Abstract:
A process for patterning dielectric layers of the type typically found in optical coatings in the context of MEMS manufacturing is disclosed. A dielectric coating is deposited over a device layer, which has or will be released, and patterned using a mask layer. In one example, the coating is etched using the mask layer as a protection layer. In another example, a lift-off process is shown. The primary advantage of photolithographic patterning of the dielectric layers in optical MEMS devices is that higher levels of consistency can be achieved in fabrication, such as size, location, and residual material stress.
Abstract:
An optical membrane device (110) and method for making such a device (110) are described. This membrane is notable in that it comprises an optically curved surface (250). In some embodiments, this curved optical surface (250) is optically concave and coated, for example, with a highly reflecting (HR) coating to create a curved mirror. In other embodiments, the optical surface is optically convex and coated with, preferably, an antireflective (AR) coating to function as a refractive or diffractive lens.
Abstract:
A MOEMS Fabry-Perot tunable filter 100 includes an optical membrane structure 150. Two electrostatic cavities 136, 138 are provided, one on either side of the membrane structure 150. As a result, electrostatic attractive forces can be exerted on the optical membrane to enable deflection in either direction, typically, along the optical axis 10. This is useful in calibrating the tunable filter during operation to a lambd° set point. It is also useful in controlling the membrane to avoid unstable operation and increasing a deflection range.
Abstract:
A MOEMS Fabry-Perot tunable filter includes an optical membrane structure. Two electrostatic cavities are provided, one on either side of the membrane structure. As a result, electrostatic attractive forces can be exerted on the optical membrane to enable deflection in either direction, typically, along the optical axis. This is useful in calibrating the tunable filter during operation to a lambd∘ set point. It is also useful in controlling the membrane to avoid unstable operation.