公开(公告)号：JP2006186287A

公开(公告)日：2006-07-13

申请号：JP2004382894

申请日：2004-12-27

Applicant: ASML NETHERLANDS BV

Inventor： BRUINSMA ANASTASIUS JACOBUS AN ,  STAALS FRANK ,  VAN WIJK ROBERT JAN ,  NIHTIANOV STOYAN

IPC: H01L21/027 ,  G01B17/00 ,  G03F9/02

Abstract: PROBLEM TO BE SOLVED: To provide a level sensor which is used to measure the height of a substrate in a lithographic projection device, can be also used for a single-stage immersion lithographic device, has no process dependency, is of high reaction rate, and is of a kind different from a conventional type. SOLUTION: The level sensor includes a transmitter 10 and a receiver 11. The transmitter is configured to transmit a pressure wave 100 to a predetermined position on the surface of a substrate between the substrate W and a projection system PS, and to allow the substrate W to reflect at least a part of the pressure wave. The receiver receives at least a part of the reflected wave. The level sensor is configured to determine the height of the surface in the substrate W based on the pressure wave transmitted and received. The level sensor can be used for immersion process, quickly works and has a scarce process dependency, because the pressure wave is used. COPYRIGHT: (C)2006,JPO&NCIPI