公开(公告)号：JP2007300142A

公开(公告)日：2007-11-15

申请号：JP2007207924

申请日：2007-08-09

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KLOMP ALBERT JAN HENDRIK ,  HOOGKAMP JAN FREDERIK ,  VISSER RAIMOND ,  VUGTS JOSEPHUS CORNELIUS JOHAN ,  VULLINGS HENRICUS J L M ,  KUIPERS LEO W M ,  FRANSSEN JOHANNES HENDRIKUS GE

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/677 ,  H01L21/68

CPC classification number: G03F7/70975 ,  G03F7/7075 ,  G03F7/70858 ,  G03F7/70991 ,  Y10S414/135 ,  Y10S414/139

Abstract: PROBLEM TO BE SOLVED: To provide a load lock with temperature regulation, a lithography system equipped with a load lock, and a method for producing a substrate using the load lock. SOLUTION: An object, e.g. a substrate W, is transferred into/from a lithography system. Load lock outer walls 38 and 40 define at least a part of the load lock volume for containing support units 33 and 141 which support the object W when it is in the load lock. Furthermore, the load lock has a structure for temperature regulation to control the temperature of the object at least before it is transferred from the load lock toward the lithography system. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供具有温度调节的负载锁定，配备有负载锁定的光刻系统以及使用该装载锁制造衬底的方法。 解决方案：一个对象，例如 衬底W被转移到/从光刻系统中。 负载锁外壁38和40限定了装载锁定体积的至少一部分，用于容纳在物体W处于装载锁定状态时支撑物体W的支撑单元33和141。 此外，负载锁具有用于温度调节的结构，以至少在从负载锁转移到光刻系统之前控制物体的温度。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2004343068A

公开(公告)日：2004-12-02

申请号：JP2004067524

申请日：2004-03-10

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： KLOMP ALBERT JAN HENDRIK ,  HOOGKAMP JAN FREDERIK ,  VUGTS JOSEPHUS CORNELIUS JOHAN ,  LIVESEY ROBERT GORDON ,  FRANSSEN JOHANNES HENDRIKUS GE

IPC: H01L21/677 ,  G03F7/20 ,  H01L21/027 ,  H01L21/68

CPC classification number: G03F7/70975 ,  G03F7/7075 ,  G03F7/70858 ,  G03F7/70991

Abstract: PROBLEM TO BE SOLVED: To increase the throughput of a lithography projection assembly. SOLUTION: The lithography projection assembly comprises at least one load-lock for transferring an article, especially a substrate, between a first environment and a second environment preferably having a pressure lower than that in the first environment, an article handler including a handler chamber which can be reached by the second environment, and a lithography projector including a projection chamber. The handler chamber and the projection chamber can be interconnected in order to transfer an article. The load-lock comprises a load-lock chamber, a means for exhausting the load-lock chamber, and a door means for closing the load-lock chamber during exhaust operation and opening the load-lock chamber in order to feed the article into the load-lock chamber or taking out the article therefrom. The load-lock chamber is provided with at least two positions for supporting different articles. COPYRIGHT: (C)2005,JPO&NCIPI

公开(公告)号：JP2009188383A

公开(公告)日：2009-08-20

申请号：JP2008315117

申请日：2008-12-11

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE JONG ANTHONIUS MARTINUS COR ,  JANSEN HANS ,  VUGTS JOSEPHUS CORNELIUS JOHAN ,  VAN DER DONCK JACQUES COR JOHA ,  VAN DEN DOOL TEUNIS CORNELIS ,  OOSTERHUIS GERRIT

