-
公开(公告)号：WO2016083120A2
公开(公告)日：2016-06-02
申请号：PCT/EP2015/076179
申请日：2015-11-10
Applicant: ASML NETHERLANDS B.V.
Inventor： DEKKERS, Jeroen , NIENHUYS, Han-Kwang , RENKENS, Michael, Jozef, Mathijs , AKKERMANS, Johannes, Antonius, Gerardus , DE VRIES, Gosse, Charles , LOOPSTRA, Erik, Roelof
CPC classification number: G03F7/70158 , G02B5/1828 , G02B6/29314 , G03F7/70266
Abstract: An adjustable diffraction grating comprises: an optical element and a distortion mechanism. The optical element has an optical surface for receiving an input radiation beam. The optical element is provided with a plurality of closed channels below the optical surface, above each closed channel the optical surface being formed from a membrane of material. The distortion mechanism comprises one or more actuators that are operable to distort the membranes over the closed channels so as to control the shape of the optical surface and to form a periodic structure on the optical surface which acts as a diffraction grating such that the input radiation beam is diffracted from the optical element to form a plurality of angularly separated sub-beams.
Abstract translation: 可调节衍射光栅包括：光学元件和失真机构。 光学元件具有用于接收输入辐射束的光学表面。 光学元件在光学表面下方设置有多个闭合通道，每个闭合通道上方，光学表面由材料膜形成。 变形机构包括一个或多个致动器，其可操作以使膜在闭合通道上变形，以便控制光学表面的形状并且在作为衍射光栅的光学表面上形成周期性结构，使得输入辐射 光束从光学元件衍射以形成多个角度分离的子光束。
-
公开(公告)号：WO2016079051A2
公开(公告)日：2016-05-26
申请号：PCT/EP2015/076687
申请日：2015-11-16
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： KRUIZINGA, Matthias , JANSEN, Maarten, Mathijs, Marinus , AZEREDO LIMA, Jorge, Manuel , BOGAART, Erik, Willem , BROUNS, Derk, Servatius, Gertruda , BRUIJN, Marc , BRULS, Richard, Joseph , DEKKERS, Jeroen , JANSSEN, Paul , KAMALI, Mohammad, Reza , KRAMER, Ronald, Harm, Gunther , LANSBERGEN, Robert, Gabriël, Maria , LEENDERS, Martinus, Hendrikus, Antonius , LIPSON, Matthew , LOOPSTRA, Erik, Roelof , LYONS, Joseph, H. , ROUX, Stephen , VAN DEN BOSCH, Gerrit , VAN DEN HEIJKANT, Sander , VAN DER GRAAF, Sandra , VAN DER MEULEN, Frits , VAN LOO, Jérôme, François, Sylvain, Virgile , VERBRUGGE, Beatrijs, Louise, Marie-Joseph, Katrien
IPC: G03F1/62
CPC classification number: G03F7/70983 , G03F1/64 , G03F7/70825
Abstract: A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
Abstract translation: 一种适用于光刻工艺的掩模组件，所述掩模组件包括图案形成装置; 以及防护薄膜组件框架，其被配置为支撑防护薄膜组件并且用安装件安装在所述图案形成装置上; 其中所述安装件被配置为相对于所述图案形成装置悬挂所述防护薄膜框架，使得所述防护薄膜框架和所述图案形成装置之间存在间隙; 并且其中所述安装件在所述图案形成装置和所述防护膜框架之间提供可释放地接合的附接。
-
3.发明申请A METHOD FOR CALIBRATION OF AN ENCODER SCALE AND A LITHOGRAPHIC APPARATUS 审中-公开一种用于校准编码器的方法和一种LITHOGRAPHIC设备
公开(公告)号：WO2014053296A1
公开(公告)日：2014-04-10
申请号：PCT/EP2013/068930
申请日：2013-09-12
Applicant: ASML NETHERLANDS B.V.
Inventor： DEKKERS, Jeroen , JEUNINK, Andre, Bernardus , LOOPSTRA, Erik, Roelof , VAN DER PASCH, Engelbertus, Antonius, Fransiscus , RENKENS, Michael, Jozef, Mathijs , SCHOORMANS, Carolus, Johannes, Catharina , HOEKSTRA, Peter
CPC classification number: G03F7/70775 , G01D5/2449 , G01D5/34707 , G01D18/00 , G01D18/008 , G03F7/70516
Abstract: A method for calibrating an encoder scale having an array of marks in a first direction, comprising the step of: moving the encoder scale in the first direction relative to a first encoder-type sensor, a second encoder-type sensor and a third encoder-type sensor, wherein the first encoder-type sensor and the second encoder-type sensor are fixedly spaced in the first direction at a first distance relative to each other, wherein the second encoder-type sensor and the third encoder-type sensor are fixedly spaced in the first direction at a second distance relative to each other.
