公开(公告)号：WO2020239373A1

公开(公告)日：2020-12-03

申请号：PCT/EP2020/062463

申请日：2020-05-05

Applicant: ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

Inventor： LIPSON, Matthew ,  ACHANTA, Satish ,  DAWSON, Benjamin, David ,  SORNA, Matthew, Anthony ,  SIGAL, Iliya ,  UITTERDIJK, Tammo

IPC: G03F7/20 ,  H01L21/687

Abstract: A substrate table for supporting a substrate includes a surface and coarse burls. Each of the coarse burls includes a burl-top surface and fine burls. The coarse burls are disposed on the surface of the substrate table. The fine burls are disposed on the burl-top surface. The fine burls contact the substrate when the substrate table supports the substrate.

公开(公告)号：WO2014122151A2

公开(公告)日：2014-08-14

申请号：PCT/EP2014/052204

申请日：2014-02-05

Applicant: ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

Inventor： DELPUERTO, Santiago, E ,  LIPSON, Matthew ,  HENDERSON, Kenneth ,  LAFARRE, Raymond ,  MARKOYA, Louis, John ,  UITTERDIJK, Tammo ,  VERMEULEN, Johannes, Petrus, Martinus, Bernardus ,  DE GROOT, Antonius, Franciscus, Johannes ,  VAN DER WILK, Ronald

IPC: G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70708 ,  H01L21/67109 ,  H01L21/6831 ,  H01L21/6875

Abstract: A support such as a clamp is configured to releasably hold a patterning device such as a reticle to secure it and prevent heat-induced deformation of it. For example, an electrostatic clamp includes a first substrate having opposing first and second surfaces, a plurality of burls located on the first surface and configured to contact the reticle, a second substrate having opposing first and second surfaces. The first surface of the second substrate is coupled to the second surface of the first substrate. A plurality of cooling elements is located between the first surface of the second substrate and the second surface of the first substrate. The cooling elements are configured to cause electrons to travel from the second surface of the first substrate to the first surface of the second substrate. Each cooling element is substantially aligned with a respective burl.

Abstract translation: 诸如夹具的支撑件被配置为可释放地保持诸如掩模版的图案形成装置以固定它并防止其热引起的变形。 例如，静电夹具包括具有相对的第一表面和第二表面的第一基底，位于第一表面上并被构造成接触掩模版的多个毛刺，具有相对的第一和第二表面的第二基底。 第二衬底的第一表面耦合到第一衬底的第二表面。 多个冷却元件位于第二基板的第一表面和第一基板的第二表面之间。 冷却元件构造成使电子从第一衬底的第二表面行进到第二衬底的第一表面。 每个冷却元件基本上与相应的毛刺对齐。

公开(公告)号：WO2018215172A1

公开(公告)日：2018-11-29

申请号：PCT/EP2018/061063

申请日：2018-05-01

Applicant: ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

Inventor： LIPSON, Matthew ,  MASON, Christopher, John ,  SOHRABIBABAHEIDARY, Damoon ,  VAN DE WINKEL, Jimmy, Matheus, Wilhelmus ,  SCHOLTEN, Bert, Dirk

IPC: G03F7/20 ,  G02B27/00

Abstract: A method of dislodging contamination from a part of an apparatus used in a patterning process, the method including: providing a cleaning substrate into contact with the part of the apparatus while the part is attached to the apparatus, the cleaning substrate comprising a material configured to chemically react with the contamination; and dislodging contamination on the part of the apparatus by chemical reaction between the material and the contamination.

公开(公告)号：WO2016079051A2

公开(公告)日：2016-05-26

申请号：PCT/EP2015/076687

申请日：2015-11-16

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： KRUIZINGA, Matthias ,  JANSEN, Maarten, Mathijs, Marinus ,  AZEREDO LIMA, Jorge, Manuel ,  BOGAART, Erik, Willem ,  BROUNS, Derk, Servatius, Gertruda ,  BRUIJN, Marc ,  BRULS, Richard, Joseph ,  DEKKERS, Jeroen ,  JANSSEN, Paul ,  KAMALI, Mohammad, Reza ,  KRAMER, Ronald, Harm, Gunther ,  LANSBERGEN, Robert, Gabriël, Maria ,  LEENDERS, Martinus, Hendrikus, Antonius ,  LIPSON, Matthew ,  LOOPSTRA, Erik, Roelof ,  LYONS, Joseph, H. ,  ROUX, Stephen ,  VAN DEN BOSCH, Gerrit ,  VAN DEN HEIJKANT, Sander ,  VAN DER GRAAF, Sandra ,  VAN DER MEULEN, Frits ,  VAN LOO, Jérôme, François, Sylvain, Virgile ,  VERBRUGGE, Beatrijs, Louise, Marie-Joseph, Katrien

IPC: G03F1/62

CPC classification number: G03F7/70983 ,  G03F1/64 ,  G03F7/70825

Abstract: A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.

