公开(公告)号：JP2005354062A

公开(公告)日：2005-12-22

申请号：JP2005166720

申请日：2005-06-07

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： DIERICHS MARCEL MATHIJS THEODO ,  MARKUS FRANCISCUS ANTONIUS EUR ,  VOORMA HARM-JAN ,  FRIJNS OLAV WALDEMAR VLADIMIR

IPC: G01B11/00 ,  G01B11/26 ,  G02B5/08 ,  G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70141

Abstract: PROBLEM TO BE SOLVED: To provide a radiating system including a radiation generator and an illuminating system capable of measuring a relative position of the radiation generator to the illuminating system with the loss of energy suppressed to a minimum level. SOLUTION: The radiating system includes the radiation generator for generating a radiation beam, a radiation source and the illuminating system so as to receive the radiation beam and provide a projected beam of the radiation. The illuminating system includes a beam measuring system for measuring at least any one of the position and gradient of the radiation beam and a projector for re-directing a part of the section of the radiation beam to the beam measuring system. The beam measuring system may include several position sensors, thereby enabling the system to judge the position adjustment of the radiation source to the illuminating system. A diaphragm is connected to a collector of the radiation generator to enable the compensation of Rx, Ry and Rz besides the compensation of X, Y and Z. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种包括辐射发生器和照明系统的辐射系统，其能够以能量损失被抑制到最小水平来测量辐射发生器与照明系统的相对位置。 解决方案：辐射系统包括用于产生辐射束的辐射发生器，辐射源和照明系统，以便接收辐射束并提供投影的辐射束。 照明系统包括用于测量辐射束的位置和梯度中的至少任何一个的光束测量系统和用于将辐射束的该部分的一部分重新引导到光束测量系统的投影仪。 光束测量系统可以包括多个位置传感器，从而使系统能够判断辐射源对照明系统的位置调整。 除了X，Y和Z的补偿之外，隔膜连接到辐射发生器的收集器以使得能够补偿Rx，Ry和Rz。（C）2006，JPO和NCIPI

公开(公告)号：JP2005183982A

公开(公告)日：2005-07-07

申请号：JP2004365802

申请日：2004-12-17

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： VAN DIJSSELDONK ANTONIUS J J ,  MARCEL MATHIJS THEODORE MARIE ,  VOORMA HARM-JAN

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70216 ,  G03F7/70275 ,  G03F7/70308

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic device adapted to reduce design restrictions resulting in a lower production cost.
SOLUTION: The lithographic device includes a radiation attenuator or a variable aperture system, such as masking blades, arranged in or near an intermediate focus of the projection system. In addition to the radiation attenuator or variable aperture system, a measuring system may be arranged in the intermediate focus. By placing one or more of such systems in the intermediate focus of the projection system, instead of near the reticle in the illumination system, it is enabled that fewer design restrictions suffice for the lithographic device because of more space available, thereby resulting in a lower design cost.
COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供适于减少设计限制的光刻设备，从而降低生产成本。 解决方案：光刻设备包括布置在投影系统的中间焦点中或其附近的辐射衰减器或可变孔径系统，例如掩模刀片。 除了辐射衰减器或可变孔径系统之外，测量系统可以布置在中间焦点中。 通过将一个或多个这样的系统放置在投影系统的中间焦点中，而不是靠近照明系统中的掩模版，由于可用的空间更大，使得光刻设备的设计限制更少，从而导致较低的 设计费用。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2007110107A

公开(公告)日：2007-04-26

申请号：JP2006258963

申请日：2006-09-25

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BANINE VADIM YEVGENYEVICH ,  IVANOV VLADIMIR VITAL EVITCH ,  SMITS JOSEPHUS JACOBUS ,  LAMBERTUS ADRIANUS VAN DEN WIL ,  KRIVTSUN VLADIMIR M ,  STRUYCKEN ALEXANDER MATTHIJS ,  RIDDER JOHANNES B ,  VOORMA HARM-JAN ,  SPEE CAROLUS IDA MARIA ANTONIU ,  KLAAS TIMMER