Abstract translation: 一种用于校准具有第一方向的标记阵列的编码器刻度的方法，包括以下步骤：相对于第一编码器型传感器，第二编码器型传感器和第三编码器型传感器沿第一方向移动编码器刻度， 型传感器，其中第一编码器型传感器和第二编码器型传感器在第一方向上相对于彼此以第一距离固定间隔，其中第二编码器型传感器和第三编码器型传感器被固定间隔开 在第一方向上相对于彼此以第二距离。
-
公开(公告)号：WO2012130532A1
公开(公告)日：2012-10-04
申请号：PCT/EP2012/052984
申请日：2012-02-22
Applicant: ASML NETHERLANDS B.V. , PEETERS, Felix , BENSCHOP, Jozef , RENKENS, Michael , VAN BAARS, Gregor , DEKKERS, Jeroen
Inventor： PEETERS, Felix , BENSCHOP, Jozef , RENKENS, Michael , VAN BAARS, Gregor , DEKKERS, Jeroen
IPC: G03F7/20
CPC classification number: G03F7/70133 , G03F7/70275 , G03F7/70375 , G03F7/70391 , G03F7/704 , G03F7/70516 , G03F7/708 , G03F7/7085 , G03F9/7019
Abstract: A radiation spot measurement system for a lithographic apparatus, the system having a target (40) onto which a radiation system of the lithographic apparatus may project spots of radiation for a measurement process, the target having a measurement target (42). The system further includes a radiation detector (41) to detect radiation from one of the spots, and a controller (46) to receive information from the radiation detector and to determine the position of the spot of radiation relative to an intended position of the spot of radiation.
Abstract translation: 一种用于光刻设备的辐射点测量系统，所述系统具有目标（40），光刻设备的辐射系统可以在其上投射用于测量过程的辐射点，所述目标具有测量目标（42）。 该系统还包括用于检测来自其中一个点的辐射的辐射检测器（41）和用于从辐射检测器接收信息并确定相对于点的预期位置的辐射点的位置的控制器（46） 的辐射。
-
公开(公告)号：WO2016079052A2
公开(公告)日：2016-05-26
申请号：PCT/EP2015/076688
申请日：2015-11-16
Applicant: ASML NETHERLANDS B.V.
Inventor： VAN DER MEULEN, Frits , JANSEN, Maarten, Mathijs, Marinus , AZEREDO LIMA, Jorge, Manuel , BROUNS, Derk, Servatius, Gertruda , BRUIJN, Marc , DEKKERS, Jeroen , JANSSEN, Paul , KRAMER, Ronald, Harm, Gunther , KRUIZINGA, Matthias , LANSBERGEN, Robert, Gabriël, Maria , LEENDERS, Martinus, Hendrikus, Antonius , LOOPSTRA, Erik, Roelof , VAN DEN BOSCH, Gerrit , VAN LOO, Jérôme, François, Sylvain, Virgile , VERBRUGGE, Beatrijs, Louise, Marie-Joseph, Katrien , DE KLERK, Angelo, Cesar, Peter , DINGS, Jacobus, Maria , JANSSEN, Maurice, Leonardus, Johannes , KERSTENS, Roland, Jacobus, Johannes , KESTERS, Martinus, Jozef, Maria , LOOS, Michel , MIDDEL, Geert , REIJNDERS, Silvester, Matheus , THEUERZEIT, Frank, Johannes, Christiaan , VAN LIEVENOOGEN, Anne, Johannes, Wilhelmus
CPC classification number: G03F7/70983 , G03F1/64 , G03F7/70825
Abstract: Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
Abstract translation: 用于适用于光刻工艺的掩模组件的工具，所述掩模组件包括图案形成装置; 以及被配置为支撑薄膜并用安装件安装在所述图案形成装置上的薄膜框架; 其中所述安装件提供图案形成装置和薄膜框架之间的可释放地可接合的附接。
-
Patent Agency Ranking
公开(公告)号：EP2691811B1
公开(公告)日：2018-01-31
申请号：EP12708271.7
申请日：2012-02-22
Applicant: ASML Netherlands B.V.
Inventor： PEETERS, Felix , BENSCHOP, Jozef , RENKENS, Michael , VAN BAARS, Gregor , DEKKERS, Jeroen
IPC: G03F7/20
CPC classification number: G03F7/70133 , G03F7/70275 , G03F7/70375 , G03F7/70391 , G03F7/704 , G03F7/70516 , G03F7/708 , G03F7/7085 , G03F9/7019
Abstract: A radiation spot measurement system for a lithographic apparatus, the system having a target onto which a radiation system of the lithographic apparatus may project spots of radiation for a measurement process, the target having a measurement target. The system further includes a radiation detector to detect radiation from one of the spots, and a controller to receive information from the radiation detector and to determine the position of the spot of radiation relative to an intended position of the spot of radiation.
-
公开(公告)号：EP3221748A2
公开(公告)日：2017-09-27
申请号：EP15794923.1
申请日：2015-11-16
Applicant: ASML Netherlands B.V.
