公开(公告)号：NL2004807A

公开(公告)日：2011-01-04

申请号：NL2004807

申请日：2010-06-03

Applicant: ASML NETHERLANDS BV

Inventor： LAFARRE RAYMOND ,  BENSCHOP JOZEF ,  KATE NICOLAAS ,  ROSET NIEK ,  KUSTERS GERARDUS ,  ZDRAVKOV ALEXANDER ,  PATEL HRISHIKESH ,  OPSTAL SANDER

IPC: G03F7/20

公开(公告)号：NL2009284A

公开(公告)日：2013-10-31

申请号：NL2009284

申请日：2012-08-06

Applicant: ASML NETHERLANDS BV

Inventor： LAFARRE RAYMOND ,  GRAAF ROELOF ,  ROSET NIEK ,  MARTENS ARJAN ,  ZDRAVKOV ALEXANDER ,  HOEKERD KORNELIS ,  DZIOMKINA NINA

IPC: G03F7/20

公开(公告)号：NL2008239A

公开(公告)日：2012-10-01

申请号：NL2008239

申请日：2012-02-06

Applicant: ASML NETHERLANDS BV

Inventor： VISSER EMIEL ,  ZDRAVKOV ALEXANDER ,  DZIOMKINA NINA

IPC: G03F7/20

Abstract: An immersion lithographic apparatus includes a surface having at least one active group (e.g., lyophobic group) which, during use, comes into contact with immersion liquid, and an immersion liquid supply system configured to provide immersion liquid comprising a protection component which is more reactive with a product of photoionization of the immersion liquid than the active group of the surface, the protection component being present in an amount of between 1 ppm and 0.1 ppm.

公开(公告)号：NL2007182A

公开(公告)日：2012-02-27

申请号：NL2007182

申请日：2011-07-26

Applicant: ASML NETHERLANDS BV

Inventor： WILLEMS PAUL ,  KATE NICOLAAS ,  KOELINK STEPHAN ,  KRAMER PIETER ,  KUIJPER ANTHONIE ,  ZDRAVKOV ALEXANDER ,  CORTIE ROGIER

IPC: G03F7/20

公开(公告)号：NL2006203A

公开(公告)日：2011-09-19

申请号：NL2006203

申请日：2011-02-15

Applicant: ASML NETHERLANDS BV

Inventor： LAFARRE RAYMOND ,  ROSET NIEK ,  ZDRAVKOV ALEXANDER ,  STOUWDAM JAN ,  BIJL BERNARDUS

IPC: G03F7/20

Abstract: A cover is provided for a substrate table in an immersion lithographic apparatus that covers at least the gap between a substrate and a recess in a substrate table in which the substrate is received.

公开(公告)号：NL2005666A

公开(公告)日：2011-06-21

申请号：NL2005666

申请日：2010-11-11

Applicant: ASML NETHERLANDS BV

Inventor： ROSET NIEK ,  KATE NICOLAAS ,  LAFARRE RAYMOND ,  ZDRAVKOV ALEXANDER

IPC: G03F7/20