IPC: H01L21/027 ,  G03F7/20

CPC classification number: B08B3/02 ,  B08B5/02 ,  G03F7/70341 ,  G03F7/70925

Abstract: PROBLEM TO BE SOLVED: To solve a problem of contamination to a liquid immersed lithographic apparatus introduced via immersion liquid or via another mechanism. SOLUTION: The method for cleaning liquid immersed lithographic apparatus utilizes an aerosol spray to be guided to the surface to be cleaned. The aerosol spray utilizes an inert gas such as nitrogen or carbon dioxide, and as a solid or a liquid, water such as ultrapure water, another solvent or a cleaning fluid. Spray from the aerosol is enclosed in a space. If the aerosol collides with the surface to be cleaned, contaminated substances are removed. The removed contaminating substances are guided to an aerosol spray orifice or an outlet together with substances discharged from the outlet (a gas and a liquid and/or a solid). COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：解决通过浸没液引入的液浸式光刻设备或通过其他机构的污染问题。 解决方案：用于清洗液浸光刻设备的方法利用气溶胶喷雾器被引导到待清洁的表面。 气溶胶喷雾使用惰性气体如氮气或二氧化碳，以及作为固体或液体的水，例如超纯水，另一溶剂或清洗液。 从气溶胶喷雾被封闭在一个空间中。 如果气溶胶与要清洁的表面碰撞，则污染物质被去除。 去除的污染物质与从出口排放的物质（气体和液体和/或固体）一起被引导到气溶胶喷雾孔或出口。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008124462A

公开(公告)日：2008-05-29

申请号：JP2007287992

申请日：2007-11-06

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VAN DEN HEUVEL MARTINUS WILHEL ,  FRANKEN JOHANNES CHRISTIAAN LE ,  VUGTS JOSEPHUS CORNELIUS JOHAN

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/709 ,  F04C2/18 ,  F04C15/0049 ,  F04C15/062 ,  G03F7/70341 ,  G03F7/70875 ,  G03F7/70991

Abstract: PROBLEM TO BE SOLVED: To provide a liquid-flowing conduit system, especially a liquid-flowing conduit system of an immersion system wherein vibration caused by liquid compression in a pump chamber and vibration caused by liquid flow or liquid compression are reduced. SOLUTION: The conduit system for a lithographic apparatus includes at least one conduit for guiding a liquid or liquid/gas mixture, and a gas injection nozzle configured to introduce a gas in the liquid or liquid/gas mixture to at least partially absorb pressure peaks or waves in the liquid or liquid/gas mixture. In an embodiment the gas injection nozzle is arranged in a pump of the conduit system. The pump further includes a pump inlet, a pump outlet and the pump chamber between the pump inlet and the pump outlet for compression of the liquid or liquid/gas mixture. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种液体流通管道系统，特别是一种浸液系统的液体流动管道系统，其中由泵室中的液体压缩引起的振动和由液体流动或液体压缩引起的振动减少。 解决方案：用于光刻设备的导管系统包括用于引导液体或液体/气体混合物的至少一个导管，以及气体注入喷嘴，其构造成将液体或液体/气体混合物中的气体引入至少部分吸收 液体或液体/气体混合物中的压力峰值或波动。 在一个实施例中，气体注入喷嘴布置在管道系统的泵中。 泵还包括泵入口，泵出口和在泵入口和泵出口之间的泵室，用于压缩液体/液体/气体混合物。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2004343065A

公开(公告)日：2004-12-02

申请号：JP2004067361

申请日：2004-03-10

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： KLOMP ALBERT JAN HENDRIK ,  HOOGKAMP JAN FREDERIK ,  VISSER RAIMOND ,  VUGTS JOSEPHUS CORNELIUS JOHAN ,  VULLINGS HENRICUS J L M ,  KUIPERS LEO W M ,  FRANSSEN JOHANNES HENDRIKUS GE

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/68

CPC classification number: G03F7/70975 ,  G03F7/7075 ,  G03F7/70858 ,  G03F7/70991 ,  Y10S414/135 ,  Y10S414/139

Abstract: PROBLEM TO BE SOLVED: To provide a load lock with temperature regulation, a lithography system equipped with a load lock, and a method for producing a substrate using the load lock. SOLUTION: An object, e.g. a substrate W, is transferred into/from a lithography system. Load lock outer walls 38 and 40 define at least a part of the load lock volume for containing support units 33 and 141 which support the object W when it is in the load lock. Furthermore, the load lock has a structure for temperature regulation to control the temperature of the object at least before it is transferred from the load lock toward the lithography system. COPYRIGHT: (C)2005,JPO&NCIPI

公开(公告)号：SG115630A1

公开(公告)日：2005-10-28

申请号：SG200401152

申请日：2004-03-09

Applicant: ASML NETHERLANDS BV

Inventor： KLOMP ALBERT JAN HENDRIK ,  HOOGKAMP JAN FREDERIK ,  VISSER RAIMOND ,  VUGTS JOSEPHUS CORNELIUS JOHAN ,  VULLINGS HENRICUS JOHANNES LOU ,  KUIPERS LEO WILHELMUS MARIA ,  FRANSSEN JOHANNES HENDRIKUS GE

IPC: G03F7/20 ,  H01L21/68 ,  H01L21/027

Abstract: A load lock for a lithographic apparatus is arranged to transfer an object, like a substrate, into and from the lithographic apparatus. The load lock outer wall defining at least part of a load lock volume accommodating a support unit for supporting the object when in the load lock. The load lock also has a temperature conditioned structure to control the temperature of the object to a desired temperature at least before the object is transferred from the load lock towards the lithographic projection apparatus.

