公开(公告)号：JP2009158971A

公开(公告)日：2009-07-16

申请号：JP2009090699

申请日：2009-04-03

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： OTTENS JOOST JEROEN ,  BAKKER LEVINUS PIETER ,  BOX WILHELMUS JOSEPHUS ,  VAN ELP JAN ,  SCHUURMANS FRANK JEROEN PIETER ,  VAN DER WERF JAN EVERT

IPC: H01L21/027 ,  G03F7/20

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/70425 ,  G03F7/70433 ,  H01J37/3026 ,  H01J2237/31764

Abstract: PROBLEM TO BE SOLVED: To provide a device manufacturing method, a lithography device, and a device manufactured by the method. SOLUTION: The device manufacturing method is disclosed wherein a substrate W is provided, a projection beam of radiation PB is provided using an illumination system IL, a patterning means MA is used to impart the projection beam PB with a pattern in its cross section, the patterned beam of radiation PB is projected subsequently to a number of outer target portions CO of the substrate W before the patterned beam is projected to inner target portion CI of the substrate W, wherein each subsequent outer target portion COi+1 is spaced-apart from the outer target portion COi preceding that subsequent outer target portion COi+1. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种器件制造方法，光刻设备以及通过该方法制造的器件。 解决方案：公开了一种器件制造方法，其中设置有衬底W，使用照明系统IL提供辐射PB的投射束，使用图案形成装置MA来使投影光束PB在其十字形中具有图案 在将图案化的光束投影到基板W的内部目标部分CI之前，将图案化的光束束PB随后投射到基板W的多个外部目标部分CO，其中每个随后的外部目标部分COi + 1间隔开 从该后续外部目标部分COi + 1之前的外部目标部分COi释放。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2004047982A

公开(公告)日：2004-02-12

申请号：JP2003160099

申请日：2003-04-30

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： VAN ELP JAN ,  GIESSEN PETER ,  VAN DER VELDE JACOB JAN

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/683 ,  H02N13/00 ,  H01L21/68

CPC classification number: G03F7/70708 ,  G03F7/707 ,  G03F7/7095 ,  H01L21/6831

Abstract: PROBLEM TO BE SOLVED: To obtain a chuck from which a substrate can be removed easily immediately after the potential difference between electrodes is removed and, in addition, which can prevent undesirable changes of position caused by thermal changes due to its low coefficient of thermal expansion. SOLUTION: The chuck is constituted to include at least a first dielectric element 11 having a specific resistance of 10 16 Ωcm and a coefficient of thermal expansion of -6 K -1 . COPYRIGHT: (C)2004,JPO

公开(公告)号：JP2007329506A

公开(公告)日：2007-12-20

申请号：JP2007218716

申请日：2007-08-24

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： TINNEMANS PATRICIUS ALOYSIUS J ,  BUIS EDWIN JOHAN ,  DONDERS SJOERD NICOLAAS LAMBER ,  VAN ELP JAN ,  HOOGKAMP JAN FREDERIK ,  VAN MEER ASCHWIN LODEWIJK HEND ,  SMULDERS PATRICK JOHANNES CORN ,  SPANJERS FRANCISCUS ANDREAS CO ,  VERMEULEN JOHANNES PETRUS MART ,  VISSER RAIMOND ,  TEGENBOSCH HENRICUS GERARDUS ,  VAN DEN BERG JOHANNES CHARLES ,  VAN DE SANDE HENRICUS JOHANNES ,  VERVOORT THIJS

IPC: B08B1/00 ,  H01L21/677 ,  B25J13/08 ,  B65G49/07 ,  G03F7/20 ,  H01L21/027 ,  H01L21/304 ,  H01L21/683 ,  H02N13/00

CPC classification number: G03F7/70741 ,  B25J13/089 ,  G03F7/7075 ,  G03F7/70925 ,  H01L21/6833 ,  H02N13/00

Abstract: PROBLEM TO BE SOLVED: To provide a method of effectively compensating for a positional shift including a tilt between a substrate and a supporting structure and a vertical displacement when moving the substrate in a lithographic projection apparatus using the supporting structure.
SOLUTION: By providing compliant parts (14, 26) in the supporting structure for holding and moving a substrate (W), for example, a supporting frame (18) of a robot arm (10) adaptable to the tilt and/or the vertical displacement. Clamps (20, 22, 24) that the supporting frame (18) comprises may be a Johnson-Raybeck effect type clamp that requires a stringent positional precision, and the cleaning of the inside of the projection apparatus is carried out by using only one substrate.
COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种有效地补偿包括基板和支撑结构之间的倾斜的位置偏移以及在使用支撑结构在光刻投影装置中移动基板时的垂直位移的方法。 解决方案：通过在用于保持和移动衬底（W）的支撑结构中提供柔性部件（14,26），例如适用于倾斜和/或倾斜的机器人臂（10）的支撑框架（18） 或垂直位移。 支撑框架（18）包括的夹具（20,22,24）可以是要求严格的位置精度的Johnson-Raybeck效果型夹具，并且通过仅使用一个基板来执行投影装置的内部的清洁 。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2004343076A

