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    Suppression of damage of lithographic device by immersion
    1.
    发明专利
    Suppression of damage of lithographic device by immersion 有权
    通过浸没来抑制光刻设备的损伤

    公开(公告)号：JP2007013159A

    公开(公告)日：2007-01-18

    申请号：JP2006177816

    申请日：2006-06-28

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： VAN DER MEULEN FRITS ,  COX HENRIKUS HERMAN MARIE ,  HOUKES MARTIJN ,  VAN VLIET ROBERTUS J ,  NIHTIANOV STOYAN ,  KEMPER PETRUS WILHELMUS J M ,  HANEGRAAF ROLAND P HENDRIKUS

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70341

    Abstract: PROBLEM TO BE SOLVED: To provide a lithographic device which is so improved that damage due to especially collision and leakage, etc. in an immersion device is suppressed, related to an immersion lithographic projector. SOLUTION: This lithographic projector includes a calculator which calculates numerical quantities relating to a void dimension between a fluid supply system and a substrate table for holding a substrate based on numerical quantities relating to a position of the substrate table, and that relating to a position of the fluid supply system to prevent the collision between the fluid supply system and the substrate table for holding the substrate. The projector further comprises a damage suppressing system which is so constituted as to generate a warning signal when the numerical quantities relating to the dimension goes beyond a predetermined safety level. COPYRIGHT: (C)2007,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种如此改进的平版印刷装置，其与浸没式光刻投影仪相关的浸没装置中的特别是碰撞和泄漏等的损坏被抑制。 解决方案：该光刻投影仪包括计算器，该计算器基于与衬底台的位置相关的数量计算与流体供应系统和用于保持衬底的衬底台之间的空隙尺寸相关的数量，并且涉及 流体供应系统的位置，以防止流体供应系统和用于保持基板的基板台之间的碰撞。 投影仪还包括损伤抑制系统，其被构造成当与尺寸相关的数值超过预定安全水平时产生警告信号。 版权所有（C）2007，JPO＆INPIT

    Lithographic apparatus, device manufacturing apparatus, device manufactured by the apparatus, and controllable patterning apparatus using spatial light modulator by distributed digital-to-analog conversion
    6.
    发明专利
    Lithographic apparatus, device manufacturing apparatus, device manufactured by the apparatus, and controllable patterning apparatus using spatial light modulator by distributed digital-to-analog conversion 有权
    设备制造设备，装置制造的装置以及使用分布式数字到模拟转换的空间光调制器的可控制图案装置

    公开(公告)号：JP2010045381A

    公开(公告)日：2010-02-25

    申请号：JP2009224795

    申请日：2009-09-29

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： REIJNEN MARTINUS CORNELIS ,  MAKAROVIC ANDREJ ,  KESSELS LAMBERTUS GERARDUS MARIA ,  NIHTIANOV STOYAN ,  KEMPER PETRUS WILLHELMUS JOSEPHUS MARIA ,  KAMEN HRISTOV CHILOV

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70291

    Abstract: PROBLEM TO BE SOLVED: To provide a system and a method that utilize efficient patterning means. SOLUTION: The present invention includes a lithographic apparatus and a device manufacturing method that uses a patterning apparatus that increases the number of individually controllable elements to be simultaneously programmed, in order to increase the update speed of an array of the individually controllable elements. Thus, the number of high-speed analog inputs required for the array is decreased, the complexity of the array is reduced, and the maximum update speed of the array is increased. Furthermore, the number of elements in the array can be increased easily. The patterning apparatus is divided into a plurality of cell groups, and the lithographic apparatus may include a plurality of supply channels. Each supply channel is disposed such that it supplies a voltage signal to each cell that corresponds to the cell group. Thus, the required number of inputs to the patterning apparatus for individually addressing each cell is reduced. COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种利用有效的图案形成装置的系统和方法。 解决方案：本发明包括使用增加可同时编程的独立可控元件的数量的图案形成装置的光刻设备和设备制造方法，以便增加独立可控元件阵列的更新速度 。 因此，阵列所需的高速模拟输入的数量减少，阵列的复杂度降低，阵列的最大更新速度增加。 此外，阵列中的元素的数量可以容易地增加。 图案形成装置被分成多个单元组，并且光刻设备可以包括多个供电通道。 每个供应通道被布置成使得其向与单元组对应的每个单元提供电压信号。 因此，减少了用于单独寻址每个单元的图案形成装置所需的输入数量。 版权所有（C）2010，JPO＆INPIT

    Lithographic apparatus and position sensor
    8.
    发明专利
    Lithographic apparatus and position sensor 审中-公开
    地平面设备和位置传感器

    公开(公告)号：JP2009021590A

    公开(公告)日：2009-01-29

    申请号：JP2008175140

    申请日：2008-07-04

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： VAN BRUGGEN OLAF HUBERTUS WILH ,  AUER FRANK ,  MARCEL KOENRAAD MARIE BAGGEN ,  VAN DER MEULEN FRITS ,  VOGELSANG PATRICK DAVID ,  REIJNEN MARTINUS CORNELIS ,  DASSEL JOHANNES ROLAND ,  NIHTIANOV STOYAN ,  WAKKER REMKO ,  ZUTPHEN TOM VAN

