公开(公告)号：US11175590B2

公开(公告)日：2021-11-16

申请号：US16755127

申请日：2018-10-05

Applicant: ASML Netherlands B.V.

Inventor： Fei Wang ,  Wei Fang ,  Kuo-Shih Liu

IPC: G03F7/20 ,  G01B15/00 ,  H01J37/22 ,  H01J37/28 ,  H01L21/66

Abstract: Systems and methods for conducting critical dimension metrology are disclosed. According to certain embodiments, a charged particle beam apparatus generates a beam for imaging a first area and a second area. Measurements are acquired corresponding to a first feature in the first area, and measurements are acquired corresponding to a second feature in the second area. The first area and the second area are at separate locations on a sample. A combined measurement is calculated based on the measurements of the first feature and the measurements of the second feature.

公开(公告)号：US20220113637A1

公开(公告)日：2022-04-14

申请号：US17510524

申请日：2021-10-26

Applicant: ASML Netherlands B.V.

Inventor： Fei Wang ,  Wei Fang ,  Kuo-Shih Liu

IPC: G03F7/20 ,  H01J37/22 ,  G01B15/00 ,  H01J37/28 ,  H01L21/66

Abstract: Systems and methods for conducting critical dimension metrology are disclosed. According to certain embodiments, a charged particle beam apparatus generates a beam for imaging a first area and a second area. Measurements are acquired corresponding to a first feature in the first area, and measurements are acquired corresponding to a second feature in the second area. The first area and the second area are at separate locations on a sample. A combined measurement is calculated based on the measurements of the first feature and the measurements of the second feature.

公开(公告)号：US11430631B2

公开(公告)日：2022-08-30

申请号：US16833463

申请日：2020-03-27

Applicant: ASML Netherlands B.V.

Inventor： Kuo-Shih Liu ,  Xuedong Liu ,  Wei Fang ,  Jack Jau

IPC: H01J37/28 ,  H01J37/26

Abstract: Disclosed herein is a method comprising: generating a plurality of probe spots on a sample by a plurality of beams of charged particles; while scanning the plurality of probe spots across a region on the sample, recording from the plurality of probe spots a plurality of sets of signals respectively representing interactions of the plurality of beams of charged particles and the sample; generating a plurality of images of the region respectively from the plurality of sets of signals; and generating a composite image of the region from the plurality of images.

公开(公告)号：US11720030B2

公开(公告)日：2023-08-08

申请号：US17510524

申请日：2021-10-26

Applicant: ASML Netherlands B.V.

Inventor： Fei Wang ,  Wei Fang ,  Kuo-Shih Liu

IPC: G03F7/20 ,  G01B15/00 ,  H01J37/22 ,  H01J37/28 ,  H01L21/66 ,  G03F7/00

CPC classification number: G03F7/70625 ,  G01B15/00 ,  H01J37/222 ,  H01J37/28 ,  H01L22/12 ,  H01J2237/2817

Abstract: Systems and methods for conducting critical dimension metrology are disclosed. According to certain embodiments, a charged particle beam apparatus generates a beam for imaging a first area and a second area. Measurements are acquired corresponding to a first feature in the first area, and measurements are acquired corresponding to a second feature in the second area. The first area and the second area are at separate locations on a sample. A combined measurement is calculated based on the measurements of the first feature and the measurements of the second feature.