公开(公告)号：KR20200125986A

公开(公告)日：2020-11-05

申请号：KR20207028249

申请日：2019-02-12

Applicant: ASML NETHERLANDS BV

Inventor： ALTINI VALERIO ,  STAALS FRANK

IPC: G03F7/20 ,  G03F9/00

Abstract: 기판에걸쳐조명프로파일을스캐닝하여그 위에기능영역들을형성하도록구성되는스캐닝노광장치를제어하는방법이개시된다. 상기방법은스캐닝노광작업에서, 기능영역들을포함하는노광필드의노광동안조명프로파일의동적제어를위한제어프로파일을얻는단계; 및개별적인기능영역의노광품질을최적화하는단계를포함한다. 최적화하는단계는 a) 스캐닝방향으로노광필드의범위를넘어제어프로파일을확장하는단계; 및/또는 b) 제어프로파일에디컨볼루션방식을적용하는단계를포함할수 있고, 디컨볼루션방식의구조는스캐닝방향으로의조명프로파일의치수에기초한다.

公开(公告)号：JP2006186287A

公开(公告)日：2006-07-13

申请号：JP2004382894

申请日：2004-12-27

Applicant: ASML NETHERLANDS BV

Inventor： BRUINSMA ANASTASIUS JACOBUS AN ,  STAALS FRANK ,  VAN WIJK ROBERT JAN ,  NIHTIANOV STOYAN

IPC: H01L21/027 ,  G01B17/00 ,  G03F9/02

Abstract: PROBLEM TO BE SOLVED: To provide a level sensor which is used to measure the height of a substrate in a lithographic projection device, can be also used for a single-stage immersion lithographic device, has no process dependency, is of high reaction rate, and is of a kind different from a conventional type. SOLUTION: The level sensor includes a transmitter 10 and a receiver 11. The transmitter is configured to transmit a pressure wave 100 to a predetermined position on the surface of a substrate between the substrate W and a projection system PS, and to allow the substrate W to reflect at least a part of the pressure wave. The receiver receives at least a part of the reflected wave. The level sensor is configured to determine the height of the surface in the substrate W based on the pressure wave transmitted and received. The level sensor can be used for immersion process, quickly works and has a scarce process dependency, because the pressure wave is used. COPYRIGHT: (C)2006,JPO&NCIPI

公开(公告)号：JP2011166143A

公开(公告)日：2011-08-25

申请号：JP2011023571

申请日：2011-02-07

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KOEHLER CARSTEN ANDREAS ,  LAAN HANS VAN DER ,  DE WINTER LAURENTIUS CORNELIUS ,  GODFRIED HERMAN PHILIP ,  STAALS FRANK

IPC: H01L21/027

CPC classification number: G03F7/70333 ,  G03F7/70575

Abstract: PROBLEM TO BE SOLVED: To control a laser radiation spectrum emitted by a laser radiation source, thereby allowing a lithographic apparatus to more accurately project patterns on a substrate.
SOLUTION: A lithographic method includes: a step of calculating laser metric based on a spectrum of a laser radiation emitted to the lithographic apparatus from a laser and representation of an aerial image of the pattern projected on the substrate by the lithographic apparatus; a step of either changing operation of the laser or adjusting the lithographic apparatus by using the laser metric; and a step of projecting the pattern on the substrate.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：为了控制由激光辐射源发射的激光辐射光谱，从而允许光刻设备更准确地在基板上投影图案。 光刻方法包括：基于从激光发射到光刻设备的激光辐射的光谱和由光刻设备投射在基板上的图案的空间图像的表示来计算激光度量的步骤; 通过使用激光度量来改变激光器的操作或调整光刻设备的步骤; 以及将图案投影在基板上的步骤。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2009231832A

