Lithographic apparatus
    1.
    发明专利
    Lithographic apparatus 有权
    LITHOGRAPHIC设备

    公开(公告)号:JP2007129212A

    公开(公告)日:2007-05-24

    申请号:JP2006276276

    申请日:2006-10-10

    CPC classification number: G03F7/707 G03F7/70825 G03F7/7085 G03F7/70858

    Abstract: PROBLEM TO BE SOLVED: To prevent a center of a sensor from moving relative to a substrate table, even if the substrate table thermally expands and contracts. SOLUTION: A circular sensor is mounted to a substrate table WT equipped with three leaf springs that are spaced evenly around a thermal axis of the sensor. The leaf springs are provided in two parts that are mutually attachable and detachable. Although the leaf springs are elastic and allow some movements of the sensor, relative to the substrate table WT on thermal expansion and contraction, the center of the sensor will not move relative to the substrate table. COPYRIGHT: (C)2007,JPO&INPIT

    Abstract translation: 要解决的问题:为了防止传感器的中心相对于基板台移动,即使基板台热膨胀和收缩。 解决方案:将圆形传感器安装到衬底台WT上,该基板台WT配备有围绕传感器的热轴均匀间隔的三个板簧。 板簧设置在相互相连和可拆卸的两部分中。 虽然板簧是弹性的并且允许传感器相对于基板台WT在热膨胀和收缩时的某些运动,但传感器的中心将不会相对于基板移动。 版权所有(C)2007,JPO&INPIT

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