公开(公告)日：2004-12-02

申请号：JP2004102395

申请日：2004-03-31

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： TINNEMANS PATRICIUS ALOYSIUS J ,  BUIS EDWIN JOHAN ,  DONDERS SJOERD NICOLAAS LAMBER ,  VAN ELP JAN ,  HOOGKAMP JAN FREDERIK ,  VAN MEER ASCHWIN LODEWIJK HEND ,  SMULDERS PATRICK JOHANNES CORN ,  SPANJERS FRANCISCUS ANDREAS CO ,  VERMEULEN JOHANNES PETRUS MART ,  VISSER RAIMOND ,  TEGENBOSCH HENRICUS GERARDUS ,  VAN DEN BERG JOHANNES CHARLES ,  VAN DE SANDE HENRICUS JOHANNES ,  VERVOORT THIJS

IPC: B08B1/00 ,  B25J13/08 ,  B65G49/07 ,  G03F7/20 ,  H01L21/027 ,  H01L21/304 ,  H01L21/677 ,  H01L21/683 ,  H02N13/00 ,  H01L21/68

CPC classification number: G03F7/70741 ,  B25J13/089 ,  G03F7/7075 ,  G03F7/70925 ,  H01L21/6833 ,  H02N13/00

Abstract: PROBLEM TO BE SOLVED: To provide a method capable of effectively compensating an inclination between a substrate and a support structure or a misregistration including a displacement in the vertical direction when the substrate is moved by the support structure in a lithographic projection apparatus. SOLUTION: By providing a support structure for holding and moving a substrate (W), for example, flexible sections (14, 26) in a support frame (18) of a robot arm (10), it can be adapted to the tilt and/or a displacement in the vertical direction. Clamps (20, 22, 24) provided on the support frame (18) may be a Johnson-Raybeck effect type clamp, which requires the severe position accuracy, and can perform a cleaning treatment in a projection apparatus by only one substrate. COPYRIGHT: (C)2005,JPO&NCIPI

公开(公告)号：JP2005123627A

公开(公告)日：2005-05-12

申请号：JP2004301690

申请日：2004-10-15

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： OTTENS JOOST JEROEN ,  BAKKER LEVINUS PIETER ,  BOX WILHELMUS JOSEPHUS ,  VAN ELP JAN ,  SCHUURMANS FRANK JEROEN PIETER ,  VAN DER WERF JAN EVERT

IPC: G03F7/20 ,  H01L21/027

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/70425 ,  G03F7/70433 ,  H01J37/3026 ,  H01J2237/31764

Abstract: PROBLEM TO BE SOLVED: To provide a device manufacturing method, a lithographic apparatus, and a device manufactured by it. SOLUTION: The device manufacturing method includes the steps of supplying a substrate W, supplying a projection radiation beam PB by using an illumination system IL, using a patterning means MA so as to furnish a pattern to a cross-section of the projection beam PB, sequentially projecting the patterned radiation beam PB to some external target parts CO of the substrate W, prior to projecting the beam on an internal target part CI of the substrate W, and separating each of the continuous external target parts CO i+1 , by spaces from external target parts CO i that precede the continuous external parts CO i+1 . COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种器件制造方法，光刻设备及其制造的器件。 解决方案：器件制造方法包括以下步骤：使用图案形成装置MA提供衬底W，通过使用照明系统IL提供投影辐射束PB，以便向突起的横截面提供图案 在将光束投射到基板W的内部目标部分CI之前，将图案化的辐射束PB顺序地投影到基板W的一些外部目标部分CO，并且分离连续的外部目标部分CO i + 1 ，在外连续的外部部分CO i + 1之前的外部目标部分CO i 之间。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：WO2005057280A3

公开(公告)日：2006-02-02

申请号：PCT/NL2004000826

申请日：2004-11-29

Applicant: ASML NETHERLANDS BV ,  VAN ZWET ERWIN JOHN ,  VAN ELP JAN ,  MOORS JOHANNES HUBERTUS JOSEPH ,  NEERHOF HENDRIK ANTONY JOHANNE ,  OTTENS JOOST JEROEN ,  DE GROOF ADRIANUS MATHIJS MARI ,  KUIPERS LEO WILHELMUS MARIA ,  GIESEN PETER THEODORUS MARIA ,  LE KLUSE MARCO

