公开(公告)号：JP2006191080A

公开(公告)日：2006-07-20

申请号：JP2005376941

申请日：2005-12-28

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： LALBAHADOERSING SANJAYSINGH ,  PIETERS MARCO JOHANNES ANNEMAR ,  HAUSCHILD JAN ,  VAN DE VIN COEN

IPC: H01L21/027 ,  G03F9/00

CPC classification number: G03F9/7084 ,  G03F7/70633

Abstract: PROBLEM TO BE SOLVED: To provide the method of measuring information provided by a substrate.
SOLUTION: This substrate comprises feature formed by lithography equipment. This method comprises the steps of projecting light beam on a marker arranged in upper part of and/or near the feature on the substrate, and detecting information provided by this marker using a sensor. Coating is arranged on the substrate. Therefore, when this coating is between the light beam and the feature, the light beam is protected from substantially becoming cause of reading incorrectly information provided by the marker by being reflected.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供由基板提供的测量信息的方法。

解决方案：该基板包括由光刻设备形成的特征。 该方法包括以下步骤：将光束投影在布置在基板上的特征的上部和/或附近的标记上，以及使用传感器检测由该标记提供的信息。 涂层布置在基底上。 因此，当这种涂层在光束和特征之间时，防止光束基本上成为通过反射来读取由标记提供的不正确信息的原因。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2006179915A

公开(公告)日：2006-07-06

申请号：JP2005366092

申请日：2005-12-20

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： HAUSCHILD JAN ,  PIETERS MARCO JOHANNES ANNEMAR ,  VAN DE VIN COEN

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70641

Abstract: PROBLEM TO BE SOLVED: To provide a method and a system for performing a focus test in a lithographic apparatus. SOLUTION: In the method, a substrate includes a layer of a radiation photosensitive material, the substrate is illuminated in the lithographic apparatus by a first focus sensitive feature and a second focus feature, and the substrate is analyzed to provide results of a focus test by the first focus sensitive feature imaged on the substrate. The focus test is performed on a regularly manufactured wafer. When a prescribed statistical characteristic related to the second focus feature imaged on the substrate is entered into a prescribed limit or only when the prescribed statistical characteristic enters into the prescribed limit, the results of the focus test are accepted. The second focus feature may be a focus sensitive feature or a focus insensitive feature. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种用于在光刻设备中进行聚焦测试的方法和系统。 解决方案：在该方法中，衬底包括辐射感光材料层，通过第一焦点敏感特征和第二焦点特征在光刻设备中照射衬底，并且分析衬底以提供结果 通过成像在基底上的第一个焦点敏感特征进行聚焦测试。 聚焦测试在定期生产的晶片上进行。 当与基板上成像的第二焦点特征相关的规定的统计特性被输入规定的限制时，或仅当规定的统计特性进入规定的极限时，接受焦点测试的结果。 第二个焦点特征可以是焦点敏感特征或焦点不敏感特征。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：SG123769A1

公开(公告)日：2006-07-26

申请号：SG200508373

申请日：2005-12-23

Applicant: ASML NETHERLANDS BV

Inventor： LALBAHADOERSING SANJAYSINGH ,  PIETERS MARCO JOHANNES ANNEMAR ,  HAUSCHILD JAN ,  VIN VAN DE COEN

Abstract: A method for measuring information provided by a substrate (W) is disclosed. The substrate (W) includes a feature (300) that has been created by a lithographic apparatus. The method includes projecting a beam of light (100) onto a marker (200) disposed above and/or near the feature (300) on the substrate (W), and detecting information provided by the marker (200) with a sensor. A coating (330) is disposed on the substrate (W) so that the coating (330) lies between the beam of light (100) and the feature (300) to substantially prevent the beam of light (100) from being reflected by the feature (300) and causing an inaccurate readout of the information provided by the marker (200).