上，但是当辐射脉冲中的光刻设备中的衬底的运动较大时，会发生散焦。 因此，通过在投影系统PL的光瞳附近或其联接表面上布置反射镜10并使用致动器12旋转反射镜10，使辐射束和基板实质上同步。（C） 2007年，日本特许厅和INPIT

公开(公告)号：JP2012032825A

公开(公告)日：2012-02-16

申请号：JP2011208936

申请日：2011-09-26

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VISSER HUIBERT ,  MARTINUS HENDRIKS HENDRIKS FUCHS ,  BORCHERT KRUIZINGA ,  STREEFKERK BOB ,  TINNEMANS PATRICIUS ALOYSIUS J ,  ERWIN JOHN VAN ZWET ,  ROLAND MICHOLAS MARIA FAHNER ,  MARCUS HEELALDUS HENDRICKS MEYELINK ,  NICHOLAS CORNELIUS JOHANNES VAN DER BURG ,  HAL VAN HIMBERGEN

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70291 ,  G03F7/70516

Abstract: PROBLEM TO BE SOLVED: To provide a system and a method for ensuring an easier use of an array of individually controllable elements in a lithographic apparatus.SOLUTION: The present invention relates to an apparatus and a method used to calibrate an array of individually controllable elements in a lithographic apparatus. A calibration unit can switch between a first state in which modulated radiation beam enters into a projection system for projecting the modulated radiation beam onto a substrate, and a second state in which a portion of the modulated radiation beam is inspected by the calibration unit. The calibration unit generates or updates calibration data, based on inspection result of the modulated radiation beam. An array controller uses the calibration data to provide control signals to elements of the array of individually controllable elements. These elements are configured to respond to the control signals.

Abstract translation: 要解决的问题：提供一种用于确保在光刻设备中更容易使用单独可控元件阵列的系统和方法。 解决方案：本发明涉及用于校准光刻设备中独立可控元件阵列的装置和方法。 校准单元可以在调制的辐射束进入用于将调制的辐射束投影到衬底上的投影系统的第一状态和第二状态之间切换，其中调制的辐射束的一部分被校准单元检查。 校准单元根据调制辐射束的检查结果生成或更新校准数据。 阵列控制器使用校准数据向各个可控元件阵列的元件提供控制信号。 这些元件被配置为响应控制信号。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2010199605A

公开(公告)日：2010-09-09

申请号：JP2010101208

申请日：2010-04-26

Applicant: Asml Holding Nv ,  Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ. ,  エーエスエムエル ホールディング エヌ.ブイ.

Inventor： VISSER HUIBERT ,  KLINKHAMER JACOB FREDRIK FRISO ,  RYZHIKOV LEV ,  COSTON SCOTT ,  JOOBEUR ADEL ,  VINK HENRI JOHANNES P ,  SHMAREV YEVGENIY KONSTANTINOVICH

IPC: H01L21/027

CPC classification number: G03F7/70583 ,  G02B27/0905 ,  G03F7/70075

Abstract: PROBLEM TO BE SOLVED: To homogenize intensity characteristics or the like even when beams of light are individually patterned and are projected on a substrate in using an illumination source for generating a plurality of beams of light. SOLUTION: The optical apparatus includes a homogenizer 100 and a coherence remover 102 to substantially homogenize and remove at least some coherence from the beam of light. The homogenizer is structured to convert the beam of light into a plurality of beams of light. The coherence remover is so structured that respective beams of light pass through different channels of the coherence remover. In other embodiment, the coherence remover converts the beam of light into a plurality of beams of light and the plurality of beams of light are delivered to the homogenizer. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：即使在光束被单独地构图并且在使用用于产生多束光的照明源的情况下投射到基板上时也能均匀化强度特性等。 解决方案：光学装置包括均质器100和相干去除器102，以使至少一些来自光束的一致性基本均匀化并去除。 均化器被构造成将光束转换成多个光束。 相干去除器的结构使得各个光束通过相干去除器的不同通道。 在另一实施例中，相干去除器将光束转换成多个光束，并将多个光束传送到均化器。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009163242A

公开(公告)日：2009-07-23

申请号：JP2008323792

申请日：2008-12-19

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VISSER HUIBERT ,  HENDRICUS HOEKS MARTINUS H ,  KRUIZINGA BORGERT ,  STREEFKERK BOB ,  TINNEMANS PATRICIUS ALOYSIUS J ,  VAN ZWET ERWIN JOHN ,  ROLAND NICOLAS MARIA FAHNER ,  MEIJERINK MARCUS GERHARDUS HEN ,  NICOLAS CORNELIS JOHANNES VAN ,  HAR VAN HIMBERGEN

IPC: G03F7/20 ,  G02B26/08 ,  H01L21/027

CPC classification number: G03F7/70291 ,  G03F7/70516

Abstract: PROBLEM TO BE SOLVED: To provide a system and a method for more easily using an array of individually controllable elements in a lithographic apparatus. SOLUTION: The present invention relates to an apparatus and a method used to calibrate an array of individually controllable elements within a lithographic apparatus. A calibration unit can switch between a first state in which modulated beam of radiation passes into a projection system for projecting the modulated beam of radiation onto a substrate, and a second state in which a portion of the modulated beam of radiation is inspected by the calibration unit. The calibration unit generates calibration data, or alternatively, updates calibration data, based on the inspection of the modulated beam of radiation. An array controller uses the calibration data to provide control signals to elements of an array of individually controllable elements which are subsequently configured in response to the control signals. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于在光刻设备中更容易地使用独立可控元件阵列的系统和方法。 解决方案：本发明涉及一种用于校准光刻设备内单独可控元件阵列的设备和方法。 校准单元可以在第一状态和第二状态之间进行切换，其中调制的辐射束通过投影系统以将经调制的辐射束投影到衬底上，以及第二状态，其中调制的辐射束的一部分通过校准 单元。 校准单元产生校准数据，或者替代地，基于调制的辐射束的检查更新校准数据。 阵列控制器使用校准数据来向单独可控元件的阵列的元件提供控制信号，随后可以响应于控制信号而被配置。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2013061677A