Inventor： VAN ZWET ERWIN JOHN ,  VAN ELP JAN ,  MOORS JOHANNES HUBERTUS JOSEPH ,  NEERHOF HENDRIK ANTONY JOHANNE ,  OTTENS JOOST JEROEN ,  DE GROOF ADRIANUS MATHIJS MARI ,  KUIPERS LEO WILHELMUS MARIA ,  GIESEN PETER THEODORUS MARIA ,  LE KLUSE MARCO

IPC: G03F7/20 ,  H01L21/00 ,  H01L21/67 ,  H02N13/00

CPC classification number: H01L21/67259 ,  G03F7/707 ,  G03F7/70741 ,  G03F7/7075

Abstract: A lithographic apparatus is disclosed. The lithographic apparatus includes an illumination system for providing a beam of radiation on a flat article to be placed in a beam path of the beam of radiation, and an article handler for handling the article during placement or removal of the article. The article handler includes an electrode and a dielectric layer in order to form an electrostatic clamp for electrostatically clamping the article.

Abstract translation: 公开了一种光刻设备。 光刻设备包括用于在要放置在辐射束的光束路径中的平坦物品上提供辐射束的照明系统，以及用于在放置或移除物品期间处理物品的物品处理器。 物品处理器包括电极和电介质层，以便形成用于静电夹紧物品的静电夹。

公开(公告)号：WO2005062127A3

公开(公告)日：2006-01-05

申请号：PCT/NL2004000898

申请日：2004-12-22

Applicant: ASML NETHERLANDS BV ,  VAN ELP JAN

Inventor： VAN ELP JAN

IPC: G03F7/20

CPC classification number: G03F7/707 ,  G03F7/70808 ,  G03F7/70825 ,  G03F7/7095

Abstract: A method for joining at least two members of a lithographic apparatus is disclosed. The method includes providing a first member (1), providing a second member (2), direct-bonding the first member and the second member to form a direct-bond, and anodically bonding the first member and the second member. At least one of the members includes ultra low expansion glass and/or ultra low expansion glass ceramics.

Abstract translation: 公开了一种用于连接光刻设备的至少两个构件的方法。 该方法包括提供第一构件（1），提供第二构件（2），直接结合第一构件和第二构件以形成直接结合，以及阳极接合第一构件和第二构件。 至少一个构件包括超低膨胀玻璃和/或超低膨胀玻璃陶瓷。

公开(公告)号：DE60319087T2

公开(公告)日：2009-02-05

申请号：DE60319087

申请日：2003-10-16

Applicant: ASML NETHERLANDS BV

Inventor： OTTENS JOOST JEROEN ,  BOX WILHELMUS JOSEPHUS ,  VAN ELP JAN

IPC: G03F7/20 ,  H01J37/302 ,  H01L21/027

Abstract: A device manufacturing method, wherein a substrate (W) is provided, wherein a projection beam of radiation (PB) is provided using an illumination system (IL), wherein patterning means (MA) are used to impart the projection beam (PB) with a pattern in its cross-section, wherein the patterned beam of radiation (PB) is projected subsequently onto a number outer target portions (CO) of the substrate (W) before the patterned beam is projected onto inner target portions (CI) of the substrate (W), wherein each subsequent outer target portion (CO i+1 ) is spaced-apart from the outer target portion (COi) preceding that subsequent outer target portion (CO i+1 ).

公开(公告)号：DE60319087D1

公开(公告)日：2008-03-27

申请号：DE60319087

申请日：2003-10-16

Applicant: ASML NETHERLANDS BV

Inventor： OTTENS JOOST JEROEN ,  BOX WILHELMUS JOSEPHUS ,  VAN ELP JAN

IPC: G03F7/20 ,  H01J37/302 ,  H01L21/027

Abstract: A device manufacturing method, wherein a substrate (W) is provided, wherein a projection beam of radiation (PB) is provided using an illumination system (IL), wherein patterning means (MA) are used to impart the projection beam (PB) with a pattern in its cross-section, wherein the patterned beam of radiation (PB) is projected subsequently onto a number outer target portions (CO) of the substrate (W) before the patterned beam is projected onto inner target portions (CI) of the substrate (W), wherein each subsequent outer target portion (CO i+1 ) is spaced-apart from the outer target portion (COi) preceding that subsequent outer target portion (CO i+1 ).

公开(公告)号：DE60336189D1

公开(公告)日：2011-04-14

申请号：DE60336189

申请日：2003-04-29

Applicant: ASML NETHERLANDS BV

Inventor： VAN ELP JAN ,  GIESEN PETER ,  VAN DER VELDE JACOB JAN

IPC: G03F7/20 ,  G03F9/00 ,  H01L21/00 ,  H01L21/027 ,  H01L21/68 ,  H01L21/683 ,  H02N13/00