公开(公告)号：JP2010147471A

公开(公告)日：2010-07-01

申请号：JP2009281727

申请日：2009-12-11

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VAN WEERT CORNELIS LAMBERTUS MARIA ,  VAN DE KERKHOF MARCUS A ,  MOEST BEARRACH

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70066

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus whose surface material such as a coating is prevented from deteriorating. SOLUTION: A lithographic apparatus includes a table, at least two target portions on the table or on an object on the table, and a surface material between the at least two target portions. The lithography apparatus further includes an optical system configured to project an emitted beam, along an optical path towards the table, with a cross-section to irradiate the at least two target portions at the same time. The lithography apparatus further includes a shield movable into the optical path to restrict the cross-section of the emitted beam to restrict irradiation between the at least two target portions, wherein the surface material between the at least two target portions degrades when irradiated with the emitted beam through the optical system. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 解决的问题：提供防止表面材料如涂层劣化的光刻设备。 解决方案：光刻设备包括桌子，桌子上的至少两个目标部分或桌子上的物体上的至少两个目标部分和至少两个目标部分之间的表面材料。 光刻设备还包括一个光学系统，该光学系统配置成沿着光学路径朝着工作台投影发射的光束，同时具有横截面以同时照射至少两个目标部分。 光刻设备还包括可移动到光路中的屏蔽件，以限制发射光束的横截面以限制至少两个目标部分之间的照射，其中当被发射的光束照射时，至少两个目标部分之间的表面材料降解 光束通过光学系统。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：SG162690A1

公开(公告)日：2010-07-29

申请号：SG2009083841

申请日：2009-12-15

Applicant: ASML NETHERLANDS BV

Inventor： VAN WEERT CORNELIS LAMBERTUS MARIA ,  VAN DE KERKHOF MARCUS ADRIANUS ,  MOEST BEARRACH

Abstract: A lithographic apparatus is disclosed that includes a table, at least two target portions on the table or on an object on the table, and a surface material between the at least two target portions. The apparatus further includes an optical system configured to project a beam of radiation, along an optical path towards the table, with a cross-section to irradiate the at least two target portions at the same time. The apparatus further includes a shield moveable into the optical path to restrict the cross- section of the beam of radiation to restrict illumination between the at least two target portions, wherein the surface material between the at least two target portions would degrade when irradiated with radiation from the optical system.