公开(公告)号：JP2009188383A

公开(公告)日：2009-08-20

申请号：JP2008315117

申请日：2008-12-11

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE JONG ANTHONIUS MARTINUS COR ,  JANSEN HANS ,  VUGTS JOSEPHUS CORNELIUS JOHAN ,  VAN DER DONCK JACQUES COR JOHA ,  VAN DEN DOOL TEUNIS CORNELIS ,  OOSTERHUIS GERRIT

IPC: H01L21/027 ,  G03F7/20

CPC classification number: B08B3/02 ,  B08B5/02 ,  G03F7/70341 ,  G03F7/70925

Abstract: PROBLEM TO BE SOLVED: To solve a problem of contamination to a liquid immersed lithographic apparatus introduced via immersion liquid or via another mechanism. SOLUTION: The method for cleaning liquid immersed lithographic apparatus utilizes an aerosol spray to be guided to the surface to be cleaned. The aerosol spray utilizes an inert gas such as nitrogen or carbon dioxide, and as a solid or a liquid, water such as ultrapure water, another solvent or a cleaning fluid. Spray from the aerosol is enclosed in a space. If the aerosol collides with the surface to be cleaned, contaminated substances are removed. The removed contaminating substances are guided to an aerosol spray orifice or an outlet together with substances discharged from the outlet (a gas and a liquid and/or a solid). COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：解决通过浸没液引入的液浸式光刻设备或通过其他机构的污染问题。 解决方案：用于清洗液浸光刻设备的方法利用气溶胶喷雾器被引导到待清洁的表面。 气溶胶喷雾使用惰性气体如氮气或二氧化碳，以及作为固体或液体的水，例如超纯水，另一溶剂或清洗液。 从气溶胶喷雾被封闭在一个空间中。 如果气溶胶与要清洁的表面碰撞，则污染物质被去除。 去除的污染物质与从出口排放的物质（气体和液体和/或固体）一起被引导到气溶胶喷雾孔或出口。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：NL1036273A1

公开(公告)日：2009-06-19

申请号：NL1036273

申请日：2008-12-03

Applicant: ASML NETHERLANDS BV

Inventor： JONG ANTHONIUS MARTINUS CORNELIS ,  JANSEN HANS ,  VUGTS JOSEPHUS CORNELIUS JOHAN ,  DONCK JACQUES COR JOHAN VAN DE ,  DOOL TEUNIS CORNELIS VAN DEN ,  OOSTERHUIS GERRIT

IPC: G03F7/20