公开(公告)号：JP2006191046A

公开(公告)日：2006-07-20

申请号：JP2005372933

申请日：2005-12-26

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： HAUSCHILD JAN

IPC: H01L21/027

CPC classification number: G02B27/0075 ,  G03F7/70108 ,  G03F7/70125 ,  G03F7/70191 ,  G03F7/70641 ,  G03F9/7026

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus which can be used by combining with (E)UV radiation.
SOLUTION: A method of performing an inclined focal test including each step of generating a target object, a projection beam for irradiation, at least one reflective device, and a projection beam for first projected irradiation on the target object by using at least one reflective device in a first direction, comprises steps of: providing a second projection beam with an inclination against the first projection beam by using an inclination device for inclining at least one reflective device in a second direction; generating a projection beam of a second projected irradiation on the target object; determining the lateral movement of the first and second projected projection beams on the target object; and determining the focal deviation of the target object against the projected projection beams from the lateral movement.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供可以通过与（E）UV辐射结合使用的光刻设备。 解决方案：一种执行倾斜焦距测试的方法，包括产生目标物体的每个步骤，用于照射的投影光束，至少一个反射装置和投影光束，用于在目标物体上首先投射照射，至少使用 一个反射装置在第一方向上包括以下步骤：通过使用用于沿至少一个反射装置向第二方向倾斜的倾斜装置来提供具有抵靠第一投影光束的倾斜的第二投影光束; 在目标物体上产生第二投射照射的投影光束; 确定第一和第二投影投影光束在目标物体上的横向运动; 以及从所述横向运动确定所述目标对象相对于所述投影投影光束的焦点偏离。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2007273955A

公开(公告)日：2007-10-18

申请号：JP2007021964

申请日：2007-01-31

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： TEMPELAARS JEFFREY GODEFRIDUS ,  HOFMANS GERARDUS CAROLUS JOHAN ,  OESTERHOLT RENE ,  HAUSCHILD JAN ,  KATTOUW HANS E

IPC: H01L21/027 ,  G01B11/00 ,  G01B21/00 ,  G03F7/20

CPC classification number: G03F9/7034 ,  G03F9/7011 ,  G03F9/7019

Abstract: PROBLEM TO BE SOLVED: To provide an improving method for the calibration of a level sensor or a height sensor in a lithographic device. SOLUTION: In order to reduce the process dependency of substrate position measurement obtained by a level sensor, the method includes step for: compensating the differences between measured values in a plurality of level sensor devices and obtaining at least one calibration value for the level sensor system corresponding to a property of the substrate; and measuring the position of the surface of the substrate using the plurality of level sensor devices based on the at least one calibration value. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供用于光刻设备中的液位传感器或高度传感器的校准的改进方法。 解决方案：为了减少由液位传感器获得的衬底位置测量的工艺依赖性，该方法包括以下步骤：补偿多个液位传感器装置中的测量值之间的差异，并获得至少一个校准值 对应于基板的性质的液位传感器系统; 以及基于所述至少一个校准值，使用所述多个液位传感器装置测量所述基板的表面的位置。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2006210895A

公开(公告)日：2006-08-10

申请号：JP2005372890

申请日：2005-12-26

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： MARTINUS HENDRIKUS ANTONIUS LE ,  DEN BOEF ARIE J ,  BURGHOORN JACOBUS ,  MICKAN UWE ,  VANNER ROELAND NICOLAAS MARIA ,  HAUSCHILD JAN

IPC: H01L21/027 ,  G01B11/00 ,  G01C3/06

CPC classification number: G02B27/0075 ,  G03F7/70641 ,  G03F9/7026

Abstract: PROBLEM TO BE SOLVED: To provide a method of performing a tilted focus testing and an exposure apparatus, capable of easily giving a tilt to the projection beam with a pattern using a tilting device, and capable of easily performing tilted defocus testing, and to provide a device manufactured in accordance with it. SOLUTION: In order to tilt the at least one reflective device to the second orientation, a device for tilting is used. A step for supplying the second projection beam with a tilt to the above first projection beam, and a step for producing a second projected radiation beam onto the target object, are provided along with a step for determining a lateral shift of the first and second projected radiation beams on the target object and, determining from the lateral shift a defocus of the target object with respect to the projected radiation beam. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：为了提供一种执行倾斜聚焦测试和曝光设备的方法，其能够使用倾斜装置以容易地使用倾斜装置的图案倾斜到投影光束，并且能够容易地进行倾斜散焦测试， 并提供根据其制造的装置。 解决方案：为了将至少一个反射装置倾斜到第二取向，使用倾斜装置。 提供将第二投影光束向上述第一投影光束提供倾斜的步骤，以及用于产生第二投影辐射束到目标物体上的步骤，以及用于确定第一和第二投影光束的横向偏移的步骤 在目标物体上的辐射束，并且从横向偏移确定目标物体相对于投射的辐射束的散焦。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2006186368A

