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公开(公告)号：US11287752B2
公开(公告)日：2022-03-29
申请号：US16625135
申请日：2018-06-07
Applicant: ASML Netherlands B.V.
Inventor： Adrianus Hendrik Koevoets , Cornelis Adrianus De Meijere , Willem Michiel De Rapper , Sjoerd Nicolaas Lambertus Donders , Jan Groenewold , Alain Louis Claude Leroux , Maxim Aleksandrovich Nasalevich , Andrey Nikipelov , Johannes Adrianus Cornelis Maria Pijnenburg , Jacobus Cornelis Gerardus Van Der Sanden
IPC: G03F7/20
Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate, a cooling apparatus located in use above the substrate adjacent to the exposure area, the cooling apparatus being configured to remove heat from the substrate during use, a plasma vessel located below the cooling apparatus with its opening facing towards the cooling apparatus, and a gas supply for supplying gas to the plasma vessel and an aperture for receipt of a radiation beam. In use, supplied gas and a received radiation beam react to form a plasma within the plasma vessel that is directed towards a surface of the cooling apparatus which faces the opening of the plasma vessel.
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公开(公告)号：US11762281B2
公开(公告)日：2023-09-19
申请号：US17130537
申请日：2020-12-22
Applicant: ASML NETHERLANDS B.V.
Inventor： Maxim Aleksandrovich Nasalevich , Erik Achilles Abegg , Nirupam Banerjee , Michiel Alexander Blauw , Derk Servatius Gertruda Brouns , Paul Janssen , Matthias Kruizinga , Egbert Lenderink , Nicolae Maxim , Andrey Nikipelov , Arnoud Willem Notenboom , Claudia Piliego , Mária Péter , Gijsbert Rispens , Nadja Schuh , Marcus Adrianus Van De Kerkhof , Willem Joan Van Der Zande , Pieter-Jan Van Zwol , Antonius Willem Verburg , Johannes Petrus Martinus Bernardus Vermeulen , David Ferdinand Vles , Willem-Pieter Voorthuijzen , Aleksandar Nikolov Zdravkov
CPC classification number: G03F1/62 , G02B5/208 , G02B5/283 , G03F1/82 , G03F7/70191 , G03F7/70575 , G03F7/70916 , G03F7/70958 , G03F7/70983
Abstract: Membranes for EUV lithography are disclosed. In one arrangement, a membrane has a stack having layers in the following order: a first capping layer including an oxide of a first metal; a base layer including a compound having a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer including an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.
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公开(公告)号：US11673169B2
公开(公告)日：2023-06-13
申请号：US17294013
申请日：2019-11-22
Applicant: ASML NETHERLANDS B.V.
Inventor： Andrey Nikipelov , Dmitry Kurilovich , Fabio Sbrizzai , Marcus Adrianus Van de Kerkhof , Ties Wouter Van der Woord , Willem Joan Van der Zande , Jeroen Van Duivenbode , David Ferdinand Vles
Abstract: A membrane cleaning apparatus for removing particles from a membrane, the apparatus including a membrane support and an electric field generating mechanism. The membrane support is for supporting the membrane. The electric field generating mechanism is for generating an electric field in the vicinity of the membrane when supported by the membrane support. The electric field generating mechanism may include: one or more collector electrodes; and a mechanism for applying a voltage across a membrane supported by the membrane support and the or each of the one or more collector electrodes.
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公开(公告)号：US09773578B2
公开(公告)日：2017-09-26
申请号：US14765367
申请日：2014-01-14
Applicant: ASML Netherlands B.V.
Inventor： Alexey Sergeevich Kuznetsov , Arjen Boogaard , Jeroen Marcel Huijbregtse , Andrey Nikipelov , Maarten Van Kampen
CPC classification number: G21K1/062 , B82Y10/00 , C23C28/34 , G03F1/24 , G03F7/70033 , G21K2201/067 , H05G2/008
Abstract: A method of manufacturing a multi-layer mirror comprising a multi-layer stack of pairs of alternating layers of a first material and silicon, the method comprising depositing a stack of pairs of alternating layers of the first material and layers of silicon, the stack being supported by a substrate and doping at least a first layer of the first material with a dopant material.
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公开(公告)号：US20150296602A1
公开(公告)日：2015-10-15
申请号：US14440934
申请日：2013-10-10
Applicant: ASML NETHERLANDS B.V.
Inventor： Erik Roelof Loopstra , Andrei Mikhailovich Yakunin , Vadim Yevgenyevich Banine , Andrey Nikipelov , Edgar Alberto Osorio Oliveros , Alexander Matthijs Struycken , Bert Pieter Van Drieënhuizen , Jan Bernard Plechelmus Van Schoot
IPC: H05G2/00
CPC classification number: H05G2/006 , G03F7/70033 , G03F7/7085 , G21K1/062 , G21K2201/067 , H01S3/073 , H01S3/08059 , H01S3/0815 , H01S3/1307 , H01S3/2232 , H01S3/2383 , H05G2/008
Abstract: A method of generating radiation for a lithography apparatus. The method comprises providing a continuously renewing fuel target (50) at a plasma formation location (12) and directing a continuous-wave excitation beam (6) at the plasma formation location such that fuel within the continuously renewing fuel target is excited by the continuous-wave excitation beam to generate a radiation generating plasma.