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/304

CPC classification number: G03B7/20 ,  B08B7/00 ,  G01J1/0271 ,  G03F7/70175 ,  G03F7/70916 ,  G03F7/70925 ,  G03F7/70975

Abstract: PROBLEM TO BE SOLVED: To remove a deposit on an optical element such as a radiating condenser of an aligner. SOLUTION: In a method for cleaning a deposit of the radiating condenser; a collector assembly has a radiating condenser, a cover plate, and a support for connecting the radiating condenser to the cover plate. The cover plate is provided so as to cover the opening of a collector chamber 48. The opening may be large enough to allow the passage of the radiating condenser and the support. The radiating condenser is cleaned by different cleaning processing. This processing is performed by a cleaner. The cleaner may include a surrounding cover designed to form a storage capacity surrounding at least the radiating condenser, an inlet configured to supply at least one of cleaning gas and a cleaning solution to the storage capacity to clean at least the radiating condenser, and an outlet configured to remove at least one of the cleaning gas and the cleaning solution from the storage capacity. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：去除诸如对准器的辐射冷凝器的光学元件上的沉积物。 解决方案：用于清洁辐射冷凝器沉积物的方法; 集电器组件具有辐射冷凝器，盖板和用于将辐射冷凝器连接到盖板的支撑件。 盖板设置成覆盖收集器室48的开口。开口可以足够大以允许辐射冷凝器和支撑件通过。 通过不同的清洁处理清洁辐射式冷凝器。 该处理由清洁器执行。 清洁器可以包括设计成形成至少围绕辐射冷凝器的存储容量的周围盖子，被配置为将清洁气体和清洁溶液中的至少一种供应到存储容量以至少清洁辐射冷凝器的入口，以及出口 被配置为从所述存储容量中去除所述清洁气体和所述清洁溶液中的至少一个。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2005277414A

公开(公告)日：2005-10-06

申请号：JP2005079763

申请日：2005-03-18

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： VOORMA HARM-JAN ,  VAN DIJSSELDONK ANTONIUS JOHAN ,  MICKAN UWE

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70558

Abstract: PROBLEM TO BE SOLVED: To provide a variable attenuator of a lithographic device capable of maintaining a high wafer throughput.
SOLUTION: The lithographic device is provided with the variable attenuator A that varies the strength thereof without changing the position of a projected beam so as to be able to control the dose of radiation in a wafer portion, thereby optimizing the throughput of the wafer. The variable attenuator consists of two parallel mirrors 21, 22 in which an input radiation beam is incident on a first mirror, thereby, the input radiation beam incident on the first mirror being reflected towards a second mirror to permit the radiation to be reflected, and which are thus positioned so as to generate an output radiation beam having a strength required to be input into an illuminating system, and of a tilting mechanism which maintains the mirrors in parallel with each other and tilts the mirrors so as to allow the angles of the beams incident on the mirrors to be changed and thereby the strength of the output beams to be changed.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供能够保持高晶圆生产能力的光刻设备的可变衰减器。 解决方案：光刻设备设置有可变衰减器A，其可改变其强度而不改变投影光束的位置，以便能够控制晶片部分中的辐射剂量，从而优化 晶圆。 可变衰减器由两个平行的反射镜21,22组成，其中输入辐射束入射在第一反射镜上，从而入射在第一反射镜上的输入辐射束被反射朝向第二反射镜以允许辐射被反射，以及 它们被定位成产生具有需要输入到照明系统中的强度的输出辐射束，以及将反射镜保持彼此平行并倾斜反射镜的倾斜机构，从而允许 入射到要​​改变的反射镜上的光束，从而改变输出光束的强度。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2005217398A

公开(公告)日：2005-08-11

申请号：JP2005007226

申请日：2005-01-14

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： MOORS JOHANNES HUBERTUS JOSEPH ,  LEONARDUS FRANKEN JOHANNES CHR ,  MICKAN UWE ,  VOORMA HARM-JAN

IPC: G02B17/00 ,  G03F7/20 ,  H01L21/027

CPC classification number: B82Y10/00 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/70891

