公开(公告)号：US12080515B2

公开(公告)日：2024-09-03

申请号：US17718225

申请日：2022-04-11

Applicant: ASML Netherlands B.V.

Inventor： Weiming Ren ,  Xuedong Liu ,  Xuerang Hu ,  Zong-wei Chen

IPC: H01J37/28 ,  H01J37/06 ,  H01J37/10 ,  H01J37/147

CPC classification number: H01J37/28 ,  H01J37/06 ,  H01J37/10 ,  H01J37/1474 ,  H01J2237/0492 ,  H01J2237/083 ,  H01J2237/1501 ,  H01J2237/2806

Abstract: Systems and methods for observing a sample in a multi-beam apparatus are disclosed. A charged particle optical system may include a deflector configured to form a virtual image of a charged particle source and a transfer lens configured to form a real image of the charged particle source on an image plane. The image plane may be formed at least near a beam separator that is configured to separate primary charged particles generated by the source and secondary charged particles generated by interaction of the primary charged particles with a sample. The image plane may be formed at a deflection plane of the beam separator. The multi-beam apparatus may include a charged-particle dispersion compensator to compensate dispersion of the beam separator. The image plane may be formed closer to the transfer lens than the beam separator, between the transfer lens and the charged-particle dispersion compensator.

公开(公告)号：US11302514B2

公开(公告)日：2022-04-12

申请号：US16536284

申请日：2019-08-08

Applicant: ASML Netherlands B.V.

Inventor： Weiming Ren ,  Xuedong Liu ,  Xuerang Hu ,  Zong-wei Chen

IPC: H01J37/28 ,  H01J37/06 ,  H01J37/10 ,  H01J37/147

Abstract: Systems and methods for observing a sample in a multi-beam apparatus are disclosed. A charged particle optical system may include a deflector configured to form a virtual image of a charged particle source and a transfer lens configured to form a real image of the charged particle source on an image plane. The image plane may be formed at least near a beam separator that is configured to separate primary charged particles generated by the source and secondary charged particles generated by interaction of the primary charged particles with a sample. The image plane may be formed at a deflection plane of the beam separator. The multi-beam apparatus may include a charged-particle dispersion compensator to compensate dispersion of the beam separator. The image plane may be formed closer to the transfer lens than the beam separator, between the transfer lens and the charged-particle dispersion compensator.

公开(公告)号：US20200051779A1

公开(公告)日：2020-02-13

申请号：US16536284

申请日：2019-08-08

Applicant: ASML Netherlands B.V.

Inventor： Weiming REN ,  Xuedong Liu ,  Xuerang Hu ,  Zong-wei Chen

IPC: H01J37/28 ,  H01J37/10 ,  H01J37/147 ,  H01J37/06

Abstract: Systems and methods for observing a sample in a multi-beam apparatus are disclosed. A charged particle optical system may include a deflector configured to form a virtual image of a charged particle source and a transfer lens configured to form a real image of the charged particle source on an image plane. The image plane may be formed at least near a beam separator that is configured to separate primary charged particles generated by the source and secondary charged particles generated by interaction of the primary charged particles with a sample. The image plane may be formed at a deflection plane of the beam separator. The multi-beam apparatus may include a charged-particle dispersion compensator to compensate dispersion of the beam separator. The image plane may be formed closer to the transfer lens than the beam separator, between the transfer lens and the charged-particle dispersion compensator.