Abstract translation: 一种适用于光刻工艺的掩模组件，所述掩模组件包括图案形成装置; 以及防护薄膜组件框架，其被配置为支撑防护薄膜组件并且用安装件安装在所述图案形成装置上; 其中所述安装件被配置为相对于所述图案形成装置悬挂所述防护薄膜框架，使得所述防护薄膜框架和所述图案形成装置之间存在间隙; 并且其中所述安装件在所述图案形成装置和所述防护膜框架之间提供可释放地接合的附接。

公开(公告)号：WO2022243005A1

公开(公告)日：2022-11-24

申请号：PCT/EP2022/061381

申请日：2022-04-28

Applicant: ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

Inventor： SHERVIN, Shahab ,  UITTERDIJK, Tammo ,  LIPSON, Matthew ,  VERMEULEN, Marcus, Martinus, Petrus, Adrianus

IPC: G03F7/20 ,  H01L21/687

Abstract: The present disclosure is directed to a modular wafer table and methods for refurbishing a scrapped wafer to manufacture the modular wafer table. The method comprises removing one or more burls from a surface of a wafer table; polishing the surface of the wafer table after removing the one or more burls to form a core module; forming a burl module having a plurality of burls thereon; and bonding the core module to the burl module.

公开(公告)号：EP4296778A2

公开(公告)日：2023-12-27

申请号：EP23206063.2

申请日：2015-11-16

Applicant: ASML Netherlands B.V.

Inventor： AZEREDO LIMA, Jorge, Manuel ,  BOGAART, Erik, Willem ,  BROUNS, Derk, Servatius, Gertruda ,  BRUIJN, Marc ,  BRULS, Richard, Joseph ,  DEKKERS, Jeroen ,  JANSEN, Maarten ,  JANSSEN, Paul ,  KAMALI, Mohammad, Reza ,  KRAMER, Ronald, Harm, Gunther ,  KRUIZINGA, Matthias ,  LANSBERGEN, Robert, Gabriël, Maria ,  LEENDERS, Martinus, Hendrikus, Antonius ,  LIPSON, Matthew ,  LOOPSTRA, Erik, Roelof ,  LYONS, Joseph, Harry ,  ROUX, Stephen ,  VAN DEN BOSCH, Gerrit ,  VAN DEN HEIJKANT, Sander ,  VAN DER GRAAF, Sandra ,  VAN DER MEULEN, Frits ,  VAN LOO, Jérôme, François, Sylvain, Virgile ,  VERBRUGGE, Beatrijs, Louise, Marie-Joseph, Katrien

IPC: G03F1/64

Abstract: A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.

公开(公告)号：EP4296778A3

公开(公告)日：2024-03-27

申请号：EP23206063.2

申请日：2015-11-16

Applicant: ASML Netherlands B.V.

Inventor： AZEREDO LIMA, Jorge, Manuel ,  BOGAART, Erik, Willem ,  BROUNS, Derk, Servatius, Gertruda ,  BRUIJN, Marc ,  BRULS, Richard, Joseph ,  DEKKERS, Jeroen ,  JANSEN, Maarten ,  JANSSEN, Paul ,  KAMALI, Mohammad, Reza ,  KRAMER, Ronald, Harm, Gunther ,  KRUIZINGA, Matthias ,  LANSBERGEN, Robert, Gabriël, Maria ,  LEENDERS, Martinus, Hendrikus, Antonius ,  LIPSON, Matthew ,  LOOPSTRA, Erik, Roelof ,  LYONS, Joseph, Harry ,  ROUX, Stephen ,  VAN DEN BOSCH, Gerrit ,  VAN DEN HEIJKANT, Sander ,  VAN DER GRAAF, Sandra ,  VAN DER MEULEN, Frits ,  VAN LOO, Jérôme, François, Sylvain, Virgile ,  VERBRUGGE, Beatrijs, Louise, Marie-Joseph, Katrien

IPC: G03F1/62 ,  G03F1/64 ,  G03F7/20 ,  G03F1/00

Abstract: A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.

公开(公告)号：EP3221747A2

公开(公告)日：2017-09-27

申请号：EP15794591.6

申请日：2015-11-16

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： KRUIZINGA, Matthias ,  JANSEN, Maarten Mathijs Marinus ,  AZEREDO LIMA, Jorge Manuel ,  BOGAART, Erik Willem ,  BROUNS, Derk Servatius Gertruda ,  BRUIJN, Marc ,  BRULS, Richard Joseph ,  DEKKERS, Jeroen ,  JANSSEN, Paul ,  KAMALI, Mohammad Reza ,  KRAMER, Ronald Harm Gunther ,  LANSBERGEN, Robert Gabriël Maria ,  LEENDERS, Martinus Hendrikus Antonius ,  LIPSON, Matthew ,  LOOPSTRA, Erik Roelof ,  LYONS, Joseph H. ,  ROUX, Stephen ,  VAN DEN BOSCH, Gerrit ,  VAN DEN HEIJKANT, Sander ,  VAN DER GRAAF, Sandra ,  VAN DER MEULEN, Frits ,  VAN LOO, Jérôme François Sylvain Virgile ,  VERBRUGGE, Beatrijs Louise Marie-Joseph Katrien

IPC: G03F1/62 ,  G03F7/20 ,  G03F1/00

CPC classification number: G03F7/70983 ,  G03F1/64 ,  G03F7/70825

Abstract: A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.

Abstract translation: 用于适用于光刻工艺的掩模组件的工具，所述掩模组件包括图案形成装置; 以及被配置为支撑薄膜并用安装件安装在所述图案形成装置上的薄膜框架; 其中所述安装件在所述图案形成装置和所述薄膜框架之间提供可释放地接合的附接。