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    Measurement apparatus and method
    1.
    发明专利
    Measurement apparatus and method 有权
    测量装置和方法

    公开(公告)号：JP2010034553A

    公开(公告)日：2010-02-12

    申请号：JP2009168332

    申请日：2009-07-17

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： BOUMAN WILLEM JAN ,  MULDER HEINE MELLE ,  ENDENDIJK WILFRED EDWARD ,  OTTE ROB

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03B27/54 ,  G03F7/70075 ,  G03F7/70091 ,  G03F7/7085

    Abstract: PROBLEM TO BE SOLVED: To provide a measurement/control apparatus capable of solving one or more problems related to use of an array of individually controllable elements, and/or a method related thereto. SOLUTION: This method of controlling this measurement apparatus for determining a property of an individually controllable element of an array of individually controllable elements, the array of individually controllable elements being capable of controlling a distribution of a beam of radiation, is disclosed. The method includes steps of, for a sequence of a plurality of individually controllable elements: guiding a measurement beam of radiation at an individually controllable element of the plurality of individually controllable elements; and detecting the measurement beam once it has been re-guided by the individually controllable element, wherein the sequence in which the method is undertaken for the plurality of individually controllable elements is related to the orientation of the plurality of individually controllable elements when the plurality of individually controllable elements are oriented to control a distribution of a beam of radiation. COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种能够解决与使用独立可控元件的阵列有关的一个或多个问题的测量/控制装置和/或与其相关的方法。 公开了一种控制该测量装置的方法，用于确定独立可控元件阵列的独立可控元件的特性，该独立可控元件阵列能够控制辐射束的分布。 该方法包括以下步骤：针对多个独立可控元件的顺序：在多个独立可控元件的独立可控元件上引导测量辐射束; 并且一旦已经被独立可控元件重新引导，则检测测量光束，其中对于多个独立可控元件进行该方法的顺序与多个独立可控元件的取向有关，当多个独立可控元件 独立可控元件被定向成控制辐射束的分布。 版权所有（C）2010，JPO＆INPIT

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