    IPC: H01L21/027 ,  H01L21/68

    CPC classification number: G03F7/70758 ,  G01D5/145 ,  G01D5/2451 ,  G03F7/70775

    Abstract: PROBLEM TO BE SOLVED: To provide a safety system for preventing a collision of a support with another parts, for a lithographic apparatus which has a stationary magnet motor for driving the support such as a substrate support or a patterning device support. SOLUTION: A measurement system for measuring the position of the support. The measurement system measures a magnetic field strength of an alternating magnetic field generated by a magnet assembly of the stationary magnet motor, and/or measures generation of eddy currents in a metallic layer shielding the magnet assembly in combination with an inductance measurement of an electromagnet generating the alternating magnetic field causing the eddy currents, and/or measures light using an optical position sensitive sensor such as a CCD metric or linear photodiode positioned in a light plane emitted by an emitter. COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种用于防止支撑件与另一部件碰撞的安全系统，用于具有用于驱动诸如基板支撑件或图案形成装置支撑件的支撑件的固定磁体电动机的光刻设备。

    解决方案：用于测量支架位置的测量系统。 测量系统测量由固定磁体电动机的磁体组件产生的交变磁场的磁场强度和/或测量在屏蔽磁体组件的金属层中的涡流的产生以及产生电磁体的电感测量 导致涡流的交变磁场，和/或使用诸如位于由发射器发射的光平面中的CCD度量或线性光电二极管的光学位置敏感传感器来测量光。 版权所有（C）2009，JPO＆INPIT

    LEVEL SENSOR, LITHOGRAPHIC DEVICE AND DEVICE MANUFACTURING METHOD
    9.
    发明专利
    LEVEL SENSOR, LITHOGRAPHIC DEVICE AND DEVICE MANUFACTURING METHOD 审中-公开

    公开(公告)号：JP2006186287A

    公开(公告)日：2006-07-13

    申请号：JP2004382894

    申请日：2004-12-27

    Applicant: ASML NETHERLANDS BV

    Inventor： BRUINSMA ANASTASIUS JACOBUS AN ,  STAALS FRANK ,  VAN WIJK ROBERT JAN ,  NIHTIANOV STOYAN

    IPC: H01L21/027 ,  G01B17/00 ,  G03F9/02

    Abstract: PROBLEM TO BE SOLVED: To provide a level sensor which is used to measure the height of a substrate in a lithographic projection device, can be also used for a single-stage immersion lithographic device, has no process dependency, is of high reaction rate, and is of a kind different from a conventional type. SOLUTION: The level sensor includes a transmitter 10 and a receiver 11. The transmitter is configured to transmit a pressure wave 100 to a predetermined position on the surface of a substrate between the substrate W and a projection system PS, and to allow the substrate W to reflect at least a part of the pressure wave. The receiver receives at least a part of the reflected wave. The level sensor is configured to determine the height of the surface in the substrate W based on the pressure wave transmitted and received. The level sensor can be used for immersion process, quickly works and has a scarce process dependency, because the pressure wave is used. COPYRIGHT: (C)2006,JPO&NCIPI

    SENSOR AND LITHOGRAPHIC APPARATUS
    10.
    发明申请
    SENSOR AND LITHOGRAPHIC APPARATUS 审中-公开
    传感器和光刻设备

    公开(公告)号：WO2014067754A2

    公开(公告)日：2014-05-08

    申请号：PCT/EP2013071080

    申请日：2013-10-09

    Applicant: ASML NETHERLANDS BV

    Inventor： NIHTIANOV STOYAN ,  KOK HAICO ,  WEHRENS MARTIJN

    IPC: G03F7/20

    CPC classification number: H01L27/1464 ,  G03F7/70558 ,  G03F7/7085 ,  H01L27/14609 ,  H01L27/14643 ,  H01L27/14689 ,  H01L31/028 ,  H01L31/035281 ,  H01L31/1804

    Abstract: A backside illuminated sensor comprising a supporting substrate, a semiconductor layer which comprises a photodiode comprising a region of n-doped semiconductor provided at a first surface of the semiconductor layer, and a region of p-doped semiconductor, wherein a depletion region is formed between the region of n-doped semiconductor and the region of p-doped semiconductor, and a layer of p-doping protective material provided on a second surface of the semiconductor layer, wherein the first surface of the semiconductor layer is fixed to a surface of the supporting substrate.

    Abstract translation: 一种背照式传感器，包括支撑衬底，包括光电二极管的半导体层，所述光电二极管包括设置在所述半导体层的第一表面处的n掺杂半导体区域和p掺杂半导体区域，其中耗尽区域形成在 n掺杂半导体区域和p掺杂半导体区域，以及设置在半导体层的第二表面上的p-掺杂保护材料层，其中半导体层的第一表面被固定到 支撑基材。

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