公开(公告)号：DE602004029970D1

公开(公告)日：2010-12-23

申请号：DE602004029970

申请日：2004-08-25

Applicant: ASML NETHERLANDS BV

Inventor： DIERICHS MARCEL MATHIJS THEODORE MARIE ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  JANSEN HANS ,  LOOPSTRA ERIK ROELOF ,  MERTENS JEROEN JOHANNES SOPHIA MARIA ,  STAVENGA MARCO KOERT ,  STREEFKERK BOB ,  VERHAGEN MARTINUS CORNELIS MARIA ,  SEUNTIENS-GRUDA LEJLA

IPC: G03F7/20 ,  B01D61/02 ,  B01D61/24 ,  C02F1/04 ,  C02F1/28 ,  C02F1/32 ,  C02F1/42 ,  C02F1/44 ,  H01L21/027

公开(公告)号：DE602004024366D1

公开(公告)日：2010-01-14

申请号：DE602004024366

申请日：2004-12-16

Applicant: ASML NETHERLANDS BV

Inventor： VAN DIJSSELDONK ANTONIUS JOHANNES JOSEPHUS ,  DIERICHS MARCEL MATHIJS THEODORE MARIE ,  VOORMA HARM-JAN

IPC: G03F7/20 ,  H01L21/027

Abstract: A lithographic apparatus (1) including a radiation attenuator (25) or a variable aperture system, such as masking blades (31,32), arranged in or near an intermediate focus (23) of the projection system (PL). Besides a radiation attenuator or a variable aperture system, a measuring system (61) may be arranged in the intermediate focus. By placing one or more of such systems in the intermediate focus of the projection system, instead of near the reticle (38) in the illumination system (IL), fewer design restrictions occur because of more space available, resulting in a lower design cost.

公开(公告)号：NL2013700A

公开(公告)日：2015-05-27

申请号：NL2013700

申请日：2014-10-29

Applicant: ASML NETHERLANDS BV

Inventor： DERKS SANDER CATHARINA REINIER ,  CASIMIRI ERIC WILLEM FELIX ,  DIERICHS MARCEL MATHIJS THEODORE MARIE ,  OEMRAWSINGH SUMANT SUKDEW RAMANUJAN ,  EINDEN WILHELMUS THEODORUS ANTHONIUS JOHANNES ,  VELTHUIS JOHANNES FRANSISCUS MARIA ,  ZDRAVKOV ALEXANDER NIKOLOV ,  ZEIN EDDINE WASSIM

IPC: G03F7/20

Abstract: An apparatus comprising at least one sealing aperture (40) comprising a hollow part (41), having an inner surface (42), extending at an interface between different zones (50;60) of the apparatus; and a member (43) positioned in the hollow part configured to substantially transmit EUV radiation and to substantially filter non-EUV radiation at the interface; wherein the inner surface of the hollow part has a surface treatment configured to increase absorption of the non-EUV radiation that is transferred by the member to the hollow part.

公开(公告)号：DE60326063D1

公开(公告)日：2009-03-19

申请号：DE60326063

申请日：2003-03-17

Applicant: ASML NETHERLANDS BV

Inventor： DIERICHS MARCEL MATHIJS THEODORE MARIE

IPC: G03F7/20 ,  H01L21/027

Abstract: In an illumination system using mirrors, the facets of a field facet mirror focus plural source images on respective facets of a pupil facet mirror to perform the function of an integrator. A facet mask is constructed and arranged to selectively block facets of the filed or pupil facet mirrors. The facet mask has a grid selectively interposable in the projection beam to provide intermediate illumination settings. The grid has a spacing smaller than the source images but larger than the wavelength of the projection beam so that there is no diffraction.

公开(公告)号：SG173309A1

公开(公告)日：2011-08-29

申请号：SG2011034329

申请日：2004-08-23

Applicant: ASML NETHERLANDS BV

Inventor： LOOPSTRA ERIK ROELOF ,  DIERICHS MARCEL MATHIJS THEODORE MARIE ,  JASPER JOHANNES CHRISTIAAN MARIA ,  MEIJER HENDRICUS JOHANNE MARIA ,  MICKAN UWE ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  LIPSON MATHEW ,  UITTERDIJK TAMMO ,  BASELMANS JOHANNES JACOBUS MATHEUS

IPC: G03F7/20

Abstract: 225A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the final element of the projection system and the substrate W. Several methods are disclosed for protecting components of the projection system, substrate table anda liquid confinement system. These include providing a protective coating on the final10 element 20 of the projection system as well as providing sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.[Fig No. 61115