Abstract translation: 一种为光刻设备产生辐射的方法。 该方法包括在等离子体形成位置（12）处提供连续更新的燃料靶（50）并且引导等离子体形成位置处的连续波激发束（6），使得连续更新的燃料靶内的燃料被连续的 波激发光束产生辐射产生等离子体。
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Patent Agency Ranking
公开(公告)号：US12271008B2
公开(公告)日：2025-04-08
申请号：US17282559
申请日：2019-09-13
Applicant: ASML NETHERLANDS B.V.
Inventor： Andrey Nikipelov , Marcus Adrianus Van De Kerkhof , Pieter-Jan Van Zwol , Laurentius Cornelius De Winter , Wouter Joep Engelen , Alexey Olegovich Polyakov
Abstract: A first diffusor configured to receive and transmit radiation has a plurality of layers, each layer arranged to change an angular distribution of EUV radiation passing through it differently. A second diffusor configured to receive and transmit radiation has a first layer and a second layer. The first layer is formed from a first material, the first layer including a nanostructure on at least one surface of the first layer. The second layer is formed from a second material adjacent to the at least one surface of the first layer such that the second layer also includes a nanostructure. The second material has a refractive index that is different to a refractive index of the first layer. The diffusors may be configured to receive and transmit EUV radiation.
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公开(公告)号：US20240353315A1
公开(公告)日：2024-10-24
申请号：US18759703
申请日：2024-06-28
Applicant: ASML NETHERLANDS B.V.
Inventor： Andrey Nikipelov , Saeedeh Farokhipoor , Maarten Van Kampen
CPC classification number: G01N21/15 , G01N21/8806 , G01N21/9501 , G02B1/18 , G02B5/0891
Abstract: A method and apparatus for cleaning vacuum ultraviolet (VUV) optics (e.g., one or more mirrors of a VUV) of a substrate inspection system is disclosed. The cleaning system ionizes or disassociates hydrogen gas in a VUV optics environment to generate hydrogen radicals (e.g., H*) or ions (e.g., H+, H2+, H3+), which remove water or hydrocarbons from the surface of the one or more mirrors. The one or more VUV mirrors may include a reflective material, such as aluminum. The one or more VUV mirrors may have a protective coating to protect the reflective material from any detrimental reaction to the hydrogen radicals or ions. The protective coating may include a noble metal.
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公开(公告)号：US12117736B2
公开(公告)日：2024-10-15
申请号：US17621472
申请日：2020-06-05
Applicant: ASML Netherlands B.V.
Inventor： Marcus Adrianus Van De Kerkhof , Satish Achanta , Johannes Hubertus Josephina Moors , Vadim Yevgenyevich Banine , Stef Marten Johan Janssens , Andrey Nikipelov
IPC: G03F7/00 , G03F1/82 , H01L21/683 , H01L21/687
CPC classification number: G03F7/707 , G03F1/82 , H01L21/6831 , H01L21/68721
Abstract: A lithographic apparatus comprising: a clamping surface for supporting a substrate, wherein a property of the clamping surface is defined by at least one clamping surface parameter, and wherein the property of the clamping surface has been selected to exhibit low wear; a clamping apparatus for actuating a clamping operation between the clamping surface and the substrate, wherein the clamping operation is defined at least in part by at least one interface characteristic between the clamping surface and the substrate; and a processing station, operable to apply an adjustment to a first property of the substrate to optimize at least one interface characteristic of a particular clamping operation in dependence on the clamping surface parameter and at least one substrate surface parameter which defines a second property of the substrate.
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公开(公告)号：US20220342315A1
公开(公告)日：2022-10-27
申请号：US17621472
申请日：2020-06-05
Applicant: ASML Netherlands B.V.
Inventor： Marcus Adrianus Van De Kerkhof , Satish Achanta , Johannes Hubertus Josephina Moors , Vadim Yevgenyevich Banine , Stef Marten Johan Janssens , Andrey Nikipelov
IPC: G03F7/20 , H01L21/683 , G03F1/82 , H01L21/687
Abstract: A lithographic apparatus comprising: a clamping surface for supporting a substrate, wherein a property of the clamping surface is defined by at least one clamping surface parameter, and wherein the property of the clamping surface has been selected to exhibit low wear; a clamping apparatus for actuating a clamping operation between the clamping surface and the substrate, wherein the clamping operation is defined at least in part by at least one interface characteristic between the clamping surface and the substrate; and a processing station, operable to apply an adjustment to a first property of the substrate to optimize at least one interface characteristic of a particular clamping operation in dependence on the clamping surface parameter and at least one substrate surface parameter which defines a second property of the substrate.
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公开(公告)号：US12055478B2
公开(公告)日：2024-08-06
申请号：US17563867
申请日：2021-12-28
Applicant: ASML NETHERLANDS B.V.
Inventor： Andrey Nikipelov , Saeedeh Farokhipoor , Maarten Van Kampen
CPC classification number: G01N21/15 , G01N21/8806 , G01N21/9501 , G02B1/18 , G02B5/0891
Abstract: A method and apparatus for cleaning vacuum ultraviolet (VUV) optics (e.g., one or more mirrors of a VUV) of a substrate inspection system is disclosed. The cleaning system ionizes or disassociates hydrogen gas in a VUV optics environment to generate hydrogen radicals (e.g., H*) or ions (e.g., H+, H2+, H3+, which remove water or hydrocarbons from the surface of the one or more mirrors. The one or more VUV mirrors may include a reflective material, such as aluminum. The one or more VUV mirrors may have a protective coating to protect the reflective material from any detrimental reaction to the hydrogen radicals or ions. The protective coating may include a noble metal.
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