公开(公告)号：WO2016079052A2

公开(公告)日：2016-05-26

申请号：PCT/EP2015/076688

申请日：2015-11-16

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN DER MEULEN, Frits ,  JANSEN, Maarten, Mathijs, Marinus ,  AZEREDO LIMA, Jorge, Manuel ,  BROUNS, Derk, Servatius, Gertruda ,  BRUIJN, Marc ,  DEKKERS, Jeroen ,  JANSSEN, Paul ,  KRAMER, Ronald, Harm, Gunther ,  KRUIZINGA, Matthias ,  LANSBERGEN, Robert, Gabriël, Maria ,  LEENDERS, Martinus, Hendrikus, Antonius ,  LOOPSTRA, Erik, Roelof ,  VAN DEN BOSCH, Gerrit ,  VAN LOO, Jérôme, François, Sylvain, Virgile ,  VERBRUGGE, Beatrijs, Louise, Marie-Joseph, Katrien ,  DE KLERK, Angelo, Cesar, Peter ,  DINGS, Jacobus, Maria ,  JANSSEN, Maurice, Leonardus, Johannes ,  KERSTENS, Roland, Jacobus, Johannes ,  KESTERS, Martinus, Jozef, Maria ,  LOOS, Michel ,  MIDDEL, Geert ,  REIJNDERS, Silvester, Matheus ,  THEUERZEIT, Frank, Johannes, Christiaan ,  VAN LIEVENOOGEN, Anne, Johannes, Wilhelmus

CPC classification number: G03F7/70983 ,  G03F1/64 ,  G03F7/70825

Abstract: Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.

Abstract translation: 用于适用于光刻工艺的掩模组件的工具，所述掩模组件包括图案形成装置; 以及被配置为支撑薄膜并用安装件安装在所述图案形成装置上的薄膜框架; 其中所述安装件提供图案形成装置和薄膜框架之间的可释放地可接合的附接。

公开(公告)号：EP4286941A3

公开(公告)日：2024-03-06

申请号：EP23203497.5

申请日：2015-11-16

Applicant: ASML Netherlands B.V.

Inventor： AZEREDO LIMA, Jorge, Manuel ,  BROUNS, Derk, Servatius, Gertruda ,  BRUIJN, Marc ,  DE KLERK, Angelo, Cesar, Peter ,  DEKKERS, Jeroen ,  DINGS, Jacobus, Maria ,  JANSEN, Maarten, Mathijs, Marinus ,  JANSSEN, Maurice, Leonardus, Johannes ,  JANSSEN, Paul ,  KERSTENS, Roland, Jacobus, Johannes ,  KESTER, Martinus, Jozef, Maria ,  KRAMER, Ronald, Harm, Gunther ,  KRUIZINGA, Matthias ,  LANSBERGEN, Robert, Gabriël, Maria ,  LEENDERS, Martinus, Hendrikus, Antonius ,  LOOPSTRA, Erik, Roelof ,  LOOS, Michel ,  MIDDEL, Geert ,  REIJNDERS, Silvester, Matheus ,  THEUERZEIT, Frank, Johannes, Christiaan ,  VAN DEN BOSCH, Gerrit ,  VAN DER MEULEN, Frits ,  VAN LIEVENOOGEN, Anne, Johannes, Wilhelmus ,  VAN LOO, Jérôme, François, Sylvain, Virgile ,  VERBRUGGE, Beatrijs, Louise, Marie-Joseph, Katrien

IPC: G03F1/62 ,  G03F7/20 ,  G03F1/00

Abstract: Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.

公开(公告)号：EP4286941A2

公开(公告)日：2023-12-06

申请号：EP23203497.5

申请日：2015-11-16

Applicant: ASML Netherlands B.V.

Inventor： AZEREDO LIMA, Jorge, Manuel ,  BROUNS, Derk, Servatius, Gertruda ,  BRUIJN, Marc ,  DE KLERK, Angelo, Cesar, Peter ,  DEKKERS, Jeroen ,  DINGS, Jacobus, Maria ,  JANSEN, Maarten, Mathijs, Marinus ,  JANSSEN, Maurice, Leonardus, Johannes ,  JANSSEN, Paul ,  KERSTENS, Roland, Jacobus, Johannes ,  KESTER, Martinus, Jozef, Maria ,  KRAMER, Ronald, Harm, Gunther ,  KRUIZINGA, Matthias ,  LANSBERGEN, Robert, Gabriël, Maria ,  LEENDERS, Martinus, Hendrikus, Antonius ,  LOOPSTRA, Erik, Roelof ,  LOOS, Michel ,  MIDDEL, Geert ,  REIJNDERS, Silvester, Matheus ,  THEUERZEIT, Frank, Johannes, Christiaan ,  VAN DEN BOSCH, Gerrit ,  VAN DER MEULEN, Frits ,  VAN LIEVENOOGEN, Anne, Johannes, Wilhelmus ,  VAN LOO, Jérôme, François, Sylvain, Virgile ,  VERBRUGGE, Beatrijs, Louise, Marie-Joseph, Katrien

IPC: G03F1/64

Abstract: Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.

公开(公告)号：EP3221748A2

公开(公告)日：2017-09-27

申请号：EP15794923.1

申请日：2015-11-16

Applicant: ASML Netherlands B.V.

Inventor： VAN DER MEULEN, Frits ,  JANSEN, Maarten Mathijs Marinus ,  AZEREDO LIMA, Jorge Manuel ,  BROUNS, Derk Servatius Gertruda ,  BRUIJN, Marc ,  DEKKERS, Jeroen ,  JANSSEN, Paul ,  KRAMER, Ronald Harm Gunther ,  KRUIZINGA, Matthias ,  LANSBERGEN, Robert Gabriël Maria ,  LEENDERS, Martinus Hendrikus Antonius ,  LOOPSTRA, Erik Roelof ,  VAN DEN BOSCH, Gerrit ,  VAN LOO, Jérôme François Sylvain Virgile ,  VERBRUGGE, Beatrijs Louise Marie-Joseph Katrien ,  DE KLERK, Angelo Cesar Peter ,  DINGS, Jacobus Maria ,  JANSSEN, Maurice Leonardus Johannes ,  KERSTENS, Roland Jacobus Johannes ,  KESTERS, Martinus Jozef Maria ,  LOOS, Michel ,  MIDDEL, Geert ,  REIJNDERS, Silvester Matheus ,  THEUERZEIT, Frank Johannes Christiaan ,  VAN LIEVENOOGEN, Anne Johannes Wilhelmus

IPC: G03F1/62 ,  G03F1/00 ,  G03F7/20

CPC classification number: G03F7/70983 ,  G03F1/64 ,  G03F7/70825

Abstract: Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.

Abstract translation: 用于适用于光刻工艺的掩模组件的工具，所述掩模组件包括图案形成装置; 以及被配置为支撑薄膜并用安装件安装在所述图案形成装置上的薄膜框架; 其中所述安装件在所述图案形成装置和所述薄膜框架之间提供可释放地接合的附接。