Abstract: PROBLEM TO BE SOLVED: To provide a lithography apparatus, a device manufacturing method for manufacturing a device with high precision, and a device manufactured by the same. SOLUTION: The lithography apparatus comprises: an illumination system IL for providing a projection beam of radiation PB; and a support structure MT for supporting a patterning means MA. The lithographic apparatus further comprises: a substrate table WT for holding a substrate W; a projection system PL for projecting the patterned beam onto a target portion of the substrate W; and a condenser which is structured to transmit a radiation R, received from a first radiation source SO, to the illumination system IL. The condenser K comprises at least one heater for heating the condenser when a condensing component receives substantially no radiation from the radiation source SO. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种光刻设备，用于制造高精度器件的器件制造方法及其制造方法。 光刻设备包括：照明系统IL，用于提供辐射PB的投影光束; 以及用于支撑图案形成装置MA的支撑结构MT。 光刻设备还包括：用于保持衬底W的衬底台WT; 用于将图案化的光束投影到基板W的目标部分上的投影系统PL; 以及构造成将从第一辐射源SO接收的辐射R传送到照明系统IL的冷凝器。 冷凝器K包括至少一个用于加热冷凝器的加热器，当冷凝部件基本上不接收来自辐射源SO的辐射时。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2004343129A

公开(公告)日：2004-12-02

申请号：JP2004166401

申请日：2004-05-07

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： DAMS JOHANNES ADRIANUS ANTONIU ,  KROON MARK ,  VOORMA HARM-JAN ,  SPEE CAROLUS IDA MARIA ANTONIU

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70983 ,  G03F7/70916

Abstract: PROBLEM TO BE SOLVED: To provide a method for reducing outgassing of a component being employed in the vacuum chamber of a lithography system.
SOLUTION: The preparation processing method comprises steps for: coating a component with a nonmetallic and nonplastic material; and processing the coating to harden. A preferable coating material is hydrogen silsesquioxane (HSQ) which can be applied by various methods (spray, brush coating, spinning) and can be processed through heating or irradiation with an electron beam. A resulting component reduces outgassing of water or hydrocarbon significantly when subjected to a vacuum environment.
COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种减少在光刻系统的真空室中使用的部件的除气的方法。 解决方案：制备处理方法包括以下步骤：用非金属和非塑性材料涂覆组分; 并加工涂层硬化。 优选的涂料是氢倍半硅氧烷（HSQ），其可以通过各种方法（喷雾，刷涂，旋涂）施加，并且可以通过加热或用电子束照射来加工。 当经受真空环境时，所得组分可显着减少对水或烃的除气。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：WO2007148968A3

公开(公告)日：2008-02-28

申请号：PCT/NL2007050295

申请日：2007-06-19

Applicant: ASML NETHERLANDS BV ,  BOX WILHELMUS JOSEPHUS ,  VOORMA HARM-JAN ,  FRIJNS OLAV WALDEMAR VLADIMIR ,  LIMPENS MAURICE PIERRE MARIE A

Inventor： BOX WILHELMUS JOSEPHUS ,  VOORMA HARM-JAN ,  FRIJNS OLAV WALDEMAR VLADIMIR ,  LIMPENS MAURICE PIERRE MARIE A

IPC: G03F7/20

CPC classification number: G03F7/70891 ,  F24J2/10 ,  F24J2/32 ,  F24J2/4621 ,  G02B7/1815 ,  G03F7/70175

Abstract: A collector is disclosed that is constructed to receive radiation from a radiation source and to transmit radiation to an illumination system, the collector comprising a reflective element (11) which is internally provided with a fluid channel (20).

Abstract translation: 公开了一种收集器，其被构造为接收来自辐射源的辐射并将辐射传输到照明系统，该收集器包括在内部设置有流体通道（20）的反射元件（11）。

公开(公告)号：WO2008079008A2

公开(公告)日：2008-07-03

申请号：PCT/NL2007050693

申请日：2007-12-21

Applicant: ASML NETHERLANDS BV ,  VAN HERPEN MAARTEN MARINUS JOH ,  BANINE VADIM YEVGENYEVICH ,  SINGH MANDEEP ,  VOORMA HARM-JAN ,  KLUNDER DERK JAN WILFRED

