公开(公告)号：WO2020214759A1

公开(公告)日：2020-10-22

申请号：PCT/US2020/028427

申请日：2020-04-16

Applicant: AXCELIS TECHNOLOGIES, INC.

Inventor： ABESHAUS, Joshua ,  BASSOM, Neil ,  LAMBERT, Camilla ,  BELL, Caleb ,  HINDS, Kyle ,  WISCH, Caleb

IPC: H01J37/317 ,  H01J37/08

Abstract: An ion source for an ion implantation system has a plurality of arc chambers. The ion source forms an ion beam from a respective one of the plurality of arc chambers based on a position of the respective one of the plurality of arc chambers with respect to a beamline. The arc chambers are coupled to a carrousel that translates or rotates the respective one of the plurality of arc chambers to a beamline position associated with the beamline. One or more of the plurality of arc chambers can have at least one unique feature, or two or more of the plurality of arc chambers can be generally identical to one another.