Inventor： VAN DER MEULEN, Frits , JANSEN, Maarten Mathijs Marinus , AZEREDO LIMA, Jorge Manuel , BROUNS, Derk Servatius Gertruda , BRUIJN, Marc , DEKKERS, Jeroen , JANSSEN, Paul , KRAMER, Ronald Harm Gunther , KRUIZINGA, Matthias , LANSBERGEN, Robert Gabriël Maria , LEENDERS, Martinus Hendrikus Antonius , LOOPSTRA, Erik Roelof , VAN DEN BOSCH, Gerrit , VAN LOO, Jérôme François Sylvain Virgile , VERBRUGGE, Beatrijs Louise Marie-Joseph Katrien , DE KLERK, Angelo Cesar Peter , DINGS, Jacobus Maria , JANSSEN, Maurice Leonardus Johannes , KERSTENS, Roland Jacobus Johannes , KESTERS, Martinus Jozef Maria , LOOS, Michel , MIDDEL, Geert , REIJNDERS, Silvester Matheus , THEUERZEIT, Frank Johannes Christiaan , VAN LIEVENOOGEN, Anne Johannes Wilhelmus
CPC classification number: G03F7/70983 , G03F1/64 , G03F7/70825
Abstract: Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
Abstract translation: 用于适用于光刻工艺的掩模组件的工具，所述掩模组件包括图案形成装置; 以及被配置为支撑薄膜并用安装件安装在所述图案形成装置上的薄膜框架; 其中所述安装件在所述图案形成装置和所述薄膜框架之间提供可释放地接合的附接。
-
公开(公告)号：EP4296778A3
公开(公告)日：2024-03-27
申请号：EP23206063.2
申请日：2015-11-16
Applicant: ASML Netherlands B.V.
Inventor： AZEREDO LIMA, Jorge, Manuel , BOGAART, Erik, Willem , BROUNS, Derk, Servatius, Gertruda , BRUIJN, Marc , BRULS, Richard, Joseph , DEKKERS, Jeroen , JANSEN, Maarten , JANSSEN, Paul , KAMALI, Mohammad, Reza , KRAMER, Ronald, Harm, Gunther , KRUIZINGA, Matthias , LANSBERGEN, Robert, Gabriël, Maria , LEENDERS, Martinus, Hendrikus, Antonius , LIPSON, Matthew , LOOPSTRA, Erik, Roelof , LYONS, Joseph, Harry , ROUX, Stephen , VAN DEN BOSCH, Gerrit , VAN DEN HEIJKANT, Sander , VAN DER GRAAF, Sandra , VAN DER MEULEN, Frits , VAN LOO, Jérôme, François, Sylvain, Virgile , VERBRUGGE, Beatrijs, Louise, Marie-Joseph, Katrien
Abstract: A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
-
公开(公告)号：EP3221747A2
公开(公告)日：2017-09-27
申请号：EP15794591.6
申请日：2015-11-16
Applicant: ASML Netherlands B.V. , ASML Holding N.V.
Inventor： KRUIZINGA, Matthias , JANSEN, Maarten Mathijs Marinus , AZEREDO LIMA, Jorge Manuel , BOGAART, Erik Willem , BROUNS, Derk Servatius Gertruda , BRUIJN, Marc , BRULS, Richard Joseph , DEKKERS, Jeroen , JANSSEN, Paul , KAMALI, Mohammad Reza , KRAMER, Ronald Harm Gunther , LANSBERGEN, Robert Gabriël Maria , LEENDERS, Martinus Hendrikus Antonius , LIPSON, Matthew , LOOPSTRA, Erik Roelof , LYONS, Joseph H. , ROUX, Stephen , VAN DEN BOSCH, Gerrit , VAN DEN HEIJKANT, Sander , VAN DER GRAAF, Sandra , VAN DER MEULEN, Frits , VAN LOO, Jérôme François Sylvain Virgile , VERBRUGGE, Beatrijs Louise Marie-Joseph Katrien
CPC classification number: G03F7/70983 , G03F1/64 , G03F7/70825
Abstract: A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
Abstract translation: 用于适用于光刻工艺的掩模组件的工具，所述掩模组件包括图案形成装置; 以及被配置为支撑薄膜并用安装件安装在所述图案形成装置上的薄膜框架; 其中所述安装件在所述图案形成装置和所述薄膜框架之间提供可释放地接合的附接。
-
公开(公告)号：EP2691811A1
公开(公告)日：2014-02-05
申请号：EP12708271.7
申请日：2012-02-22
Applicant: ASML Netherlands B.V.
Inventor： PEETERS, Felix , BENSCHOP, Jozef , RENKENS, Michael , VAN BAARS, Gregor , DEKKERS, Jeroen
IPC: G03F7/20
CPC classification number: G03F7/70133 , G03F7/70275 , G03F7/70375 , G03F7/70391 , G03F7/704 , G03F7/70516 , G03F7/708 , G03F7/7085 , G03F9/7019
Abstract: A radiation spot measurement system for a lithographic apparatus, the system having a target onto which a radiation system of the lithographic apparatus may project spots of radiation for a measurement process, the target having a measurement target. The system further includes a radiation detector to detect radiation from one of the spots, and a controller to receive information from the radiation detector and to determine the position of the spot of radiation relative to an intended position of the spot of radiation.
-
-
-
-
-
-
-
-
-
Search Results
14
records
(took 0.025 seconds)
