公开(公告)号：JP2007251195A

公开(公告)日：2007-09-27

申请号：JP2007128365

申请日：2007-05-14

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JANSSEN HENDRICUS WILHELMUS A ,  RENKENS MICHAEL JOZEFA MATHIJS ,  TABOR ROB ,  VIJFVINKEL JAKOB ,  SCHNEIDER RONALD MAARTEN ,  BISSCHOPS THEODORUS HUBERTUS J

IPC: H01L21/027 ,  G03F7/20

CPC classification number: F16C29/025 ,  F16C32/0603 ,  F16C33/748 ,  F16C2300/62 ,  F16F15/0275 ,  G03F7/70816 ,  G03F7/70841 ,  G03F7/709

Abstract: PROBLEM TO BE SOLVED: To provide a bearing means used for a lithograph projecting device, which prevents horizontal vibration transmission, enables displacement in a horizontal surface of a supported object, prevents horizontal vibration transmission of the object, and can be used within a vacuum chamber.
SOLUTION: A lithographic projection apparatus comprises a vacuum chamber having a wall enclosing at least one of first and second object tables. The object table or each object table within the vacuum chamber is connected to a positioning means in a projection system of the apparatus. The positioning means is provided with a pneumatic gravity compensator 40 comprising a piston associated with the object table; a gas-filled pressure chamber in which the gas in the pressure chamber acting on the movable member to counteract the weight of the object table; a gas bearing; and an evacuating means for evacuating gas escaping towards the vacuum chamber through a gap between the movable member and a bearing surface of a cylindrical housing. A partially flexible rod connects the piston to the object table.
COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：为了提供一种用于防止水平振动传播的平版印刷投影装置的轴承装置，能够在被支撑物体的水平表面中的位移，防止物体的水平振动传播，并且可以在 一个真空室。 解决方案：光刻投影设备包括真空室，其具有围绕第一和第二目标表中的至少一个的壁。 真空室内的物体表或每个物体表与设备的投影系统中的定位装置连接。 定位装置设置有气动重力补偿器40，气动重力补偿器40包括与对象台相关联的活塞; 气体填充压力室，其中压力室中的气体作用在可动构件上以抵消物体台的重量; 气体轴承; 以及用于通过可动构件和圆柱形壳体的支承表面之间的间隙将气体排出到真空室的排气装置。 部分柔性杆将活塞连接到物体台。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2004158829A

公开(公告)日：2004-06-03

申请号：JP2003293218

申请日：2003-07-09

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： FRANKEN DOMINICUS JACOBUS PETR ,  LOOPSTRA ERIK ROELOF ,  BARTRAY PERTRUS RUTGERUS ,  VAN DER WIJST MARK WILHELMUS M ,  RENKENS MICHAEL JOZEFA MATHIJS ,  SCHOTHORST GERARD VAN ,  DRIES JOHAN JULIANA

IPC: F16F15/02 ,  G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70833 ,  G03F7/709

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus for supporting a projection frame so that vibration transmitted to the projection frame and positional errors are reduced as compared with a conventional device.
SOLUTION: The lithographic apparatus in which a projection system (PL) is compliantly mounted on a reference frame (5) which in turn is compliantly mounted on a base (BP) supporting the apparatus is provided. Therefore vibrations and displacement errors in the base (BP) are filtered through two sets of compliant mounts (6, 7) and therefore the disturbance of the projection system (PL) is reduced.
COPYRIGHT: (C)2004,JPO

公开(公告)号：DE60110731T2

公开(公告)日：2006-01-12

申请号：DE60110731

申请日：2001-11-26

Applicant: ASML NETHERLANDS BV

Inventor： DRIESSEN JOHANNES CORNELIS ,  SOEMERS HERMANUS MATHIAS JOANN ,  RENKENS MICHAEL JOZEFA MATHIJS ,  BISSCHOPS THEODORUS HUBERTUS J ,  VERMEULEN JOHANNES PETRUS MART ,  RIJKEN ANTONIUS MARIA

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/68

Abstract: A lithographic projection apparatus includes conduits which supply utilities to components in a vacuum chamber such as object tables and/or associated motors and/or sensors. The conduits are shielded from exposure to the vacuum by conduit conducts having at least the same number of degrees of freedom as their associated object table.

公开(公告)号：DE60132944T2

公开(公告)日：2009-02-19

申请号：DE60132944

申请日：2001-04-12

Applicant: ASML NETHERLANDS BV

Inventor： JANSSEN HENDRICUS WILHELMUS AL ,  RENKENS MICHAEL JOZEFA MATHIJS ,  TABOR ROB ,  VIJFVINKEL JAKOB ,  SCHNEIDER RONALD MAARTEN ,  BISSCHOPS THEODORUS HUBERTUS J

IPC: G03F7/20 ,  H01L21/027

Abstract: A lithographic projection apparatus comprises a vacuum chamber having a wall enclosing at least one of first and second object tables, the or each object table within the vacuum chamber being connected to positioning means for positioning the object table with respect to a projection system of the apparatus. The positioning means is provided with a pneumatic gravity compensator comprising a piston associated with the object table; a gas-filled pressure chamber, the gas in the pressure chamber acting on the movable member to at least partially counteract the weight of the object table; a gas bearing; and evacuating means for evacuating gas escaping through a gap between the movable member and a bearing surface of a cylindrical housing towards the vacuum chamber. A partially flexible rod connects the piston to the object table.

