公开(公告)号：NL2008239A

公开(公告)日：2012-10-01

申请号：NL2008239

申请日：2012-02-06

Applicant: ASML NETHERLANDS BV

Inventor： VISSER EMIEL ,  ZDRAVKOV ALEXANDER ,  DZIOMKINA NINA

IPC: G03F7/20

Abstract: An immersion lithographic apparatus includes a surface having at least one active group (e.g., lyophobic group) which, during use, comes into contact with immersion liquid, and an immersion liquid supply system configured to provide immersion liquid comprising a protection component which is more reactive with a product of photoionization of the immersion liquid than the active group of the surface, the protection component being present in an amount of between 1 ppm and 0.1 ppm.