公开(公告)日：2009-10-08

申请号：JP2009060345

申请日：2009-03-13

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KUIT JAN-JAAP ,  STAALS FRANK ,  VAN DER HOFF ALEXANDER HENDRIK

IPC: H01L21/027

CPC classification number: G03F7/70891 ,  G03F7/70533

Abstract: PROBLEM TO BE SOLVED: To provide an additional technology for reducing and/or increasing a lens-heating action. SOLUTION: In the lithographic apparatus, a control system is provided so as to automatically reduce throughput of device manufacture when aberration of lens-heating exceeds a specific threshold value. Determination whether the aberration of lens-heating exceeds the threshold value, is obtained by, for example, prediction using a lens-heating model or measurement of a previously exposed substrate. Reduction of the throughput can be achieved by reducing beam power or duty-cycle of the apparatus. In a specific embodiment, time required for substrate transfer between exposed portions is increased. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供用于减少和/或增加镜片加热动作的附加技术。 解决方案：在光刻设备中，提供控制系统，以便在镜片加热的像差超过特定阈值时自动降低器件制造的吞吐量。 通过例如使用透镜加热模型的预测或先前曝光的基板的测量来确定透镜加热的像差是否超过阈值。 可以通过减小装置的光束功率或占空比来实现吞吐量的降低。 在具体实施例中，暴露部分之间的衬底转移所需的时间增加。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2013123048A

公开(公告)日：2013-06-20

申请号：JP2012257658

申请日：2012-11-26

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： PETER DAVID ENGBLOM ,  KOEHLER CARSTEN ANDREAS ,  STAALS FRANK ,  DE WINTER LAURENTIUS CORNELIUS

IPC: H01L21/027 ,  G02B19/00 ,  G03F7/20

CPC classification number: G03F7/70425 ,  G03F1/144 ,  G03F1/36 ,  G03F7/70433 ,  G03F7/70441

Abstract: PROBLEM TO BE SOLVED: To provide a method and a device that can be used to reduce a range in which an assist feature is exposed to light in a resist on a substrate.SOLUTION: A method for projecting a pattern from a patterning device on a substrate by using a projection system includes applying phase correction to radiation diffracted from an assist feature of a pattern by using a light phase adjustment device in the projection system. The phase correction acts to reduce the size of an assist feature image exposed to light in a resist on the substrate or prevent printing of the assist feature image in the resist on the substrate, as well as to maintain contribution to strengthening of an image of a function feature of a pattern by the assist feature image.

Abstract translation: 要解决的问题：提供可用于减少辅助特征暴露于基板上的抗蚀剂中的光的范围的方法和装置。 解决方案：通过使用投影系统从图案形成装置将图案投影在基板上的方法包括通过在投影系统中使用光相位调节装置对从图案的辅助特征衍射的辐射进行相位校正。 相位校正用于减小在基板上的抗蚀剂中暴露于光的辅助特征图像的尺寸，或者防止辅助特征图像在基板上的抗蚀剂中的印刷，并且保持对图像的加强的贡献 辅助特征图像的图案功能特征。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2009188408A

公开(公告)日：2009-08-20

申请号：JP2009026370

申请日：2009-02-06

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BURRY DAVID WARREN ,  RALPH BRINKHOF ,  STAALS FRANK ,  FRANKEN ROBERT ,  KOOP ERIK JOHAN

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03B27/32 ,  G03B27/68 ,  G03F7/70516

