Patent search ap:("ASML NETHERLANDS BV") AND inv:"SWINKELS GERARDUS HUBERTUS" Page 1

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发明专利
Radiation source, lithographic apparatus and device manufacturing method. 未知

公开(公告)号：NL2003202A1

公开(公告)日：2010-02-02

申请号：NL2003202

申请日：2009-07-15

Applicant: ASML NETHERLANDS BV

Inventor： KLAASSEN MICHEL , GROENEVELD ROGIER , STRUYCKEN ALEXANDER , SWINKELS GERARDUS HUBERTUS

IPC: H05G2/00 , G03F7/20

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