公开(公告)号：WO2023076575A2

公开(公告)日：2023-05-04

申请号：PCT/US2022/048194

申请日：2022-10-28

Applicant: AXCELIS TECHNOLOGIES, INC.

Inventor： COLVIN, Neil ,  BASSOM, Neil ,  ABESHAUS, Joshua

IPC: H01J37/08 ,  H01J27/08 ,  H01J2237/006 ,  H01J2237/0213 ,  H01J2237/31701 ,  H01J37/32412 ,  H01J37/3244 ,  H01J37/32651 ,  H01J37/32724

Abstract: An ion source has arc chamber having one or more radiation generating features, an arc chamber body enclosing an internal volume, and at least one gas inlet aperture defined therein. A gas source provides a gas such as a source species gas or a halide through the gas inlet aperture. The source species gas can be an aluminum-based ion source material such as dimethylaluminum chloride (DMAC). One or more shields positioned proximate to the gas inlet aperture provide a fluid communication between the gas inlet aperture and the internal volume, minimize a line-of-sight from the one or more radiation generating features to the gas inlet aperture, and substantially prevent thermal radiation from reaching the gas inlet aperture from the one or more radiation generating features.

公开(公告)号：WO2020214759A1

公开(公告)日：2020-10-22

申请号：PCT/US2020/028427

申请日：2020-04-16

Applicant: AXCELIS TECHNOLOGIES, INC.

Inventor： ABESHAUS, Joshua ,  BASSOM, Neil ,  LAMBERT, Camilla ,  BELL, Caleb ,  HINDS, Kyle ,  WISCH, Caleb

IPC: H01J37/317 ,  H01J37/08

Abstract: An ion source for an ion implantation system has a plurality of arc chambers. The ion source forms an ion beam from a respective one of the plurality of arc chambers based on a position of the respective one of the plurality of arc chambers with respect to a beamline. The arc chambers are coupled to a carrousel that translates or rotates the respective one of the plurality of arc chambers to a beamline position associated with the beamline. One or more of the plurality of arc chambers can have at least one unique feature, or two or more of the plurality of arc chambers can be generally identical to one another.

公开(公告)号：WO2020131254A1

公开(公告)日：2020-06-25

申请号：PCT/US2019/061169

申请日：2019-11-13

Applicant: AXCELIS TECHNOLOGIES, INC.

Inventor： PLATOW, Wilhelm ,  EISNER, Edward ,  VANDERBERG, Bo ,  BASSOM, Neil ,  CRISTOFORO, Michael ,  ABESHAUS, Joshua

IPC: H01J27/02 ,  H01J37/317 ,  H01J37/08

Abstract: An electrode system for an ion source has a source electrode that defines a source aperture in an ion source chamber, and is coupled to a source power supply. A first ground electrode defines a first ground aperture that is electrically coupled to an electrical ground potential and extracts ions from the ion source. A suppression electrode is positioned downstream of the first ground electrode and defines a suppression aperture that is electrically coupled to a suppression power supply. A second ground electrode is positioned downstream of the suppression electrode and defines a second ground aperture. The first and second ground electrodes are fixedly coupled to one another and are electrically coupled to the electrical ground potential.