公开(公告)号：US20230298850A1

公开(公告)日：2023-09-21

申请号：US18320157

申请日：2023-05-18

Applicant: ASML Netherlands B.V.

Inventor： Marijke SCOTUZZI ,  Roy Ramon VEENSTRA ,  Antoine Gaston Marie KIERS

IPC: H01J37/22 ,  H01J37/28 ,  H01J37/244

CPC classification number: H01J37/222 ,  H01J37/28 ,  H01J37/244 ,  H01J2237/2817 ,  H01J2237/24592 ,  H01J2237/1534

Abstract: Disclosed herein is an inspection tool and a method for identifying defects in a sample. The method includes steps of scanning a first area of a sample with a first detector-beam and scanning a second area of the sample with a second detector-beam, then receiving first and second signals that are derived from the first and second detector-beams. The first and second signals are compared to determine whether a defect is present in the sample.

公开(公告)号：US20240128043A1

公开(公告)日：2024-04-18

申请号：US18530109

申请日：2023-12-05

Applicant: ASML Netherlands B.V.

Inventor： Jurgen VAN SOEST ,  Roy Ramon VEENSTRA ,  Erwin Paul SMAKMAN ,  Tom VAN ZUTPHEN ,  Albertus Victor Gerardus MANGNUS

IPC: H01J37/12 ,  H01J37/147

CPC classification number: H01J37/12 ,  H01J37/147 ,  H01J2237/2448

Abstract: The disclosure relates to a charged particle beam apparatus configured to project charged particle beams towards a sample. The charged particle beam apparatus comprises: a plurality of charged particle-optical columns configured to project respective charged particle beams towards the sample, wherein each charged particle-optical column comprises: a charged particle source configured to emit the charged particle beam towards the sample, the charged particle sources being comprised in a source array; an objective lens comprising an electrostatic electrode configured to direct the charged particle beam towards the sample; and a detector associated with the objective lens array, configured to detect signal charged particles emitted from the sample. The objective lens is the most down-beam element of the charged particle-optical column configured to affect the charged particle beam directed towards the sample.

公开(公告)号：US20230304949A1

公开(公告)日：2023-09-28

申请号：US18323096

申请日：2023-05-24

Applicant: ASML Netherlands B.V.

Inventor： Roy Ramon VEENSTRA

IPC: G01N23/2251 ,  H01J37/28 ,  H01J37/12 ,  H01J37/244

CPC classification number: G01N23/2251 ,  H01J37/28 ,  H01J37/12 ,  H01J37/244 ,  G01N2223/6116 ,  H01J2237/1207 ,  H01J2237/2448 ,  H01J2237/24495 ,  H01J2237/24564

Abstract: A multi-beam electron-optical system for a charged-particle assessment tool, the system comprising:



an objective lens array assembly comprising a plurality of objective lenses, each configured to project one of a plurality of charged-particle beams onto a sample;
a detector array associated with the objective lens array assembly and configured to detect charged-particles emitted from the sample; and
a circuit comprising an amplifier in data communication with the detector array;
wherein the amplifier is configured to be tunable in order to tune amplification of signals from the detector array.