公开(公告)号：SG115629A1

公开(公告)日：2005-10-28

申请号：SG200401151

申请日：2004-03-09

Applicant: ASML NETHERLANDS BV

Inventor： VAN GROOS PIETER JOHANNES MARI ,  HOOGKAMP JAN FREDERIK ,  KLOMP ALBERT JAN HENDRIK ,  LOOPSTRA ERIK ROELOF ,  VERMEULEN JOHANNES PETRUS MART ,  VUGTS JOSEPHUS CORNELIUS JOHAN ,  LIVESEY ROBERT GORDON ,  FRANSSEN JOHANNES HENDRIKUS GE

IPC: H01L21/677 ,  G03F7/20 ,  H01L21/027 ,  H01L21/683

Abstract: A method of and apparatus for maintaining a machine part arranged in an interior space of a machine, where the interior space is kept at a first pressure and is separated from an environment having a second pressure via a load lock. The method includes transporting a machine part via the load lock out of the interior space and transporting via the load lock into the interior space one of the maintained machine part and a separate replacement machine part.

公开(公告)号：NL1036273A1

公开(公告)日：2009-06-19

申请号：NL1036273

申请日：2008-12-03

Applicant: ASML NETHERLANDS BV

Inventor： JONG ANTHONIUS MARTINUS CORNELIS ,  JANSEN HANS ,  VUGTS JOSEPHUS CORNELIUS JOHAN ,  DONCK JACQUES COR JOHAN VAN DE ,  DOOL TEUNIS CORNELIS VAN DEN ,  OOSTERHUIS GERRIT

IPC: G03F7/20

公开(公告)号：SG143137A1

公开(公告)日：2008-06-27

申请号：SG2007172216

申请日：2007-10-26

Applicant: ASML NETHERLANDS BV

Inventor： VAN DEN HEUVEL MARTINUS WILHEL ,  FRANKEN JOHANNES CHRISTIAAN LE ,  VUGTS JOSEPHUS CORNELIUS JOHAN

Abstract: Conduit System for a Lithographic Apparatus, Lithographic Apparatus, Pump, and Method for Substantially Reducing Vibrations in a Conduit System A conduit system for a lithographic apparatus includes at least one conduit for guiding a liquid or liquid-gas mixture, and a gas injection nozzle configured to introduce a gas in the liquid or liquid-gas mixture to at least partially absorb pressure peaks or waves in said liquid or liquid-gas mixture. In an embodiment the gas injection nozzle may be arranged in a pump of the conduit system. The pump further includes a pump inlet, a pump outlet and a pump chamber between the pump inlet and the pump outlet for compression of the liquid or liquid-gas mixture.

公开(公告)号：SG115631A1

公开(公告)日：2005-10-28

申请号：SG200401159

申请日：2004-03-09

Applicant: ASML NETHERLANDS BV

Inventor： KLOMP ALBERT JAN HENDRIK ,  HOOGKAMP JAN FREDERIK ,  VUGTS JOSEPHUS CORNELIUS JOHAN ,  LIVESEY ROBERT GORDON ,  FRANSSEN JOHANNES HENDRIKUS GE

IPC: H01L21/677 ,  G03F7/20 ,  H01L21/027

Abstract: A load lock is constructed and arranged to transfer a substrate between a first environment and a second environment and to maintain each of the first environment and the second environment therein. The load lock includes a load lock chamber provided with at least two mutually distinct substrate supports positioned one above the other. Each of the substrate supports includes a substrate displacement element. The load lock also includes an evacuation device constructed and arranged to evacuate the load lock chamber, and a door constructed and arranged to close the load lock chamber during evacuation and for opening the load lock chamber.