公开(公告)日：2013-04-04

申请号：JP2012273613

申请日：2012-12-14

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VISSER HUIBERT ,  PIETER WILLEM HERMAN DE JAGER ,  HENRI JOHANNES PETRUS VINK ,  MEIJERINK MARCUS GERARDUS HENDRIKUS

IPC: G03F7/20 ,  G02B3/00 ,  H01L21/027

CPC classification number: G03F7/70558 ,  G03F7/70041

Abstract: PROBLEM TO BE SOLVED: To provide a radiation beam conditioning system comprising at least three optical paths in which the radiation is conditioned.SOLUTION: A radiation beam conditioning system for conditioning a pulsed beam of radiation comprises: a radiation beam divider that divides the pulsed beam of radiation at least along first, second and third optical paths; a radiation beam combiner that re-combines pulses of radiation at least from the first, second and third optical paths to form a single output pulsed beam of radiation; and a radiation pulse trimmer that is configured in association with pulses of radiation that propagates along the first optical path. The radiation pulse trimmer trims pulses of radiation within the first optical path, such that the total energy amount of the single output pulsed beam of radiation is substantially a predetermined level. The optical path lengths of the first, second and third optical paths are different between the radiation beam divider and the radiation beam combiner.

Abstract translation: 要解决的问题：提供一种包括至少三个光路的辐射束调节系统，其中辐射被调节。 解决方案：用于调节脉冲辐射束的辐射束调节系统包括：至少沿着第一，第二和第三光路分割辐射束的辐射束分割器; 辐射束组合器，其至少从第一，第二和第三光路重新组合辐射的脉冲，以形成单个输出脉冲的辐射束; 以及辐射脉冲微调器，其被配置为与沿着第一光路传播的辐射脉冲相关联。 辐射脉冲微调器修整第一光路内的辐射脉冲，使得单个输出的脉冲辐射束的总能量量基本上是预定水平。 第一，第二和第三光路的光路长度在辐射束分割器和辐射束组合器之间是不同的。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2006295175A

公开(公告)日：2006-10-26

申请号：JP2006105872

申请日：2006-04-07

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： BASELMANS JOHANNES JACOBUS MAT ,  VISSER HUIBERT ,  VINK HENRI JOHANNES P

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70291 ,  G03F7/70308

Abstract: PROBLEM TO BE SOLVED: To provide a system and a method that increase light intensity efficiency and contrast. SOLUTION: A system and method utilize a lithographic apparatus comprising an illumination system 102, an individually controllable element array 104, and a projection system 108. The illumination system 102 conditions a radiation beam. The individually controllable element array 104 modulates the beam. At least one group of elements in the individually controllable element array 104 is tilted to the same tilt direction at least with the same tilt sign. For example, tilting can form one or more blazing portions (such as blazing super pixel portions) in the individually controllable element array 104. The projection system 108 projects the modulated beam onto a target portion of a substrate. The projection system 108 includes an aperture that filters out undesired diffraction orders of the modulated beam. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供增加光强度效率和对比度的系统和方法。 解决方案：系统和方法利用包括照明系统102，独立可控元件阵列104和投影系统108的光刻设备。照明系统102调节辐射束。 独立可控元件阵列104调制光束。 可独立控制的元件阵列104中的至少一组元件至少以相同的倾斜符号倾斜到相同的倾斜方向。 例如，倾斜可以在单独可控元件阵列104中形成一个或多个燃烧部分（例如燃烧的超像素部分）。投影系统108将调制的光束投影到基板的目标部分上。 投影系统108包括滤除调制束的不希望的衍射级的孔。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2003100626A

公开(公告)日：2003-04-04

申请号：JP2002245963

申请日：2002-07-23

Applicant: ASML NETHERLANDS BV

Inventor： BLEEKER ARNO JAN ,  DE JAGER PIETER WILLEM HERMAN ,  HINTERSTEINER JASON DOUGLAS ,  KRUIZINGA BORGERT ,  MCCARTHY MATTHEW EUGENE ,  OSKOTSKY MARK ,  RYZHIKOV LEV ,  SAKIN LEV ,  SMIRNOV STANISLAV ,  SNIJDERS BART ,  VAN DER MAST KAREL DIEDERICK ,  VISSER HUIBERT

IPC: G03F7/20 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide an imaging apparatus capable of using for the manufacture of an integrated circuit and other (semiconductor) devices as a commercially charming alternative plan instead of using a conventional lithographic projector (a method using a mask). SOLUTION: The imaging apparatus comprises a radiant ray system for supplying a projection beam of radiant ray, a supporting structure for supporting a pattern forming means effecting a pattern formation in accordance with the desired pattern, a substrate table for retaining a substrate, and a projection system for projecting a beam formed through the pattern formation on the target part of the substrate. The pattern formation means comprises a plurality of individual pattern formation subelements to produce subbeams formed through pattern formation, by using respective subelements. The imaging apparatus comprises a combining means for combining a plurality of subbeams formed through the pattern formation, to a single image formed through the pattern formation.