公开(公告)号：WO2013113568A3

公开(公告)日：2013-12-12

申请号：PCT/EP2013050818

申请日：2013-01-17

Applicant: ASML NETHERLANDS BV

Inventor： LAFARRE RAYMOND ,  DONDERS SJOERD ,  TEN KATE NICOLAAS ,  DZIOMKINA NINA ,  KARADE YOGESH ,  RODENBURG ELISABETH

IPC: G03F7/20

CPC classification number: B22F7/062 ,  B05D3/06 ,  B05D5/00 ,  B22F3/1055 ,  B23K26/0081 ,  B23K26/342 ,  B23Q3/18 ,  B33Y10/00 ,  B33Y80/00 ,  G03F7/20 ,  G03F7/70341 ,  G03F7/70416 ,  G03F7/707 ,  G03F7/70708 ,  G03F7/70716 ,  G03F7/70733 ,  G03F7/708

Abstract: A substrate holder (100) for a lithographic apparatus has a main body having a thin-film stack (110) provided on a surface thereof. The thin-film stack forms an electronic or electric component such as an electrode, a sensor, a heater, a transistor or a logic device, and has a top isolation layer. A plurality of burls (106) to support a substrate (W) are formed on the thin-film stack or in apertures of the thin-film stack.

Abstract translation: 用于光刻设备的衬底保持器（100）具有在其表面上设置有薄膜叠层（110）的主体。 薄膜堆叠形成诸如电极，传感器，加热器，晶体管或逻辑器件的电子或电气部件，并且具有顶部隔离层。 在薄膜堆叠或薄膜叠层的孔中形成有用于支撑基板（W）的多个毛刺（106）。

公开(公告)号：NL2010140A

公开(公告)日：2013-08-06

申请号：NL2010140

申请日：2013-01-17

Applicant: ASML NETHERLANDS BV

Inventor： LAFARRE RAYMOND ,  DONDERS SJOERD ,  KATE NICOLAAS ,  DZIOMKINA NINA ,  KARADE YOGESH ,  RODENBURG ELISABETH

IPC: G03F7/20 ,  H01L21/683

Abstract: Substrate holder (100) for use in a lithographic apparatus, the substrate holder comprising a main body having a first surface and a second surface opposite the first surface.A plurality of first burls are provided on the first surface, the first burls having end surfaces to support a substrate. A plurality of second burls are provided on the second surface to support the substrate holder on a structure. The plurality of first burls each comprise a lower body portion protruding from the first surface and an upper body portion above the lower body portion, the lower body portions comprise a different material from the upper body portions, and the upper body portions comprise diamond-like carbon.

公开(公告)号：NL2009284A

公开(公告)日：2013-10-31

申请号：NL2009284

申请日：2012-08-06

Applicant: ASML NETHERLANDS BV

Inventor： LAFARRE RAYMOND ,  GRAAF ROELOF ,  ROSET NIEK ,  MARTENS ARJAN ,  ZDRAVKOV ALEXANDER ,  HOEKERD KORNELIS ,  DZIOMKINA NINA

IPC: G03F7/20

公开(公告)号：NL2008239A

公开(公告)日：2012-10-01

申请号：NL2008239

申请日：2012-02-06

Applicant: ASML NETHERLANDS BV

Inventor： VISSER EMIEL ,  ZDRAVKOV ALEXANDER ,  DZIOMKINA NINA

IPC: G03F7/20

Abstract: An immersion lithographic apparatus includes a surface having at least one active group (e.g., lyophobic group) which, during use, comes into contact with immersion liquid, and an immersion liquid supply system configured to provide immersion liquid comprising a protection component which is more reactive with a product of photoionization of the immersion liquid than the active group of the surface, the protection component being present in an amount of between 1 ppm and 0.1 ppm.

