Abstract:
A process for singulating MOEMS optical devices from a precursor structure, in which the precursor structure comprises device material, having movable optical structures, and handle material, through which optical ports are formed to provide for optical access to the movable optical structures. The process comprises coating a frontside and a backside of the precursor structure with protection material. The precursor structure is then attached to a substrate such as dicing tape and the precursor structure separated into individual optical devices by a process, including die sawing. Thereafter, the optical devices are removed from the tape and the protection material removed from the optical devices.
Abstract:
A process for patterning dielectric layers of the type typically found in optical coatings in the context of MEMS manufacturing is disclosed. A dielectric coating is deposited over a device layer, which has or will be released, and patterned using a mask layer. In one example, the coating is etched using the mask layer as a protection layer. In another example, a lift-off process is shown. The primary advantage of photolithographic patterning of the dielectric layers in optical MEMS devices is that higher levels of consistency can be achieved in fabrication, such as size, location, and residual material stress.
Abstract:
A process for singulating MOEMS optical devices (10) from a precursor structure (110), in which the precursor structure (110) comprises device material (12), having movable optical structures (14), and handle material (22), through which optical ports (30) are formed to provide for optical access to the movable optical structures (14). The process comprises coating a frontside and a backside of the precursor structure (110) with protection material (610). The precursor structure (110) is then attached to a substrate such as dicing tape and the precursor structure (110) separated into individual optical devices (10) by a process, including die sawing. Thereafter, the optical devices (10) are removed from the tape and the protection material (610) removed from the optical devices (10).
Abstract:
A tunable Fabry-Perot filter includes an optical cavity bounded by a stationary reflector and a deformable or movable membrane reflector. A second electrostatic cavity outside of the optical cavity includes a pair of electrodes, one of which is mechanically coupled to the movable membrane reflector. Voltage applied to the electrodes across the electrostatic cavity causes deflection of the membrane, thereby changing the length of the optical cavity and tuning the filter. The filter with the movable membrane can be formed by micro device photolithographic and fabrication processes from a semiconductor material in an integrated device structure. The membrane can include an inner movable membrane portion connected within an outer body portion by a pattern of tethers. The pattern can be such that straight or radial tethers connect the inner membrane with the outer body. Alternatively, a tether pattern with tethers arranged in a substantially spiral pattern can be used.