Abstract: PROBLEM TO BE SOLVED: To provide a method having better focus control. SOLUTION: A method for deciding exposure setting for a target field on a substrate in a lithography exposure process includes to provide calibration data by deciding a location of a calibration field in a first direction in a plurality of calibration locations in a second direction and a third direction in relation to the calibration field. Further, the method includes to provide production data by deciding a position of a target field on a substrate in the second and the third directions, and by measuring a position of an exposure field in the first direction in at least one measurement position in relation to the exposure field in the second and the third directions. Furthermore, the method includes: to perform comparisons between at least one first measured relative position and a plurality of relative calibration positions; and to use the comparisons for deciding the exposure setting on the basis of a measured position of the exposure field in the first direction and the calibration data, in relation to at least one relative calibration position in which the calibration data is different from at least one measured relative position. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供具有更好的聚焦控制的方法。 解决方案：在光刻曝光处理中用于确定基板上的目标场的曝光设置的方法包括：通过在第二方向上的多个校准位置中确定第一方向上的校准场的位置来提供校准数据 和相对于校准场的第三方向。 此外，该方法包括通过在第二和第三方向上确定基板上的目标场的位置来提供生产数据，并且通过在至少一个测量位置相对于第一方向测量第一方向上的曝光场的位置 第二和第三方向的曝光场。 此外，该方法包括：执行至少一个第一测量的相对位置和多个相对校准位置之间的比较; 并且基于与第一方向上的曝光场的测量位置和校准数据相对于校准数据与至少一个校准数据不同的至少一个相对校准位置来使用比较来确定曝光设置 测量相对位置。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2012191205A

公开(公告)日：2012-10-04

申请号：JP2012047558

申请日：2012-03-05

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS ,  OTTENS JOOST JEROEN ,  EUSSEN EMIEL JOZEF MELANIE ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  WILLIAM PETER VAN DRENT ,  STAALS FRANK ,  MACHT LUKASZ JERZY ,  ERIK WILLEM BOGAART

IPC: H01L21/027 ,  G01B11/00 ,  G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/70725 ,  G03F7/70775 ,  G03F7/70833 ,  G03F7/709

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus including a position measurement system for accurately measuring a substrate table position.SOLUTION: The lithographic apparatus comprises: a substrate table position measurement system for measuring a substrate table position; and a projection system position measurement system for measuring a projection system position. The substrate table position measurement system comprises: a substrate table reference element mounted on the substrate table; and a first sensor head. The substrate table reference element extends in a measurement plane substantially parallel to a holding plane of a substrate on the substrate table. The holding plane is arranged at one side of the measurement plane and the first sensor head is arranged at an opposite side of the measurement plane. The projection system position measurement system includes one or more projection system reference elements and a sensor assembly. The sensor head and the sensor assembly or the associated projection system measurement elements are mounted on a sensor frame.

Abstract translation: 要解决的问题：提供一种包括用于精确测量衬底台位置的位置测量系统的光刻设备。 光刻设备包括：用于测量衬底台位置的衬底台位置测量系统; 以及用于测量投影系统位置的投影系统位置测量系统。 衬底台位置测量系统包括：安装在衬底台上的衬底台参考元件; 和第一传感器头。 衬底台参考元件在基本上平行于衬底台上的衬底的保持平面的测量平面中延伸。 保持平面布置在测量平面的一侧，第一传感器头布置在测量平面的相对侧。 投影系统位置测量系统包括一个或多个投影系统参考元件和传感器组件。 传感器头和传感器组件或相关联的投影系统测量元件安装在传感器框架上。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2011139060A