公开(公告)号：DE60125105D1

公开(公告)日：2007-01-25

申请号：DE60125105

申请日：2001-07-06

Applicant: ASML NETHERLANDS BV

Inventor： BENSCHOP JOZEF PETRUS HENRICUS ,  NOORDMAN OSCAR FRANSISCUS JOZE ,  RENKENS MICHAEL JOZEFA MATHIJS ,  LOOPSTRA ERIK ROELOF ,  BANINE VADIM YEVGENYEVICH ,  MOORS JOHANNES HUBERTUS JOSEPH ,  VAN DIJSSELDONK ANTONIUS JOHAN

IPC: G01B21/00 ,  G03F7/20 ,  H01L21/027

Abstract: A lithographic projection apparatus includes a radiation system for supplying a projection beam PB of radiation having a propagation direction, a support structure MT for supporting patterning structure, the patterning structure serving to pattern the projection beam according to a desired pattern MA, a substrate table WT for holding a substrate and a projection system PL for projecting the patterned beam PB onto a target portion C of the substrate W, wherein the lithographic projection apparatus further comprises a sensor MM for measuring a movement of the projection beam PB perpendicular to its propagation direction and a controller CM to control a received dose of said projection beam PM on a target portion C of the substrate W in response to an output from said sensor MM.

公开(公告)号：DE60125105T2

公开(公告)日：2007-06-06

申请号：DE60125105

申请日：2001-07-06

Applicant: ASML NETHERLANDS BV

Inventor： BENSCHOP JOZEF PETRUS HENRICUS ,  NOORDMAN OSCAR FRANSISCUS JOZE ,  RENKENS MICHAEL JOZEFA MATHIJS ,  LOOPSTRA ERIK ROELOF ,  BANINE VADIM YEVGENYEVICH ,  MOORS JOHANNES HUBERTUS JOSEPH ,  VAN DIJSSELDONK ANTONIUS JOHAN

IPC: G01B21/00 ,  G03F7/20 ,  H01L21/027

Abstract: A lithographic projection apparatus includes a radiation system for supplying a projection beam PB of radiation having a propagation direction, a support structure MT for supporting patterning structure, the patterning structure serving to pattern the projection beam according to a desired pattern MA, a substrate table WT for holding a substrate and a projection system PL for projecting the patterned beam PB onto a target portion C of the substrate W, wherein the lithographic projection apparatus further comprises a sensor MM for measuring a movement of the projection beam PB perpendicular to its propagation direction and a controller CM to control a received dose of said projection beam PM on a target portion C of the substrate W in response to an output from said sensor MM.

公开(公告)号：DE60110731D1

公开(公告)日：2005-06-16

申请号：DE60110731

申请日：2001-11-26

Applicant: ASML NETHERLANDS BV

Inventor： DRIESSEN JOHANNES CORNELIS ,  SOEMERS HERMANUS MATHIAS JOANN ,  RENKENS MICHAEL JOZEFA MATHIJS ,  BISSCHOPS THEODORUS HUBERTUS J ,  VERMEULEN JOHANNES PETRUS MART ,  RIJKEN ANTONIUS MARIA

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/68

Abstract: A lithographic projection apparatus includes conduits which supply utilities to components in a vacuum chamber such as object tables and/or associated motors and/or sensors. The conduits are shielded from exposure to the vacuum by conduit conducts having at least the same number of degrees of freedom as their associated object table.

公开(公告)号：DE60132944D1

公开(公告)日：2008-04-10

申请号：DE60132944

申请日：2001-04-12

Applicant: ASML NETHERLANDS BV

Inventor： JANSSEN HENDRICUS WILHELMUS AL ,  RENKENS MICHAEL JOZEFA MATHIJS ,  TABOR ROB ,  VIJFVINKEL JAKOB ,  SCHNEIDER RONALD MAARTEN ,  BISSCHOPS THEODORUS HUBERTUS J

IPC: G03F7/20 ,  H01L21/027

Abstract: A lithographic projection apparatus comprises a vacuum chamber having a wall enclosing at least one of first and second object tables, the or each object table within the vacuum chamber being connected to positioning means for positioning the object table with respect to a projection system of the apparatus. The positioning means is provided with a pneumatic gravity compensator comprising a piston associated with the object table; a gas-filled pressure chamber, the gas in the pressure chamber acting on the movable member to at least partially counteract the weight of the object table; a gas bearing; and evacuating means for evacuating gas escaping through a gap between the movable member and a bearing surface of a cylindrical housing towards the vacuum chamber. A partially flexible rod connects the piston to the object table.

公开(公告)号：SG128443A1

公开(公告)日：2007-01-30

申请号：SG200303964

申请日：2003-07-09

Applicant: ASML NETHERLANDS BV

Inventor： FRANKEN DOMINICUS JACOBUS PETR ,  LOOPSTRA ERIK ROELOF ,  BARTRAY PETRUS RUTGERUS ,  WIJST VAN DER MARC WILHELMUS M ,  RENKENS MICHAEL JOZEFA MATHIJS ,  SCHOTHORST VAN GERARD DRIES JO

IPC: F16F15/02 ,  G03F7/00 ,  G03F7/20 ,  H01L21/027

Abstract: A lithographic apparatus is provided in which the projection system (PL) is compliantly mounted on a reference frame (5) which in turn is compliantly mounted on the base (BP) which supports the apparatus. Therefore any vibrations and displacement errors in the base (BP) are filtered through two sets of compliant mounts (6, 7) and therefore disturbance of the projection system (PL) is reduced.