公开(公告)号：SG128443A1

公开(公告)日：2007-01-30

申请号：SG200303964

申请日：2003-07-09

Applicant: ASML NETHERLANDS BV

Inventor： FRANKEN DOMINICUS JACOBUS PETR ,  LOOPSTRA ERIK ROELOF ,  BARTRAY PETRUS RUTGERUS ,  WIJST VAN DER MARC WILHELMUS M ,  RENKENS MICHAEL JOZEFA MATHIJS ,  SCHOTHORST VAN GERARD DRIES JO

IPC: F16F15/02 ,  G03F7/00 ,  G03F7/20 ,  H01L21/027

Abstract: A lithographic apparatus is provided in which the projection system (PL) is compliantly mounted on a reference frame (5) which in turn is compliantly mounted on the base (BP) which supports the apparatus. Therefore any vibrations and displacement errors in the base (BP) are filtered through two sets of compliant mounts (6, 7) and therefore disturbance of the projection system (PL) is reduced.