公开(公告)号：NL2005657A

公开(公告)日：2011-06-06

申请号：NL2005657

申请日：2010-11-10

Applicant: ASML NETHERLANDS BV

Inventor： DZIOMKINA NINA

IPC: G03F7/20

Abstract: A method of forming a lyophobic coating on a surface having oxidized groups is disclosed. The method includes bringing into contact with the surface a silane or siloxane having the formula SiX4 wherein each X is the same or different, wherein at least one X is a leaving group and at least one X is a lyophobic group.

公开(公告)号：NL2007768A

公开(公告)日：2012-06-18

申请号：NL2007768

申请日：2011-11-10

Applicant: ASML NETHERLANDS BV

Inventor： LAFARRE RAYMOND ,  TEN KATE NICOLAAS ,  DZIOMKINA NINA ,  KARADE YOGESH

IPC: G03F7/20 ,  H01L21/683

Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of an electronic component such as a thin film electronic component. The planarization layer may be provided in multiple sub layers. The planarization layer may smooth over roughness caused by removal of material from a blank to form burls on the substrate holder.

公开(公告)号：NL2006506A

公开(公告)日：2011-10-31

申请号：NL2006506

申请日：2011-03-31

Applicant: ASML NETHERLANDS BV

Inventor： DZIOMKINA NINA ,  JACOBS JOHANNES ,  RIEPEN MICHEL ,  EVANGELISTA FABRIZIO

IPC: G03F7/20

公开(公告)号：NL2005478A

公开(公告)日：2011-05-18

申请号：NL2005478

申请日：2010-10-07

Applicant: ASML NETHERLANDS BV

Inventor： DZIOMKINA NINA ,  KRUIJF NIEK ,  GRAAF ROELOF ,  KERKHOF MARCUS ,  LEENDERS MARTINUS ,  LIEBREGTS PAULUS ,  ROOIJ GERARDUS ,  HOUBEN MARTIJN ,  BADAM VIJAY ,  SONDAG-HUETHORST JEANNET

IPC: G03F7/20

Abstract: A member is provided to prevent immersion liquid ingress to a gap between components or to adhere to at least one component to provide a surface to a feature of an immersion system. The member has a plastic sealing portion that is adhered to the component(s). The plastic sealing portion is opaque to DUV radiation. It may be resistant to degradation through exposure to DUV radiation. It may have a liquid phobic coating or property.

公开(公告)号：NL2010472A

公开(公告)日：2013-10-23

申请号：NL2010472

申请日：2013-03-19

Applicant: ASML NETHERLANDS BV

Inventor： LAFARRE RAYMOND ,  DZIOMKINA NINA ,  KARADE YOGESH ,  RODENBURG ELISABETH ,  SINGH HARMEET

IPC: H01L21/683 ,  G03F7/20

Abstract: A substrate holder for use in a lithographic apparatus, the substrate holder including: a main body having a surface; a plurality of burls projecting from the surface and having end surfaces to support a substrate; and a thin film stack on the main body surface and forming an electric component, the thin film stack having a conductive layer configured to distribute electrical charge substantially uniformly throughout a plane of the stack in which the conductive layer is positioned.

公开(公告)号：NL2010139A

公开(公告)日：2013-08-06

申请号：NL2010139

申请日：2013-01-17

Applicant: ASML NETHERLANDS BV

Inventor： LAFARRE RAYMOND ,  DONDERS SJOERD ,  KATE NICOLAAS ,  DZIOMKINA NINA ,  KARADE YOGESH ,  RODENBURG ELISABETH

IPC: G03F7/20 ,  H01L21/683

Abstract: Substrate holder (100) for use in a lithographic apparatus, the substrate holder comprising a main body having a first surface and a second surface opposite the first surface.A plurality of first burls are provided on the first surface, the first burls having end surfaces to support a substrate. A plurality of second burls are provided on the second surface to support the substrate holder on a structure. The plurality of first burls each comprise a lower body portion protruding from the first surface and an upper body portion above the lower body portion, the lower body portions comprise a different material from the upper body portions, and the upper body portions comprise diamond-like carbon.