公开(公告)日：2006-07-13

申请号：JP2005371980

申请日：2005-12-26

Applicant: ASML NETHERLANDS BV

Inventor： HAUSCHILD JAN ,  DEN BOEF ARIE J ,  ANTONIUS LEENDERS MARTINUS H ,  MICKAN UWE ,  MARIA VANNEER ROELAND N

IPC: H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide an exposure device, tilt equipment, a method for conducting a tilt convergence test, and a device manufactured by the same. SOLUTION: The exposure device is equipped with a lighting system for providing a projection radiation beam, a support structure which is equipped with a pattern and supports equipment functioning to impart a pattern to a section of the projection beam, a table for holding a target object, a projection system for projecting a patterned beam on the target object, and the tilt equipment for providing a tilted projection beam. The tilt equipment is provided substantially on a pupil plane of the projection system. COPYRIGHT: (C)2006,JPO&NCIPI

公开(公告)号：JP2006352112A

公开(公告)日：2006-12-28

申请号：JP2006155593

申请日：2006-06-05

Applicant: ASML NETHERLANDS BV

Inventor： SINKE ARNOLD ,  HAUSCHILD JAN

IPC: H01L21/027 ,  G03F7/20

Abstract: PROBLEM TO BE SOLVED: To improve the compensation of wafer surface topography. SOLUTION: A lithography apparatus includes a substrate table built so that a substrate is held; a projection system constituted so that a radiation beam may be projected on a target part of the substrate through an exposure slit region; a pattern forming device constituted to form a radiation beam pattern formed by giving a pattern in the section of the radiation beam and which focuses the pattern formed radiation beam on the target area of the substrate within a depth of a focus (DOF); and a measuring system constituted so that at least the partial surface topography of the target part is measured. The projection system is configured to form a controlled exposure slit region adjusted so that a surface topography change is equal to or smaller than the depth of the focus on it by adjusting the size of the exposure slit region. COPYRIGHT: (C)2007,JPO&INPIT

公开(公告)号：JP2006191080A

公开(公告)日：2006-07-20

申请号：JP2005376941

申请日：2005-12-28

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： LALBAHADOERSING SANJAYSINGH ,  PIETERS MARCO JOHANNES ANNEMAR ,  HAUSCHILD JAN ,  VAN DE VIN COEN

IPC: H01L21/027 ,  G03F9/00

CPC classification number: G03F9/7084 ,  G03F7/70633

Abstract: PROBLEM TO BE SOLVED: To provide the method of measuring information provided by a substrate.
SOLUTION: This substrate comprises feature formed by lithography equipment. This method comprises the steps of projecting light beam on a marker arranged in upper part of and/or near the feature on the substrate, and detecting information provided by this marker using a sensor. Coating is arranged on the substrate. Therefore, when this coating is between the light beam and the feature, the light beam is protected from substantially becoming cause of reading incorrectly information provided by the marker by being reflected.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供由基板提供的测量信息的方法。

解决方案：该基板包括由光刻设备形成的特征。 该方法包括以下步骤：将光束投影在布置在基板上的特征的上部和/或附近的标记上，以及使用传感器检测由该标记提供的信息。 涂层布置在基底上。 因此，当这种涂层在光束和特征之间时，防止光束基本上成为通过反射来读取由标记提供的不正确信息的原因。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2006179915A

公开(公告)日：2006-07-06

申请号：JP2005366092

申请日：2005-12-20

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： HAUSCHILD JAN ,  PIETERS MARCO JOHANNES ANNEMAR ,  VAN DE VIN COEN

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70641

Abstract: PROBLEM TO BE SOLVED: To provide a method and a system for performing a focus test in a lithographic apparatus. SOLUTION: In the method, a substrate includes a layer of a radiation photosensitive material, the substrate is illuminated in the lithographic apparatus by a first focus sensitive feature and a second focus feature, and the substrate is analyzed to provide results of a focus test by the first focus sensitive feature imaged on the substrate. The focus test is performed on a regularly manufactured wafer. When a prescribed statistical characteristic related to the second focus feature imaged on the substrate is entered into a prescribed limit or only when the prescribed statistical characteristic enters into the prescribed limit, the results of the focus test are accepted. The second focus feature may be a focus sensitive feature or a focus insensitive feature. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种用于在光刻设备中进行聚焦测试的方法和系统。 解决方案：在该方法中，衬底包括辐射感光材料层，通过第一焦点敏感特征和第二焦点特征在光刻设备中照射衬底，并且分析衬底以提供结果 通过成像在基底上的第一个焦点敏感特征进行聚焦测试。 聚焦测试在定期生产的晶片上进行。 当与基板上成像的第二焦点特征相关的规定的统计特性被输入规定的限制时，或仅当规定的统计特性进入规定的极限时，接受焦点测试的结果。 第二个焦点特征可以是焦点敏感特征或焦点不敏感特征。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：SG123769A1

公开(公告)日：2006-07-26

申请号：SG200508373

申请日：2005-12-23

Applicant: ASML NETHERLANDS BV

Inventor： LALBAHADOERSING SANJAYSINGH ,  PIETERS MARCO JOHANNES ANNEMAR ,  HAUSCHILD JAN ,  VIN VAN DE COEN

Abstract: A method for measuring information provided by a substrate (W) is disclosed. The substrate (W) includes a feature (300) that has been created by a lithographic apparatus. The method includes projecting a beam of light (100) onto a marker (200) disposed above and/or near the feature (300) on the substrate (W), and detecting information provided by the marker (200) with a sensor. A coating (330) is disposed on the substrate (W) so that the coating (330) lies between the beam of light (100) and the feature (300) to substantially prevent the beam of light (100) from being reflected by the feature (300) and causing an inaccurate readout of the information provided by the marker (200).