Inventor： VAN HERPEN MAARTEN MARINUS JOH ,  BANINE VADIM YEVGENYEVICH ,  SINGH MANDEEP ,  VOORMA HARM-JAN ,  KLUNDER DERK JAN WILFRED

IPC: G03F7/20 ,  G21K1/06

CPC classification number: G03F7/70958 ,  B82Y10/00 ,  G03F7/70925 ,  G21K1/062 ,  G21K2201/067

Abstract: An EUV illumination system, for example, for use in a photolithographic apparatus is configured to condition a radiation beam. A hydrogen radical source configured to supply gas containing hydrogen or hydrogen radicals into the illumination system. The hydrogen gas is effective to remove carbonaceous contamination from the surface of a mirror in the illumination system or to form a buffer against unwanted gases. In order to prevent damage by hydrogen that penetrates the mirror, the mirror comprises a layer made of metal non-metal compound adjacent a reflection surface of the mirror. A transition metal carbide, nitride, boride or suicide compound or mixture thereof may be used for example.

Abstract translation: 例如，用于光刻设备的EUV照明系统被配置为调节辐射束。 氢自由基源，被配置为将含有氢或氢自由基的气体供应到照明系统中。 氢气有效地从照明系统中的反射镜表面除去碳质污染物或形成缓冲液以防止不需要的气体。 为了防止穿透反射镜的氢的破坏，反射镜包括与反射镜的反射面相邻的金属非金属化合物制成的层。 可以使用过渡金属碳化物，氮化物，硼化物或硅化物或其混合物。

公开(公告)号：WO2008108643A3

公开(公告)日：2008-11-27

申请号：PCT/NL2008050123

申请日：2008-03-04

Applicant: ASML NETHERLANDS BV ,  VAN VLIET ROLAND EDWARD ,  VOORMA HARM-JAN ,  KEMPEN ANTONIUS THEODORUS WILHELMUS ,  HOVESTAD ARJAN

Inventor： VAN VLIET ROLAND EDWARD ,  VOORMA HARM-JAN ,  KEMPEN ANTONIUS THEODORUS WILHELMUS ,  HOVESTAD ARJAN

IPC: B08B3/04 ,  B08B3/08 ,  B08B3/10 ,  B08B3/12 ,  G03F7/20

CPC classification number: B08B3/08 ,  B08B3/04 ,  B08B3/044 ,  B08B3/10 ,  B08B3/102 ,  B08B3/12 ,  G03F7/70925

Abstract: The invention provides a cleaning process for the removal of deposition on an element (510) of a lithographic apparatus. The method includes (ex situ) treating the element (510) with an alkaline cleaning liquid (502). In this way, Sn may be removed from a contaminant barrier or' a collector mirror. Especially beneficial is the application of a voltage to the element to be cleaned and/or by using complexing agents for improving the dissolution of Sn in the cleaning liquid.

Abstract translation: 本发明提供了用于去除光刻设备的元件（510）上的沉积的清洁方法。 该方法包括（非原地）用碱性清洁液体（502）处理元件（510）。 以这种方式，可以从污染物屏障或“收集器反射镜”去除Sn。 特别有益的是向待清洁的元件施加电压和/或通过使用络合剂来改善Sn在清洗液中的溶解。

公开(公告)号：DE602004024366D1

公开(公告)日：2010-01-14

申请号：DE602004024366

申请日：2004-12-16

Applicant: ASML NETHERLANDS BV

Inventor： VAN DIJSSELDONK ANTONIUS JOHANNES JOSEPHUS ,  DIERICHS MARCEL MATHIJS THEODORE MARIE ,  VOORMA HARM-JAN

IPC: G03F7/20 ,  H01L21/027

Abstract: A lithographic apparatus (1) including a radiation attenuator (25) or a variable aperture system, such as masking blades (31,32), arranged in or near an intermediate focus (23) of the projection system (PL). Besides a radiation attenuator or a variable aperture system, a measuring system (61) may be arranged in the intermediate focus. By placing one or more of such systems in the intermediate focus of the projection system, instead of near the reticle (38) in the illumination system (IL), fewer design restrictions occur because of more space available, resulting in a lower design cost.