公开(公告)号：WO2006031650A3

公开(公告)日：2006-03-23

申请号：PCT/US2005/032179

申请日：2005-09-08

Applicant: AXCELIS TECHNOLOGIES, INC. ,  JANOS, Alan ,  PACK, Malcolm ,  KAMAREHI, Mohammad ,  COLSON, Michael

Inventor： JANOS, Alan ,  PACK, Malcolm ,  KAMAREHI, Mohammad ,  COLSON, Michael

IPC: H01J61/30 ,  H01J65/04 ,  C03C4/00 ,  C03C3/06

Abstract: An electrodeless lamp and process for emitting ultraviolet and/or vacuum ultraviolet radiation comprises an envelope formed of an ultra-pure and/or low-defect quartz material and an ultraviolet and/or vacuum ultraviolet emissive material disposed in the interior region of the envelope. The electrodeless lamp formed of the ultra-pure and/or low-defect quartz material minimizes degradation during use.

公开(公告)号：WO2004068559A2

公开(公告)日：2004-08-12

申请号：PCT/US2004/002597

申请日：2004-01-30

Applicant: AXCELIS TECHNOLOGIES INC.

Inventor： KAMAREHI, Mohammad

IPC: H01L

CPC classification number: H01J37/32211 ,  H01J37/32192 ,  H01J37/32357

Abstract: A remote plasma source employs a helical coil slow wave structure to couple microwave energy to a flowing gas to produce plasma for downstream substrate processing, such as photoresist stripping, ashing, or etching. The system also includes cooling structures for removing excess heat from the plasma source components.

Abstract translation: 远程等离子体源采用螺旋线圈慢波结构来将微波能量耦合到流动的气体，以产生用于下游衬底处理的等离子体，例如光刻胶剥离，灰化或蚀刻。 该系统还包括用于从等离子体源组件去除多余热量的冷却结构。

公开(公告)号：EP1177112B1

公开(公告)日：2011-06-01

申请号：EP00920239.1

申请日：2000-04-12

Applicant: Axcelis Technologies Inc.

Inventor： KAMAREHI, Mohammad ,  COX, Gerald, M.

IPC: H01J37/32 ,  H05H1/00

CPC classification number: H01J37/32357 ,  H01J37/32192 ,  H01J37/32256 ,  H05H1/46 ,  H05H2001/4622

Abstract: A remote plasma generator (12), coupling microwave frequency energy to a gas and delivering radicals to a downstream process chamber (14), includes several features which, in conjunction, enable highly efficient radical generation. In the illustrated embodiments, more efficient delivery of oxygen and fluorine radicals translates to more rapid photoresist etch or ash rates. A single-crystal, one-piece sapphire applicator (40) and transport tube (41) minimizes recombination of radicals in route to the process chamber and includes a bend (42) to avoid direct line of sight from the glow discharge to the downstream process chamber (14). Microwave transparent cooling fluid within a cooling jacket (50) around the applicator (40) enables high power, high temperature plasma production. Additionally, dynamic impedance matching via a sliding short (60) at the terminus of the microwave cavity (28) reduces power loss through reflected energy. At the same time, a low profile microwave trap (44, 46) produces a more dense plasma to increase radical production. In one embodiment, fluorine and oxygen radicals are separately generated and mixed just upstream of the process chamber (14), enabling individually optimized radical generation of the two species.

公开(公告)号：EP1789991A2

公开(公告)日：2007-05-30

申请号：EP05796590.7

申请日：2005-09-08

Applicant: AXCELIS TECHNOLOGIES, INC.

Inventor： JANOS, Alan ,  PACK, Malcolm ,  KAMAREHI, Mohammad ,  COLSON, Michael

IPC: H01J61/30 ,  H01J65/04 ,  C03C4/00 ,  C03C3/06

CPC classification number: H01J65/044 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/11 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/42 ,  H01J61/302

Abstract: An electrodeless lamp and process for emitting ultraviolet and/or vacuum ultraviolet radiation comprises an envelope formed of an ultra-pure and/or low-defect quartz material and an ultraviolet and/or vacuum ultraviolet emissive material disposed in the interior region of the envelope. The electrodeless lamp formed of the ultra-pure and/or low-defect quartz material minimizes degradation during use.