公开(公告)日：2011-07-14

申请号：JP2010281884

申请日：2010-12-17

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STAALS FRANK ,  VEN DE KERKHOF MARCUS ADRIANUS

IPC: H01L21/027 ,  G01B11/00 ,  G03F7/20

CPC classification number: G03F9/7003 ,  G03F9/7034

Abstract: PROBLEM TO BE SOLVED: To reduce time for measuring level fluctuations on a substrate surface. SOLUTION: A lithographic device includes a patterning sub-system transferring a pattern from a patterning device to a substrate (W). The patterning sub-system is controlled according to a recorded result of measurement of the level fluctuations of the recorded substrate surface. Level sensors (LSP, LSD) are disposed to project level sensing radiation beams, reflect them from the position on the substrate surface, and detect the reflected sensing beams to measure the surface level of the position. Each level sensor includes at least one moving optical element (MP, MD) and at least one-dimensionally scans the substrate surface by optical movement (δY) to obtain the result of measurement of the surface levels of different positions without mechanical operation between the level sensor and the substrate. An optical path length-equalizing means is disposed to avoid focus fluctuations during scanning by using a molded reflector and/or an additional moving mirror. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：减少测量衬底表面上的电平波动的时间。 解决方案：光刻设备包括将图案从图案形成装置传送到衬底（W）的图案化子系统。 图案化子系统根据记录的基板表面的电平波动的测量记录结果进行控制。 液位传感器（LSP，LSD）被设置为投影水平感测辐射束，从基板表面上的位置反射它们，并且检测反射的感测光束以测量位置的表面水平。 每个水平传感器包括至少一个移动光学元件（MP，MD），并且通过光学运动（δY）至少一维地扫描基板表面，以获得不同位置的表面水平的测量结果，而无需机械操作 传感器和基板。 设置光路长度均衡装置，以通过使用模制的反射器和/或附加的移动镜来避免扫描期间的焦点波动。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2009194368A

公开(公告)日：2009-08-27

申请号：JP2008309423

申请日：2008-12-04

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： MAGNUSSON SVEN GUNNAR KRISTER ,  MARTIN JULES MARIE-EMILE DE NI ,  STAALS FRANK ,  TEL WIM TJIBBO

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70066

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus improved in the curvature compensation of a substrate. SOLUTION: A lighting system is configured to form a slit type image on the flat plane of a patterning device. The slit type image has a curved shape with a slit curvature in a scanning direction, a length LS in the scanning direction, and a rectangular width for a scanning direction Y. The slit type image is configured to generate a curved pattern image of a patterned radiation beam on the image flat plane of a projection system. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供改善基板的曲率补偿的光刻设备。 解决方案：照明系统被配置为在图案形成装置的平面上形成狭缝型图像。 狭缝型图像具有在扫描方向上具有狭缝曲率，扫描方向上的长度LS和扫描方向Y的矩形宽度的弯曲形状。狭缝型图像被配置为生成图案化的弯曲图案图像 辐射束在投影系统的图像平面上。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2011142319A

公开(公告)日：2011-07-21

申请号：JP2010280598

申请日：2010-12-16

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STAALS FRANK ,  VAN DER LAAN HANS ,  HOFMANS GERARDUS CAROLUS JOHANNUS ,  MAGNUSSON SVEN GUNNAR KRISTER ,  BUTLER HANS

IPC: H01L21/027 ,  H01L21/68

CPC classification number: G03F7/709 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/70666 ,  G03F7/70725 ,  G03F9/7088

Abstract: PROBLEM TO BE SOLVED: To improve the measurement of a variability of MSD that influences the uniformity of CD.
SOLUTION: A test method includes operating a lithographic apparatus several times while deliberately imposing a relatively large dynamic positioning error at different specific frequencies and axes (504). Variations (CDU) in the error (CD) in an applied pattern are measured for different frequencies and amplitudes of the injected error over a frequency band of interest for a given axis. Calculation using the measurements and knowledge of the frequencies injected (508, 510) allows analysis of dynamic positioning error variations in frequency bands correlated with each injected error frequency. Based on parameters of patterning operations and a relationship between the injected axis and the measured axis, a correlation function (CF) is used in the calculation. A CD sensitivity is measured by operating the apparatus at a reduced speed and injecting errors at frequencies determined by the null frequency of scanning slit filter response.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：改善影响CD均匀性的MSD变异性的测量。 解决方案：测试方法包括多次操作光刻设备，同时在不同的特定频率和轴处故意施加相对大的动态定位误差（504）。 对于给定轴的感兴趣频带上的注入误差的不同频率和幅度，测量应用模式中误差（CD）中的变化（CDU）。 使用测量和注入频率知识进行计算（508,510）可以分析与每个注入的误差频率相关的频带中的动态定位误差变化。 基于图案化操作的参数和注入轴与测量轴之间的关系，在计算中使用相关函数（CF）。 通过以降低的速度操作设备并且以由扫描狭缝滤波器响应的零频率确定的频率注入误差来测量CD灵敏度。 版权所有（C）2011，JPO＆INPIT